本篇論文研究在超高真空系統中，2-氯丙醯氯(2-Chloropropionyl chloride, CH3CHClCOCl)在Cu(100)表面的熱化學反應，探討其反應中間態與反應產物。所運用的表面分析技術包括:程序控溫反應/脫附(Temperature-programmed reaction/desorption, TPR/D)、反射-吸收紅外光譜(Reflection-absorption infrared spectroscopy, RAIRS)和X-光光電子能譜(X-ray photoelectron spectroscopy, XPS)。
CH3CHClCOCl/Cu(100)的熱反應脫附產物為甲基烯酮(Methyl ketene, CH3CH=C=O)。由RAIRS及XPS圖譜，發現CH3CHClCOCl吸附於Cu(100)表面(110 K)時，2個CCl鍵可同時斷鍵並形成甲基烯酮。甲基烯酮會因2-氯丙醯氯暴露量的高低，在Cu(100)上有不同的吸附情形。在低暴露量時，CH3CHClCOCl會全數分解成甲基烯酮，於180 K，甲基烯酮以2-(C,C)結構吸附在表面，最後約290 K脫附離開表面。在高暴露量時，部分CH3CHClCOCl吸附於表面時也分解形成甲基烯酮，並隨著母分子脫附一同離開表面。僅有少量的甲基烯酮會以1-(C)或2-(C,C)結構吸附於表面，低於300 K漸漸脫離表面。
另外，我們也利用DFT計算模擬CH3CHClCOCl吸附在Cu(100)的情形。結果顯示斷CCl鍵是一易行的路徑。在某些條件下，CH3CHClCOCl在Cu(100)表面上可同時去兩個氯形成甲基烯酮。

The thermal chemistry of 2-chloropropionyl chloride (CH3CHClCOCl) on Cu(100) surface in an ultrahigh vacuum (UHV) system was studied with temperature-programmed reaction/desorption (TPR/D), reflection-adsorption infrared spectroscopy (RAIRS) and X-ray photoelectron spectroscopy (XPS).
Thermal decomposition of CH3CHClCOCl on Cu(100) results in the desorption of methyl ketene (CH3CHC=C=O). The RAIRS and XPS results show that the CH3CHClCOCl molecules may undergo bond cleavage of the CHCl and C(O)Cl, simultaneously, forming to methyl ketene, upon adsorption on Cu(100) (110 K). The methyl ketene has different adsorption states on Cu(100), depending on the CH3CHClCOCl exposure. At low exposures, CH3CHClCOCl decomposes into methyl ketene completely. The methyl ketene can be bonded on the surface in 2-(C,C) structure, and finally is desorbed from the surface near 290 K. At high exposures, a part of surface CH3CHClCOCl molecules decompose to form methyl ketene, which is mostly desorbed together with the intact CH3CHClCOCl molecules. A small amount of the methyl ketene is still adsorbed on the surface with 1-(C) or 2-(C,C) structure, and eventually desorbs from the surface below 300 K.
Moreover, DFT calculations have been performed to study the adsorption of CH3CHClCOCl on Cu(100). It is found that CCl cleavage is a favorable process on Cu(100). In some calculations, complete dichlorination of CH3CHClCOCl on Cu(100) can occur to form methyl ketene.

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