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研究生: 廉上葦
Lien, Shang-Wei
論文名稱: 拓撲維爾半金屬矽化鈷中的空位雜質引起的散射效應
Vacancy Impurity Induced Scattering effect in Topological Weyl Semimetal CoSi
指導教授: 張泰榕
Chang, Tay-Rong
學位類別: 博士
Doctor
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2022
畢業學年度: 110
語文別: 英文
論文頁數: 25
中文關鍵詞: 拓樸外爾半金屬散射率電子生命週期電導率表面雜質載流子傳輸第一原理VASP緊束縛模型
外文關鍵詞: Topological Weyl semimetal, scattering rate, lifetime, conductivity, surface impurity, carrier transport, first-principle, VASP, tight-binding model
相關次數: 點閱:99下載:46
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  • 新型拓樸外爾半金屬由於其由塊材能帶結構的拓撲結構引起的特殊量子特性而在表面上具有強大的載子傳輸性質。費米弧態對電導率有很大貢獻。我們使用手性拓樸半金屬 CoSi 作為模型系統來展示表面雜質效應下的電阻率縮放行為。由於第一原理計算電阻率的成本很高,我們開發了一種數值方法來計算費米黃金法則(Fermi golden rule)和久保公式(Kubo formula)中的 T 矩陣。我們的結果表明存在一個臨界厚度 ?? 劃分縮放趨勢。在 ?? 之上,我們證明了在相當低的表面雜質密度下,CoSi中的表面的載子主導傳輸導致電阻率隨著厚度的減小而降低。這與銅等傳統金屬形成對比,其中由於載流子從表面、晶界等散射,電阻率隨著尺寸的減小而增加。然而,在 ?? 以上,在高表面雜質密度下,由於強大的表面缺陷散射效應,CoS的電阻率隨著厚度的減小而增加。在這種情況下,CoSi的電阻率縮放行為變成了傳統金屬(如金屬銅)。低於??時,由於費米弧態的殘餘成為主要載流子通道,而與缺陷密度無關,電阻率隨著厚度的減小而降低。

    Novel topological Weyl semimetals possess robust transport properties on surfaces due to their exotic quantum properties induced by the topology of the bulk band structure. Fermi-arc states provide a significant contribution to conductivity. We use CoSi, the chiral topological semimetal, as a model system to demonstrate resistivity scaling behaviors under the surface impurity effect. Because it is expensive to calculate the resistivity on the first principle method, we develop a numerical method to calculate the T-matrix from Fermi’s golden rule and Kubo's formula. Our results reveal that there exists a critical thickness dc dividing the scaling trends. Above dc, we demonstrate that the surface-dominated transport in CoSi in a quite low surface impurity density gives decreasing resistivity with reduced thickness. This contrasts with conventional metals such as copper, where resistivity increases with decreasing size due to carrier scattering from surfaces, grain boundaries, etc. However, above dc, at high surface impurity densities, the resistivity of CoSi increases with decreasing thickness due to the strong surface defect scattering effect. In this case, The resistivity scaling behavior of CoSi is the same as that of conventional metals. Below dc, the resistivity decreases with decreasing thickness because the electrons on the remnants Fermi arc become the dominant carriers regardless of defect density.

    I、Abstract II、Acknowledgments III、Contents IV、List of Figures V、List of my published VI、Main text 1. Introduction 1 1.1. Overview 1 1.2. Motivation 1 2. Tools 2 2.1 Density function theory (VASP package and Wannier90 package) 2 3. Results 2 3.1 Topological property and band structure of CoSi 2 3.2 Numerical methods within a tight-binding model of impurity scattering properties 3 3.3 Transport properties of graphene 6 3.4 Resistivity scaling in a series of CoSi slabs with point defects 9 3.5 Separation of surface and bulk states 10 3.6 In Region I, resistivity scaling above the critical thickness 11 3.7 In Region II, resistivity scaling below the critical thickness 14 3.8 Resistivity at the critical thickness 15 IV、Conclusion 16 V、Reference 17 VI、Appendix 19 6.1 The convergence of the summation range of the T-matrix 19 6.2 K-dependent scattering rate, S(k), from Fermi’s golden rule 20 6.3 A series of systems with different sizes by tunable impurity factor N can be the same 22 6.4 Conductivity, σ, from Kubo's formula 22 6.5 eta2 effect in the graphene 23 6.6 The scattering rate of CoSi with bulk defects 24 IV、List of Figures 1. Crystal structure, Chern number, and band structure of bulk and semi-infinite CoSi. 3 2. K-resolve scattering properties of graphene system at E=-0.2 eV with impurity concentration, nimp is 10^10 cm^-2. 7 3. Conductivity of graphene systems with different impurity concentration nimp vs. external voltage Vg. 9 4. Resistivity scaling in CoSi slabs with surface vacancy defects. 10 5. The surface-bulk separation of CoSi slabs. 11 6. Scaling of bulk-state conductivity in CoSi slabs above dc. 13 7. Spectrum weight of CoSi in the thin film systems, and thick film systems. 14 8. Resistivity scaling of CoSi below dc. 15 9. Band structures and surface-resolved spectral weight of CoSi thin slabs. 16 S1. Scattering rate with only top defects in CoSi thin slabs. 20 S2. Comparison of scattering rates based on Fermi-Dirac and Green's function methods in the CoSi slab model. 21 S3. Conductivity v.s. chemical potential in different sizes of Graphene systems. 22 S4. The conductivity of graphene with vacancy defects considering background effect. 24 S5. The scattering rate of CoSi with bulk defects. 25

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