本論文研究之高功率脈衝磁控濺鍍之電源開發與應用(High-power Impulse Magnetron Sputtering，HiPIMS)具有六種控制模式，分別為正/負直流電壓模式、單極性正/負脈衝電壓模式與對稱式/非對稱式雙極性控制模式。此電源供應器可分為二部分，一為直流電源供應器部分，另一為脈衝切換單元部分。在直流電源供應器部分，是由三相 220V/60Hz 之輸入電源，經內部高頻切換為升壓型直流電源供應器，它具有低漣波及可控性較高的優點，所開發之HiPIMS電源供應器，其輸出電壓範圍0~1000V，電流最高0~310A，功率0~10kW，主要利用IGBT元件所構成之全橋式轉換電路與脈波寬度調變(Pulse Width Modulation ，PWM)技術以調整輸出電壓、電流與功率。在脈衝切換單元部分，其主要電路架構為一組由IGBT元件所構成之全橋式轉換電路所組成。本文經由電阻測試，以佐證該方法之可行性，經由硬體實現與波型實測，說明本方法於電漿負載供電穩定及電漿系統研發上具有參考價值。

In recent years, the high power impulse magnetron sputtering (HiPIMS) technique has been vastly employed in machinery industry, aerospace defense industry, metal products industry, packaging industry and textile coating industry. This technique can solve the shortcomings of the direct current magnetron sputtering which improve the deposited layer quality.
The HiPIMS power supply unit were designed and studied in this thesis. The developed power supply unit has many unique features which enables the power supply to generate high density plasma and high degree of target ionization.

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