本篇論文之主要目的為發展量測電漿參數之微波診測儀器－微波干涉儀。首先我們從電漿波理論來探討電磁波於磁化電漿的行為，電磁波的電場方向與外加磁場方向的不同會使得其色散關係有所不同。進而可以得知電磁波其相位變化與電漿參數(如電漿密度)有所關連。干涉計為一利用電磁波通過電漿後所產生之相位差來量測電漿密度的非接觸式之量測儀器，利用此儀器量測成大電漿中心磁化電漿系統之電漿密度，並探討之後可以改進的地方。

In the thesis, we develop a microwave interferometer system to measure the line-integrated plasma density. At first, we discuss the EM wave propagation in magnetized plasmas by using the plasma wave theory. The EM wave dispersion relation depends on the direction of the wave electric field with respect to the external magnetic field. We can use the dispersion relation to obtain the relation between the phase delay of the probe wave and the line-integrated plasma density. The interferometry system measures the phase delay and is a non-contact instrument for the plasma density measurement in magnetized plasmas. The EM wave is divided into two paths: the probe wave passes through the plasma and the other wave serves as the reference signal. We use mixers to combine the two signals and obtain the phase difference to calculate the plasma line-integrated density. The plasma line-integrated density is on the order of 1015～1017 m-2 in the magnetic mirror plasma device at the Plasma and Space Science Center (PSSC) at the National Cheng Kung University (NCKU). Finally, we discuss what can be improved in the future.

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