| 研究生: |
陳昌祺 Chen, Chang-Chi |
|---|---|
| 論文名稱: |
濺鍍功率與退火效應對類鑽碳膜影響之光學分析 Optical analysis and annealing effect of diamond like carbon films grown by sputtering |
| 指導教授: |
田興龍
Tian, Shing-Long |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 物理學系 Department of Physics |
| 論文出版年: | 2007 |
| 畢業學年度: | 95 |
| 語文別: | 中文 |
| 論文頁數: | 44 |
| 中文關鍵詞: | 射頻濺鍍 、拉曼光譜 、退火 、類鑽碳膜 |
| 外文關鍵詞: | RF, annealing, Raman, DLCF |
| 相關次數: | 點閱:83 下載:1 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本實驗以射頻濺鍍(Radio Frequency Sputtering)方式成長類鑽碳膜(Diamond like carbon Flims,DLCF)。以拉曼光譜來探討不同濺鍍功率與不同厚度之DLCF的品質優劣及退火過程對DLCF之影響。
結果顯示,在濺鍍功率210W、厚度61.6nm時,能得到最佳的DLCF;隨著厚度、退火溫度與退火時間的增加,DLCF會有石墨化的傾向。
Diamond like carbon films (DLCFS) were grown by radio frequency sputtering at different sputtering power and different thickness. The DLCF sample and its annealing effect were analized by Raman spectra.
Our results show that, the best DLCF was grown at 210W,61.6nm. With the increasing thickness, annealing temperature and annealing time, the DLCF was graphized.
[1] P.K. Bachmann and R. Messier,Emerging Technology of Diamond Thin Film,C
&EN,May15 (1989) P24.
[2] K.E. Spear,Earth and mineral Science,56 (1987) p53~59.
[3] G.H. Jonson,A.R. Badzian and M.W. Geis,Diamond and Diamond-like Materials
Synthesis,MRS,Pittsburgh,PA(1988).
[4] I.M. Buckley-Golder and A.T. Collins,Diamond Relat. Mater.1(1992) p1083.
[5] K. Kobayashi,K. Yamamoto,N. Mutsukura and Y. Machi,”Sputtering
characteristics of diamond and hydrogenated amorphous carbon filma by
R.F.plasma”Thim Solid Films 185(1900),pp71-78.
[6] M.A. Tamor,C.H. Wu,R.O. Carter and N.E. Lindsay, Appl. Phys. Lett. 55
(1989) 1388.
[7] R.J. Hill,Physical Vapor Deposition,Temescal.
[8] D.L. Smith,Thin Film Deposition,19 ch.9,p.453.
[9] Z.C. Feng,A.A. Allerman,P.A. Barnes and S. Perkowitz,Appl. Phys. Lett.
60, 1848 (1992).
[10]J.P. Estrera,P.D. Stevens,R. Glosser,W.M. Duncan,Y.C. Kao,Y.H. Liu and E.A. Beam,Appl. Phys. Lett. 61,1927 (1992).
[11]G.Lucovsky,M.H. Brodsky,M.F. Chen,R.J. Cgicotka and A.T. Ward,Phys.
Rev. B4, 1945 (1971).
[12]Koji Yano and Takashi Katoda,J. Appl. Phys. 70,7036 (1991).
[13]D.P. Bour,J.R. Shealy,A. Ksendzov and Fred Pollak,J. Appl. Phys. 64,
6456 (1988).
[14]F.H. pollak and H. Shen,in Proceeding of the Society of Photooptical
Instrumentation Engineers (SPIE,Bellingham,1898),Vol. 1037,P16.
[15]P.J. Fallon,V.S. Veerasamy,C.A. Davis,J. Robertson,G.A.J. Amaratunga,
W.I. Milne,J. Koskinen, Phys. Rev. B48 (1993),P.477.
[16]V.S. Veerasamy,G.A.J. Amaratunga,E.I. Milne,P.Hewitt,P.J. Fallon,
D.R.Mckenzie,C.A. Davis,Diamond Relat.Mater.,2 (1993) p.782.
[17]F.Tuinstra and J.L. Koenig,Raman Spectrum of Graphite,J. Chen. Phys. 53,
1126-1130 (1970).
[18]S.A. Solin,Raman and Ir Studies of Graphite Interca;ates,Phys. B99,443-
452 (1980).
[19]M.A. Tamor and W.C. Vassel,Raman Fingerpriniting of Amorphous Carbon
Films,J. Appl. Phys. 76,[6]3823-3830 (1994).
[20]Capano,N.T. McDeutt,R.K.Singh and F.Qian,Characteriztion of Amorphous
Carbon Thin Film,J. Vac. Sci. Thchnil. A,14,[2]431-435 (1966).
[21]Tasi,D.B. Bogy,M.K. Kundmann,D.K. Veirs,M.R. Hilton and S.T. Mayer,
Structure and Properties of Sputtered Carbon Overcoats on Rigid Magenetic
Media Dicks,J. Vac. Sci. Technol. A6,[4]2307-2315 (1998).
[22]何主亮,常挽瀾,陳育智,電漿化學氣相沉積氮化碳膜的微觀結構與機械性質,真空科
技,第9卷,第2期,34-35,(1996).
[23]Vappuladium,H.E. Jackson and R.L.C. Wu,Raman Scattering From Hydrogenated
Amorphous Carbon Films,J. Appl. Phys. 77,[6]2714-2718 (1995).
[24]B.K. Tay,X. Shi,H.S. Tan,H.S. Yang,Z. Sun,Surface and Coatings
Techonl. 105( 1998) p155~158.
[25]J.Robertson,Mechanical Properties and Structure of Diamond like Carbon,
Diamond Relat. Mater. 2 (1993) p.984.
[26]C.A. Davis,A simple Model for Formation of Compressive Stress in Thin Film
by Ion Bombardment,Thin Solid Films,226 (1993) . 30.
[27]B.A Pailthorpe,Molecular-Dynamics Simulation of Atomic Process at the Low
Temperature Diamond (111) surface,J. Appl. Phys. 70 (1991) 543.
[28]H.P Kaukonen and R.M. Nieminen,Molecular-Dynmaics of the Growth of
Diamondlike Films by Energetic Carbon-Atim Beams, Phys. Rev. Lett. 68
(1992) 620.