| 研究生: |
黃冠堯 Huang, Guan-Yao |
|---|---|
| 論文名稱: |
楔型體平面上低溫電漿與平面震波交互作用之探討 Investigation of Planar Shock Interaction on a Wedged-Surface with Low Temperature Plasma |
| 指導教授: |
尤芳忞
YU, FAN-MING |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 航空太空工程學系 Department of Aeronautics & Astronautics |
| 論文出版年: | 2007 |
| 畢業學年度: | 95 |
| 語文別: | 中文 |
| 論文頁數: | 104 |
| 中文關鍵詞: | 彩色紋影法 、低溫電漿 、馬赫數 、正規反射 、馬赫反射 |
| 外文關鍵詞: | Mach reflection, low temperature plasma, Mach number, Regular reflection, color Schlieren |
| 相關次數: | 點閱:77 下載:1 |
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本實驗是在討論楔型體35度和50度的模型分別在有無低溫電漿作用於斜面上,在平面震波的交互作用下,觀察其震波反射的行為,由於模型的角度之差異,二者分別產生了正規反射和馬赫反射兩種現象。由設定的馬赫數1.35至1.68的範圍內,來探討入射震波、反射震波之間的夾角關係,並探討隨著馬赫數的增加,震波結構變化的狀況,採用彩色紋影法的拍攝技術,擷取記錄震波作用於模型上的影像。結果顯示入射震波和反射震波的夾角於無電漿時,隨入射震波之增強而增大,而電漿的作用使它更加大些。由動態壓力量測結果顯示,比較有無電漿作用下的反射震波壓力脈波,前者比後著為小,亦即電漿作用下反射震波有明顯減弱的趨勢。
The study on a thirty-five degree wedged model and a fifty degree wedged model with and without low temperature plasma under the interaction of a planar shock wave have been done. The Regular reflection and Mach reflection have been observed on each model with Mach number range of 1.35-1.68. As the Mach number increased, the structure of the reflection shock varied. The color Schlieren photograph show that the angle between the incident shock and the reflection shock becomes larger for models under large incident shock Mach number as well as for model with low temperature plasma. The measured dynamic pressure of reflection shock wave indicates that its strength is weaker for models with lower incident Mach number as well as for models with low temperature plasma .
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