類鑽碳膜具有許多的優異性質，如：高硬度、高化學抵抗性、良好的熱傳導性，且絕緣性高，並具有可見光到紅外光波段的光穿透性及極佳的生物相容性，被應用在耐磨耗、耐熱、電子、光學與生醫材料等方面，是一種泛用度極高的一種材料。然而因製程上的離子轟擊效應，導致類鑽碳膜產生很高的壓縮應力，造成類鑽碳膜容易與基板剝離，產生附著力不佳的缺點。
本研究使用微波電子迴旋共振化學氣相沈積法(MW-ECR CVD)成長類鑽碳膜，以乙炔及氬氣為反應氣體，基材使用SKD61鋼材，並透過製程上基板偏壓及乙炔氣體流量的改變，來研究類鑽碳膜的性質。
研究結果顯示，當基板偏壓增加時，類鑽碳膜的沈積速率、硬度、抗磨耗性都呈現上升的趨勢，而表面粗糙度、鍍層的臨界荷重皆呈現下降的趨勢，透過拉曼光譜的分析，其特性峰有往低波數偏移現象。當乙炔氣體流量增加時，類鑽碳膜的沈積速率，硬度皆微微上升，而表面粗糙度及臨界荷重則呈現下降的趨勢，透過拉曼光譜的分析，其特性峰有往低波數偏移現象。

Diamond-Like carbon (DLC)films have received a considerable amount of attention recently due to their chemical stability，high optical transparency and hardness .These properties make the films suitable for a number of applications such as protective and anti-reflection coating，wear resistant overcoat and biocompatible coatings .However，the sp3 bonding of carbon atoms in the amorphous structure are severely distorted and strained，resulting in a large compressive stress within the films .
Amorphous hydrogenated diamond-like carbon films were deposited on SKD61 by electron cyclotron resonance chemical vapor deposition (MW ECR-CVD)using C2H2 and Ar as gas sources .The properties of the film were investigated by electron spectroscopy for chemical analysis(ESCA)、Auger electron spectroscopy(AES)、scanning electron microscope (SEM)、transmission electron microscope(TEM)、atomic force microscope(AFM)、Raman spectroscopy and pin on disk tribometer .
The results reveal that the structure、adhesion 、hardness and wear rate of the films depend its process parameters bias and C2H2 flow rate .With the bias increasing，the ratio of sp3 to sp2 and hardness is increasing . With the C2H2 flow rate increasing，the ratio of sp3 to sp2 and hardness is increasing.

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