In this study anti-reflection (AR) nano-structures on planar and curved glass surfaces were fabricated using contact transferred and masked embedded lithography (CMEL). Silicon wafer was used as a primary mold to create nano pillar on ultraviolet-polydimethylsiloxane (UV-PDMS). Thin metal layer was created on UV-PDMS through electron beam evaporation system and further that metal was transferred to thin photoresist film through metal contact transfer process. Photoresist film was coated on glass substrate and the metal layer act as a mask on it due to its periodicity. Dry etching with RIE system was performed to etch residual layer of PR film and glass substrate. During etching process, O2 with Ar was used for PR and CF4 with Ar for glass substrate. Anti-reflection nano-structures were created after completion of etching process, due to which parabolic pillar shape with 150 nm in height,185 nm of base diameter was obtained. Ultraviolet/visible/near-infrared (UV/VIS/NIR) spectrometer was used to verify the optical transmission of AR structure, 2.9 % improvement was observed in visible range of light from 400 nm to 700 nm. Further, Finite element method was employed in COMSOL simulation software to investigate the effect of various shaped nano-structure. Improvement in the optical transmission of the curved glass surface was achieved through utilizing the process as mentioned above. Applications of this study can be found in a broad range of optical system such as cellphone lenses, and solar cell etc.

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