透明導電玻璃為太陽能電池中重要元件之一，在薄膜太陽能電池μ-Si:H、a-Si:H中，由於吸收層非常薄，致使光在入射進入吸收層時，行徑路線過短，不易被吸收層充分利用，所以必須在透明導電層上製做一粗糙化結構，使光在通過此界面時產生散射，延長光在吸收層之行進路徑，使光能在吸收層能被較充分利用，即所謂光陷化，評估光散射程度之光學指標稱之為霧度值，霧度值愈高代表光通過界面有較大程度之散射。
有別於傳統方法在透明導電膜表面製做粗糙化結構，本研究目的為利用奈米氧化矽微球微影製程在玻璃基材上製備規則結構。本研究將探討奈米二氧化矽微球製程參數對粒徑大小之影響，以及奈米球體之單層自組裝參數。並以球微影製程輔以濕式蝕刻製備具有規則化結構之玻璃基材，並探討圖案尺寸對玻璃基材光學性質之影響。最後濺鍍透明導電薄膜於玻璃基材，完成具規則結構之透明導電玻璃，將實驗測得之光學性質與光學模擬結果比較，探討圖案尺寸對於光散射行為之影響。
實驗結果顯示，奈米氧化矽微球粒徑大小隨著TEOS、NH¬4OH的含量增加，粒徑大小有隨之增大之趨勢。當H2O的含量增加，起初奈米二氧化矽微球粒徑隨H2O增加，粒徑變大，當H2O的含量過多時，奈米二氧化矽微球粒徑反而變小。粒徑大小的變化原因為反應物濃度改變，造成奈米球體成核數目不同影響球體粒徑大小。另一方面，本研究以400 nm二氧化矽微球當作核點，透過連續添加TEOS成功使奈米球體成長為大粒徑球體，使球體粒徑分別成長為694 nm、762 nm、981 nm。將製備好之球體分散於去離子水中，並加入分散劑Triton x100，以旋轉塗佈法使球體自組裝排列，能使粒徑400 nm、762 nm、981 nm之球體排列成單層規則結構。透過單層結構之球以球微影製程，成功製備規則圖案之玻璃基材，其圖案尺寸分別為300nm、600nm、900nm，具規則結構之玻璃基材有效提升霧度值，其中以圖案尺寸900nm之玻璃基材有最大霧度值7.27%。濺鍍透明導電薄膜於具有規則圖案之玻璃基材，得到具有規則結構之透明導電玻璃，圖案尺寸如同玻璃基材，隨著透明導電玻璃圖案尺寸愈大，霧度值會愈大，其中以圖案尺寸900nm之圖案具有最大霧度值11.25 %。此外，藉由濕式蝕刻時間不同改變同案深度，圖案之深度從60nm到90nm，隨著圖案深度增加，霧度值也會增加，其中以具有橫向尺寸900 nm，深度90 nm之圖案有最大霧度值14.51 %。將實驗結果得到之霧度值與光學模擬所得之數值比較，發現實驗霧度值與光學模擬結果吻合，而其圖案尺寸變化與霧度值之影響，最終可歸於表面粗糙度之影響，表面粗糙度愈高之圖案能有較高之霧度值表現。

Transparent Conductive Oxide (TCO) is one of the important components of the solar cells. In the thin film solar cells, the light path is limited because of the main absotption layer of a-Si:H or μ-Si:H is quite thin, when the light go into the absorption layer and the light cannot be used efficiently. Thus, to prepared a TCO with enlarged surface roughness is necessary, it can enhance light scattering and increase the light path so that the light can be used totally, which is so-called light trapping effect. And the haze value is to assess the degree of light scattering, the higher the haze value, the higher degree of light scattering when the light go through the surface.
Differ from traditional TCO film with texture on surface, in this study, the SiO2 nanosphere lithography technique was used to prepare the rules pattern on the glass substrate. This study will discuss the effect of the preparation parameters of SiO2 nanosphere on the particle size, and the parameters of nanosphere self-assembly into monolayer respectively. Pattern the glass substrate with rule pattern using nanosphere lithography process, and then to discuss the effect of the pattern size on the optical properties of the glass substrate. Also, sputtering TCO on the glass substrate with rules patterns and form the transparent conductive glass with rules patterns. And then, compare the measurement of optical properties with optical simulation to discuss the influence of pattern size on the light scattering.
The experimental results show that with the increasing content of TEOS、NH¬4OH, the particle size increased along with the trend. The particle size of SiO2 nanosphere increased with the increasing H2O content, while the particle size of SiO2 nanosphere decreased when the content of H2O is too much. Particle size changes due to the changes in the concentration of reactants, resulting in nanosphere into different number of nuclear. In this study, using the 400 nm SiO2 nanosphere as a nucleation point, through continuously adding TEOS can make the nanosphere grow into a larger particle size, and grow to 694 nm, 762 nm, 981 nm. Putting the prepared nanosphere which particle size are 400nm、762nm、981nm into DI water with dispersant(Tirton x100) respectively, and the nanosphere can arrange into monolayer by spin-coating successfully. The glass substrate with rules structure was obtained which the pattern size are 300nm、600nm、900nm respectively using nanosphere lithography process. And then sputtering TCO on the glass substrate with rules structure and to get the transparent conductive glass with rules structure, the lateral size is same as the glass substrate. Transparent conductive glass pattern with larger pattern size, the greater the haze value was obtained, of which the pattern size of 900nm of the pattern has a maximum haze value of 11.25%. The depth of pattern will change with the time of the wet etching. With the greater depth of pattern, the haze value is relative high, of which the lateral size of 900 nm and the pattern depth of 90 nm has a maximum haze value of 14.51%. In addition, the haze value obtained from the experimental results is consistent with the value obtained from the optical simulation. The change of the haze value can be attributed to surface roughness, the higher the surface roughness of the patterns can have a high degree of value of the performance of the haze value.

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