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研究生: 陳昌祺
Chen, Chang-Chi
論文名稱: 濺鍍功率與退火效應對類鑽碳膜影響之光學分析
Optical analysis and annealing effect of diamond like carbon films grown by sputtering
指導教授: 田興龍
Tian, Shing-Long
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 44
中文關鍵詞: 射頻濺鍍拉曼光譜退火類鑽碳膜
外文關鍵詞: RF, annealing, Raman, DLCF
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  • 本實驗以射頻濺鍍(Radio Frequency Sputtering)方式成長類鑽碳膜(Diamond like carbon Flims,DLCF)。以拉曼光譜來探討不同濺鍍功率與不同厚度之DLCF的品質優劣及退火過程對DLCF之影響。

    結果顯示,在濺鍍功率210W、厚度61.6nm時,能得到最佳的DLCF;隨著厚度、退火溫度與退火時間的增加,DLCF會有石墨化的傾向。

    Diamond like carbon films (DLCFS) were grown by radio frequency sputtering at different sputtering power and different thickness. The DLCF sample and its annealing effect were analized by Raman spectra.

    Our results show that, the best DLCF was grown at 210W,61.6nm. With the increasing thickness, annealing temperature and annealing time, the DLCF was graphized.

    中文摘要…………………………………………………………………….… 4 英文摘要…………………………………………………………………………5 誌謝………………………………………………………………………6 目錄………………………………………………………………………7 圖目錄…………………………………………………………………………8 第一章 前言………………………………………………….………………………9 第二章 原理…………………………………………………………………………11 2-1 濺鍍原理……………………………………………………………………11 2-2 拉曼光譜原理………………………………………………………………14 2-3 DLCF的拉曼光譜……………………………………………………………15 第三章 樣品與實驗裝置……………………………………………………………19 3-1 射頻濺鍍系統………………………………………………………………19 3-2 退火系統……………………………………………………………………19 3-3 拉曼光譜系統………………………………………………………………22 第四章 實驗結果與討論……………………………………………………………23 4-1 濺鍍功率與成長速率………………………………………………………23 4-2 不同濺鍍功率之拉曼光譜分析……………………………………………24 4-3 不同成長厚度之拉曼光譜分析……………………………………………29 4-4 不同退火溫度之拉曼光譜分析……………………………………………32 4-5 不同退火時間之拉曼光譜分析……………………………………………32 第五章 結論…………………………………………………………………………40 參考文獻…………………………………………………………………….…………41

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