雷射輔助式金屬轉印技術是利用雷射在預先製作好且蒸鍍上金屬的模仁表面上進行照射，進而造成金屬層加熱的效果，同時基板在一預壓力下與模仁進行接觸，藉此將模仁上具有特定圖案的金屬層轉印至基板上。本文利用此雷射金屬轉印技術，將矽模仁上具有奈米圖案的金屬層轉印至石英基板上，並以此金屬層作為蝕刻阻擋層對石英基板進行乾式蝕刻，進而快速地製作出微米級以及奈米級尺度的石英模具。後續再以製作完畢的石英模具進行雷射輔助直寫式滾輪奈米壓印，直接在矽基板上壓印出奈米等級的三維微結構。
在雷射金屬轉印的實驗中，我們是以KrF準分子雷射(波長248 nm，脈衝時間30 ns)作為加熱源，同時探討在不同雷射能量密度(Laser Fluence)(25 mJ/cm2 ~ 50 mJ/cm2)以及施加載重(1 kg ~ 3.5 kg)等參數下金屬轉印的效果。在實驗架構方面，同時採用平面式轉印機構以及滾輪式轉印機構等兩種架構進行雷射金屬轉印的實驗，進而探討模仁與基板之間的接觸效果對圖案轉移的影響性。同時我們引入氣相沉積的製程，在矽模仁上蒸渡抗沾黏層，藉此改變金屬層與模仁以及基板三者之間彼此的鍵結力，進而提升圖案轉印的成功率。
最後利用雷射金屬轉印技術所製作出的奈米級石英模仁，進行雷射輔助直寫式滾輪奈米壓印，透過滾印的技術，直接在矽基板上大面積的壓印出微米等級以及奈米等級的三維微結構。

This thesis investigates a special type of nano-patterning method, named Laser-Assisted Metal Contact Printing (LAMP), which transfers a metal pattern directly from a silicon mold to a quartz substrate based on contact loading and pulsed laser heating. Subsequent dry etching on the patterned quartz substrate using the transferred metal pattern as the etching mask completes the fabrication of quartz molds with micro- or nano-features. Furthermore, using these fabricated quartz molds, we can continuously and rapidly replicate the nano- and micro- structures on silicon wafers by using a roller type of laser-assisted direct imprinting method, called Laser-Assisted Roller Imprint (LARI).
In this study, we utilize a single KrF excimer laser pulse (248 nm wavelength and 30 ns pulse duration) as the heating source. The influence of laser fluence and the imprinted pressure on the LAMP process and its results is studied by varying the laser fluence (25 mJ/cm2 ~ 50 mJ/cm2) and the imprinted load (1 kg ~ 3.5 kg). Both planar and roller-based metal transfer mechanisms are tested and compared. In the meanwhile, the introduction of an anti-adhesion thin film on the surface of silicon mold shows great improvements on the metal film patterning of LAMP.
Finally, the fabricated nano-scaled quartz molds are applied to the imprinting of silicon wafer by using Laser-assisted Roller imprinting (LARI), which is a continuous type of nano-fabrication for large area imprinting with a much higher throughput. Important imprinting parameters such as laser fluence and loading force as well the imprinting speed and the imprinted 3D nano-structures are investigated experimentally. Good results are observed which demonstrate the feasibility and potentials of LARI process.

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