本研究主要目的是建構出一套以條紋反射法為基礎之高反射性表面形貌量測系統，並提出向量解析的觀點重新檢視條紋反射法，以降低量測系統誤差。

首先介紹條紋反射法原始理論推導 (以下簡稱幾何解析)與向量解析推導 (以下簡稱向量解析)，並設計一實驗來驗證向量解析之正確性。接著利用模擬方法比較幾何解析與向量解析，整理後進行誤差分析。最後使用向量解析結果並結合相位移法、相位展開法、相位遮罩法、臨界值法…等方法構築出光學量測系統，再利用此系統實際量測晶圓試件。在精確度方面，經由高精度表面粗度儀ET3000驗證比對後可得知吾人建立之表面形貌量測儀平均誤差在0.7μm以內，最大誤差在1.4μm以內。

In this paper, the major purpose is to set up a high reflection surface measurement system with fringe reflection method and to perform fringe reflection method by making use of vector analysis.
First,we introduce the primitive theory (“geometry method” for short)and the vector analysis theory (“vector method” for short) for fringe reflection method, and devise an experiment to verify vector method. Then, we compare geometry method with vector method by simulated method and assay the error. Finally, we establish optical measurement system by vector method , phase shift method, phase unwrap method…etc. , then we measure the wafer’s profile by our system.
About the accuracy of our system, by comparing with the surface roughness measuring instrument ET3000, the average error is under 0.7 μm, the maximum error is under 1.4μm.

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