本實驗選用二氧化矽 (Silica, SiO2) 和乳膠 (Latex, PS) 兩種粉體來進行等溫加熱蒸氣誘導自組裝 (Isothermal Heating Evaporation Induced Self-Assembly, IHEISA) 研究。SiO2和 PS 膠體球則分別是利用 Stöber 法以及分散聚合 (dispersion polymerization) 的製程來取得。
在一元膠體晶體自組裝方面，不同 pH 值的溶液會影響粒子表面的帶電行為，實驗結果發現，酸鹼的添加雖然會增加粒子的表面電位有助於粒子得分散，但電解質的添加亦會造成系統中離子濃度的上升而使得店雙層厚度下降，導致粒子間容易有弱凝聚的現象產生而無法進行自組裝反應。此外，本研究顯示溶劑的蒸發速率為影響粒子排列程度之主要參數，欲獲得高整齊度的膠體晶體，必須非常小心的控制蒸發速率，因其具有一定的最佳化區間，並與粒子粒徑、粒子密度以及載玻片放置等參數有密切的關聯性。當粒子受重力影響較容易產生沉降或是粒子本身動能較小時，則需給予一較快的蒸發速率使粒子能傳送至液面並於液面行自組裝。設定另一影響粒子排列程度之參數為沉積玻片的表面性質，發現其對於粒子的排列程度影響不大。而為了避免電解質的添加而造成弱凝聚現象，行 IHEISA 反應的 pH 區間則以原始溶液的 pH 範圍進行探討。
在二元膠體晶體的製備方面，以 PS 以及 SiO2 兩種膠體球彼此呈相斥的條件下進行二元膠體晶體之等溫加熱蒸氣誘導自組裝研究，且由前一部分一元膠體晶體的實驗發現，電解質的添加容易造成粒子間的弱凝聚現象而無法行自組裝，所以採用相混後之原始 pH 區間進行 IHEISA 反應，pH區間位於 9 ~10之範圍內。實驗結果證實製備二元膠體晶體自組裝行為強烈受到兩種膠體粒子的粒徑比 (γS/L) 以及數量比 (N) 的影響，其最佳蒸發速率亦隨之改變，與一元膠體晶體的自組裝行為有著明顯的差異。

Choosing the powder of silica (SiO2) and latex (PS) to perform in the isothermal heating evaporation induced self-assembly (IHEISA) research. Silica and latex prepared with the process of Stöber and dispersion polymerization respectively.
In the aspect of the self assembly of unary colloidal crystal films (C.C.Fs), solutions with various pH values will affect the behavior of potential on particle surface. Observation from the experiment results that show although the addition of acid or base will increase the surface potential of particles but electrolyte added will contribute to the concentration of ions increasing and decrease the depth of the electric double layer instead. These will cause the flocculated between particles easily and unable proceed the following IHEISA process. Besides, set the evaporation rate of the solvent and the surface properties of the substrate as the parameters which affect the array degree of the colloidal crystal films. And observe the pH range which is suitable for self-assembly. Further, the relation between the evaporation rate and particle size, deposition methods, concentration of the suspension and tilted angle of the substrate on the thickness of the colloidal crystal films will also be probed in the research. More, find out one thing in the research is that controlling the evaporation rate carefully will get the colloidal crystal films with high array degree. Because there are the optimum range for evaporation rate and it has the closed relation with the particle size、particle density、substrate position and so on.
In the aspect of the self assembly of binary colloidal crystal films, take the condition of repelling potential between the surface of SiO2 and PS colloidal particle to take part in the IHEISA process research. And find out from the front C.C.Fs experiment, electrolyte added easily cause the weakly flocculated between particles and unable proceed the following IHEISA process. So it take the original pH after mixing to continue the following IHEISA reaction, and the pH range locates from 9 to 10.The experiment results reveal that the preparation of the binary colloidal crystal films is strongly affected with the particle size ration (rS/L) and number ratio (N) of the two colloidal particles and, and while the optimum evaporation rate changed, there are an obviously difference compare to the self-assembly of the C.C.Fs.

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