| 研究生: |
傑度達 Dutta, Jit |
|---|---|
| 論文名稱: |
氧化鋅及氧化鋅鎂薄膜壓電閘極效應之探討 Investigation into the piezo-gating effect on ZnO and MgZnO thin films |
| 指導教授: |
劉全璞
Liu, Chuan-Pu |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 尖端材料國際碩士學位學程 International Curriculum for Advanced Materials Program |
| 論文出版年: | 2020 |
| 畢業學年度: | 108 |
| 語文別: | 英文 |
| 論文頁數: | 72 |
| 外文關鍵詞: | Piezoelectric, Piezopotential, Piezo-gating effect, ZnO & MgZnO thin film, Simulation, Gauge Factor |
| 相關次數: | 點閱:112 下載:0 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
Our work demonstrates a unique device design to investigate the piezo-gating effect on ZnO and MgZnO thin-film. Herein, we have grown highly c axis oriented crystalline ZnO and MgZnO thin-film on top of SiO2/Si substrate via RF sputtering deposition method. In order to investigate the piezo-gating effect, we have used top and bottom electrodes. It is observed that the presence of an external compressive force induces piezopotential, which affects the channel behavior by a redistributing internal charge carrier. We have observed nearly ±7% changes in current ratio with and without external force for ZnO thin-film and around 11% for MgZnO, which can be attributed to piezo-gating effect. To validate the experimental results, we have carried out COMSOL Multiphysics Simulations. In simulation, we have carried out theoretical calculation on ideal ZnO and also get a similar change in current around ±7%. We have also achieved a higher gauge factor for piezotronic transistor around 10x103, due to higher current response and low strain value.
[1] X. Wang, J. Zhou, J. Song, J. Liu, N. Xu, Z.L. Wang, Nano letters, 6 (2006) 2768-2772.
[2] G. Gautschi, Piezoelectric sensors, Piezoelectric Sensorics, Springer2002, pp. 73-91.
[3] J.F. Nye, Physical properties of crystals: their representation by tensors and matrices, Oxford university press1985.
[4] A. Arnau, Piezoelectric transducers and applications, Springer2004.
[5] W.G. Cady, Piezoelectricity: an introduction to the theory and applications of electomechanical phenomena in crystals, 1964.
[6] J. Zhou, P. Fei, Y. Gao, Y. Gu, J. Liu, G. Bao, Z.L. Wang, Nano letters, 8 (2008) 2725-2730.
[7] A. Cowley, S. Sze, Journal of Applied Physics, 36 (1965) 3212-3220.
[8] Y. Zhang, Y. Liu, Z.L. Wang, Advanced Materials, 23 (2011) 3004-3013.
[9] D.A. Neamen, Semiconductor physics and devices: basic principles, New York, NY: McGraw-Hill2012.
[10] M. Allen, C. Swartz, T. Myers, T. Veal, C. McConville, S. Durbin, Physical Review B, 81 (2010) 075211.
[11] K. Ozawa, K. Mase, Physical Review B, 83 (2011) 125406.
[12] K. Kumarappan, Dublin City University2015.
[13] D.-K. Hwang, M.-S. Oh, J.-H. Lim, S.-J. Park, Journal of Physics D: Applied Physics, 40 (2007) R387.
[14] L. Dake, D. Baer, J. Zachara, Surface and Interface analysis, 14 (1989) 71-75.
[15] A. Molle, M.N.K. Bhuiyan, G. Tallarida, M. Fanciulli, Applied physics letters, 89 (2006) 083504.
[16] D. Briggs, Faraday Discussions of the Chemical Society, 60 (1975) 81-88.
[17] J. Singh, P. Kumar, K.S. Hui, K. Hui, K. Ramam, R. Tiwari, O. Srivastava, CrystEngComm, 14 (2012) 5898-5904.
[18] F. Shan, Y. Yu, Journal of the European Ceramic Society, 24 (2004) 1869-1872.
[19] M.K. Yadav, M. Ghosh, R. Biswas, A.K. Raychaudhuri, A. Mookerjee, S. Datta, Physical Review B, 76 (2007) 195450.
[20] Y.H. Mohammed, Superlattices and Microstructures, (2019).
[21] Ü. Özgür, Y.I. Alivov, C. Liu, A. Teke, M. Reshchikov, S. Doğan, V. Avrutin, S.-J. Cho, Morkoç, Journal of applied physics, 98 (2005) 11.
[22] Z.L. Wang, Advanced Materials, 24 (2012) 4632-4646.
[23] J. Zhou, Y. Gu, P. Fei, W. Mai, Y. Gao, R. Yang, G. Bao, Z.L. Wang, Nano letters, 8 (2008) 3035-3040.
[24] S. Niu, Y. Hu, X. Wen, Y. Zhou, F. Zhang, L. Lin, S. Wang, Z.L. Wang, Advanced materials, 25 (2013) 3701-3706.
[25] C. Pan, R. Yu, S. Niu, G. Zhu, Z.L. Wang, Acs Nano, 7 (2013) 1803-1810.
[26] G. Hu, R. Zhou, R. Yu, L. Dong, C. Pan, Z.L. Wang, Nano Research, 7 (2014) 1083-1091.
[27] W. Wu, Y. Wei, Z.L. Wang, Advanced Materials, 22 (2010) 4711-4715.
[28] K. Gupta, S. Brahma, J. Dutta, B. Rao, C.-P. Liu, Nano Energy, 55 (2019) 1-21.
[29] Y. Zhou, Y. Wu, W. Asghar, J. Ding, X. Su, S. Li, F. Li, Z. Yu, J. Shang, Y. Liu, ACS Applied Electronic Materials, 1 (2019) 1866-1872.
[30] P.A. Alekseev, V.A. Sharov, M.S. Dunaevskiy, D.A. Kirilenko, I.V. Ilkiv, R.R. Reznik, G.E. Cirlin, V.L. Berkovits, Nano letters, 19 (2019) 4463-4469.
[31] Z. Qu, Y. Fu, B. Yu, P. Deng, L. Xing, X. Xue, Sensors and Actuators B: Chemical, 222 (2016) 78-86.
[32] P. Bhatia, M. Nath, Journal of Water Process Engineering, 33 (2020) 101017.
[33] P. Das, R. Biswal, R. Choudhary, S. Khan, R. Meena, N. Mishra, P. Mallick, Materials Research Express, 6 (2019) 106413.
[34] R. Yu, C. Pan, J. Chen, G. Zhu, Z.L. Wang, Advanced Functional Materials, 23 (2013) 5868-5874.
[35] R. Yu, C. Pan, Z.L. Wang, Energy & Environmental Science, 6 (2013) 494-499.
[36] L. Chen, F. Xue, X. Li, X. Huang, L. Wang, J. Kou, Z.L. Wang, ACS nano, 10 (2015) 1546-1551.
[37] R. Yu, W. Wu, Y. Ding, Z.L. Wang, ACS nano, 7 (2013) 6403-6409.
[38] W. Wu, Z.L. Wang, Nano letters, 11 (2011) 2779-2785.
[39] L. Wang, S. Liu, Z. Zhang, X. Feng, L. Zhu, H. Guo, W. Ding, L. Chen, Y. Qin, Z.L. Wang, Nano Energy, 60 (2019) 724-733.
[40] R. Pessoa, M. Fraga, L. Santos, N. Galvão, H. Maciel, M. Massi, Plasma-assisted techniques for growing hard nanostructured coatings: An overview, Anti-Abrasive Nanocoatings, Elsevier2015, pp. 455-479.
[41] P. Liu, T. Luo, J. Xing, H. Xu, H. Hao, H. Liu, J. Dong, Nanoscale research letters, 12 (2017) 558.
[42] B. Inkson, Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) for materials characterization, Materials characterization using nondestructive evaluation (NDE) methods, Elsevier2016, pp. 17-43.
[43] A. Chatterjee, Noyes Publications2001.
[44] D.B. Williams, C.B. Carter, The transmission electron microscope, Transmission electron microscopy, Springer1996, pp. 3-17.
[45] Y.J. Chen, S. Brahma, C.P. Liu, J.-L. Huang, Journal of Alloys and Compounds, 728 (2017) 1248-1253.
[46] Z.L. Wang, Wiley Encyclopedia of Electrical and Electronics Engineering, (2001) 1-18.
[47] Y. Liu, M. Kauser, D. Schroepfer, P. Ruden, J. Xie, Y. Moon, N. Onojima, H. Morkoc, K.-A. Son, M. Nathan, Journal of applied physics, 99 (2006) 113706.
[48] C.H. Wang, K.Y. Lai, Y.C. Li, Y.C. Chen, C.P. Liu, Advanced Materials, 27 (2015) 6289-6295.
校內:2024-02-24公開