| 研究生: |
廖偉帆 Liao, Wei-Fan |
|---|---|
| 論文名稱: |
ZnS/Ag/ZnS薄膜應用於上發光有機發光元件之探討 The study of ZnS/Ag/ZnS thin film for top-emission organic light emitting diodes |
| 指導教授: |
洪昭南
Hong, Chau-Nan |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 化學工程學系 Department of Chemical Engineering |
| 論文出版年: | 2007 |
| 畢業學年度: | 95 |
| 語文別: | 中文 |
| 論文頁數: | 105 |
| 中文關鍵詞: | 上發光 、有機發光元件 |
| 外文關鍵詞: | ZnS/Ag/ZnS, Top-emission, OLED |
| 相關次數: | 點閱:81 下載:2 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本論文主要為上陰極發光有機發光元件的製作,上陰極電極之設計方式採用半透明金屬薄膜,再加上ZnS/Ag/ZnS三層結構,因為全部材料都可採用熱蒸鍍的方式鍍膜,這樣的設計能避免製作氧化物透明導電膜的時候,電漿傷害底下有機層的問題,且讓光能順利的耦合至外部。因為Ag的功函數與有機層HOMO能階之間的能障較大,我們在電洞注入層中加入P-型摻雜層F4-TCNQ,有效增加電洞注入能力。當上陰極結構為Al/ZnS/Ag/ZnS,各厚度為17/37/8/37nm時,元件結構為
Ag/CuPc:F4-TCNQ/NPB/Alq3/BCP/LiF/Al/ZnS/Ag/ZnS,元件在13V時,元件最大亮度為20000 cd/m2,元件的電流功率為2.6 cd/A。此外,我們更進一步將Al厚度降低至7 nm,上陰極結構一樣為Al/ZnS/Ag/ZnS,當各層厚度為7/37/15/37nm時,元件在15V時,元件最大亮度為31000 cd/m2,元件的電流功率為5.6 cd/A,因為Ag 厚度15 nm所構成的薄膜可提供較佳的光學性質與電性,同時也可以有效提供陰極的電性,使電子注入量增加而使其元件發光效率提升。在反射陽極Ag的表面上,利用熱蒸鍍氧化鎳薄膜可以有效改善Ag表面的功函數,因為氧化鎳薄膜的功函數高達 5.0 e.V,有效降低與有機層間的能障,增加電洞注入,元件起始電壓也降到3 V左右。
This subject focused on the fabrication of top-cathode emission organic light emitting diodes. To make use of the semi-transparent metal is our design for the top-cathode and utilize ZnS/Ag/ZnS multilayer structure as top-capping layer. All organic layers and electrodes can fabricate by thermal evaporation. The energy barrier between the work function of Ag anode and the HOMO of the organic material was high, so we doped F4-TCNQ into the hole-injection layer(CuPc) to enhance the amount of hole injection.
Ag/CuPc:F4-TCNQ/NPB/Alq3/BCP/LiF/Al/ZnS/Ag/ZnS was device structure, the maximum brightness of 20000cd/m2 was obtained at 13V, maximum current efficiency was 2.6 cd/A with the cathode thickness was 17/37/8/37 nm individually. We tried to lower the Al thickness from 17nm to 7nm, the cathode with a structure of Al/ZnS/Ag/ZnS and 7/37/15/37 nm respectively was fabricated. The device structure was the same with above, maximum brightness of 31000cd/m2 was obtained at 15V, maximum current efficiency was 5.6 cd/A. When Ag thickness was adjusted to 15 nm can increase the amount of electron injection effectively and at the same time, the efficiency of device was raised because of the device had much amount of electron.
We modified the surface work function of reflective anode Ag with NiO by thermal evaporation. NiO was a high work function material. The work function of NiO was 5.0 e.V, it can lower the barrier between the anode and organic layer to increase the amount of hole injection. The turn-on voltage of the device reduced to 3 V.
[1] J. R. Sheats, H. Antoniadis, M. Hueschen, W. Leonard, J. Miller, R. Moon, D. Roitman, and A. Stocking, Science, 273, 884 (1996)
[2] P. Pope, H. P. Kallmann, and P. J. Magnante, Journal of Chemical Physics, 38, 2042 (1963).
[3] W. Helfrich, and W. G. Schneider, Physical Review Letters, 14, 229 (1965)
[4] D. F. Williams, and M. Schadt, Proceedings IEEE, 58, 476 (1970)
[5] C. W. Tang, and S. A. VanSlyke, Applied Physics Letters, 51, 913 (1987)
[6] J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackay, R. H. Friend, P. L. Burns, and A. B. Holmes, Nature, 347, 539 (1990)
[7] M. J. Flynn, J. Kanicki, A. Badano, and W. R. Eyler, Imaging & Therapeutic Technology, 19, 1653 (1999)
[8] G. Mueller, Electroluminescence I-Semiconductor and Semimetals Vol. 64, Academic Press, San Diego, CA USA, 209 (2000)
[9] R. G. Kepler, P. M. Beeson, S. J. Jacobs, R. A. Anderson, M. B. Sinclair, V. S. Valencia, and P. A. Cahill, Applied Physics Letters, 66, 3618 (1995)
[10] P. W. M. Blom, M. J. M. de Jong, and M. G. van Munster, Physical Review B, 55, R656 (1997)
[11] P. R. L. Malenfant, C. D. Dimitrakopoulos, J. D. Gelorme, L. L. Kosbar, and T. O. Graham, Applied Physics Letters, 80, 2517 (2002)
[12] H. Muratal, G. G. Malliaras, M. Uchida, Y. Shen, and Z. H. Kafafi1, Materials Research Society Symposium Proceedings, 665, 227 (2001)
[13] M. Matsumura, T. Akai, and M. Saito, Japanese Journal of Applied Physics, 35, 3468 (1996)
[14] D. Troadec, G. Veriot, R. Antony, and A. Moliton, Synthetic Metals, 124, 49 (2001)
[15] D. Ammermann, A. Böhler, and W. Kowalsky, Annual report, Institut für Hochfrequenztechnik, TU Braunschweig, 48 (1995)
[16] A. L. Burin, and M. A. Ratner, Journal of Physical Chemistry A, 104, 4704 (2000)
[17] C. Adachi, S. Tokito, T. Tsutsui, and S. Saito, Japanese Journal of Applied Physics Part 2, 27, L269 (1988)
[18] C. Adachi, S. Tokito, T. Tsutsui, and S. Saito, Japanese Journal of Applied Physics Part 2, 27, L713 (1988)
[19] W. B. Im, H. K. Hwang, J. G. Lee, K. Han, and Y. Kim, Applied Physics Letters, 79, 1387 (2001)
[20] M. Fujihira, L. M. Do, A. Koike, and E. M. Han, Applied Physics Letters, 68, 1787 (1996)
[21] Y. Sato, S. Ichinosawa, and H. Kanai, IEEE Journal of Selected Topics in Quantum Electronics, 4, 40 (1998)
[22] W. Rieß, H. Riel, P. F. Seidler, and H. Vestweber, Synth. Met., 99, 213 (1999)
[23] Y. Shirota, M. Kinoshita, and K. Okumoto, Proceedings SPIE, 4464, 203 (2002)
[24] M. Ikaia, S. Tokitob, Y. Sakamoto, T. Suzuki, and Y. Taga, Applied Physics Letters, 79, 156 (2001)
[25] 黃春輝, 李富友, 黃岩誼, 光電功能超薄膜, 北京大學出版社, 北京, 中國, 258 (2001)
[26] K. Yamashita, T. Mori, T. Mizutani, H. Miyazaki, and T. Takeda, Thin Solid Films, 33, 363 (2000)
[27] C. Adachi, K. Nagai, and N. Tamoto, Applied Physics Letters, 66, 2679 (1995)
[28] Y. Shirata, Y. Kuwabara, D. Okuda, R. Okuda, H. Ogawa, H. Inada, T. Wakimoto, H. Nakada, Y. Yonemoto, S. Kawami, and K. Imai, Journal of Luminescence,. 72-74, 985 (1997)
[29] Y. Shirota, K. Okumoto, H. Inada, Synthetic Metals, 111-112, 387 (2000)
[30] J. Kido and Y. Iizumi, Chemistry Letters, 26, 963 (1997)
[31] H. Murata, Z. H. Kafafi, and M. Uchida, Applied Physics Letters, 80, 189 (2002)
[32] http://www.cam.ac.uk
[33] J. Kalinowski, Journal of Physics D: Applied Physics, 32, R179 (1999)
[34] U. Wolf, V. I. Arkhipov, and H. Bässler, Physical Review B, 59, 7507 (1999)
[35] S. Barth, P. Müller, H. Riel, P.F. Seidler, W. Rieß, H. Vestweber, U. Wolf , and H. Bässler, Synthetic Metals, 111-112, 327 (2000)
[36] M. Pope, and C. E. Swenberg, Electronic Processes in Organic Crystals and Polymers, Oxford University Press, New York, 379 (1999)
[37] P. E. Burrows, Z. Shen, V. Bulovic, D. M. McCarty, and S. R. Forrest, Journal Applied Physics, 79, 7991 (1996)
[38]http://hackman.mit.edu
[39] H. Raether, Surface Plasmons (Springer , New York, 1988).
[40] A. V. Zayats, I. I. Smolyaninov, A. A. Maradudin, Phys. Reports 408, 131 (2005).
[41] D. A. Schultz, Current Opinion in Biotechnology 14, 13 (2003).
[42] M. Moskovits, Rev. Mod. Phys. 57, 783 (1985).
[43] M. Ohtsu, K. Kobayashi, T. Kawazoe, S. Sangu, and T. Yatsui, IEEE J. Selected Topics Quantum Electron. 8, 839 (2002).
[44] S. Kawata, M. Ohtsu, and M. Irie ed. “Nano-Optics” (Springer, 2002).
[45] P. N. Prasad, “Nanophotonics” (Wiley, Hoboken, NJ, 2004).
[46] S. A. Maier, M. L. Brongersma, P. G. Kik, S. Meltzer, A. A. G. Requicha, and H. A. Atwater, Adv. Mater. 13, 1501-1505 (2001).
[47] S. Kawata ed. “Near-Field Optics and Surface Plasmon Polaritons” (Springer, Berlin, 2001).
[48] J. Tominaga and D. P. Tsai ed., “Optical Nanotehcnologies - The Manipulation of Surface and Local Plasmons”, (Springer, Heidelberg, 2002).
[49] 何符漢、蔡定平、劉威志, 物理雙月刊 24期4卷, p. 558 (2002).
[50] 邱國斌、蔡定平, 物理雙月刊 25期3卷, p. 373 (2003).
[51] P. K Raychaudhuri , J. K. Madathil , J. D. Shore and S. A. VanSlyke, Journal of the SID, 12/3,315(2004)
[52] A . Dodabalapur , L. J. Rothberg, R. H. Jordan , T. M . Miller, R. E. Slusher, and Julia M. Phillips, Journal of Applied Physics, 80(12), 6954(1996)
[53] G. Gu, D. Z. Garbuzov, P. E. Burrows, S. Venkatesh, S. R. Forrest, and M. E. Thompson, Opt. Lett., 22, 396 (1997).
[54] N. K. Patel, S. Cinà, and J. H. Burroughes, IEEE J. Sel. Top. Quant., 8, 346 (2002).
[55] T. Tsutsui, M. Yahiro, H. Yokogawa, K. Kawano, and M. Yokoyama, Adv. Mater., 13, 1149 (2001).
[56] H. Yokogawa, K. Kawano, M. Yokoyama1, T. Tsutsui, M. Yahiro, and Y. Shigesato, Mat. Res. Soc. Symp. Proc., 660, JJ5.19.1 (2001).
[57] S. Möller and S. R. Forrest, J. Appl. Phys., 91, 3324 (2002).
[58] Y. J. Lee, S. H. Kim, J. Huh, G. H. Kim, Y. H. Lee, S. Hwan Cho, Y. C. Kim, and Y. R. Do, Appl. Phys. Lett., 82, 3779 (2003).
[59] Y. R. Do, Y. C. Kim, Y. W. Song, C. O. Cho, H. Jeon, Y. J. Lee, S. H. Kim, and Y. H. Lee, Adv. Mater., 15, 1214 (2003).
[60] I. Schnitzer, E. Yablonovitch, C. Caneau, T. J. Gmitter, and Scherer, Appl. Phys. Lett., 63, 2174 (1993).
[61] A. Köhler, J. S. Wilson, and R. H. Friend, Adv. Mater., 14, 701 (2002).
[62] V. Bulovic, V. B. Khalfin , G. Gu, P. E. Burrows, Phys. Rev. B, 58, 3730(1998)
[63] J. J. Shianga, A.R. Duggal, J. Appl. Phys., 95, 2880(2004).
[64] S. Moller, S. R. Forrest, J. Appl. Phys., 91, 3324(2002)
[65] G. Gu, D. Z. Garbuzov, P. E. Burrows, S. Vendakesh, S. R. Forrest, and M.E. Thompson, Opt. Lett., 22,396(1997).
[66] M. H. Lu, J. C. Sturm, J. Appl. Phys., 91, 595(2002).
[67] T. Tsutsui, M. Yahiro, H. Yokogawa, K. Kawano, M. Yokoyama, Adv. Mater., 13,1149(2001)
[68] H. J. Peng, Y. L. Ho, X. J. Yu, H. S. Kwok, J. Appl. Phys.,96,1649(2004).
[69] Y. R. Do, Y. C. Kim, Y. W. Song, C. O. Cho, H. Jeon, Y. J. Lee, S. H. Kim, Y. H. Lee, Adv. Mater.,15,1214(2003)
[70] D. R. Baigent, R. N. Marks, N. C. Greenham, R. H. Friend, S. C. Moratti, and A. B. Holmes, Applied Physics Letters, 65, 2636 (1994)
[71] Tadashi ISHIBASHI_, Jiro YAMADA, Takashi HIRANO, Yuichi IWASE, Yukio SATO,Ryo NAKAGAWA, Mitsunobu SEKIYA, Tatsuya SASAOKA and Tetsuo URABE Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 45, 4392 (2006)
[72] X. Zhou, M. Pfeiffer, J. S. Huang, J. Blochwith-Nimoth, D. S. Qin, A. Werner, J. Drechsel, B. Maenning, and K. Leo, Applied Physics Letters, 81, 922 (2002)
[73] C. Qiu, H. Peng, H. Chen, Z. Xie, M. Wong, and H. S. Kwok, IEEE Transactions on Electron Devices, 51, 1207 (2004)
[74] L. S. Hung, and J. Madathil, Thin Solid Films, 410, 101 (2002)
[75] V. Bulovic´, P. Tian, P. E. Burrows, M. R. Gokhale, and S. R. Forrest,Applied Physics Letters, 70, 2954 (1997)
[76] T. Dobbertin, M. Kroeger, D. Heithecker, D. Schneider, D. Metzdorf,
H. Neuner, E. Becker, H. H. Johannes, and W. Kowalskya,
Applied Physics Letters, 82, 284 (2003)
[77] T. Dobbertin, O. Werner, J. Meyer, A. Kammoun, D. Schneider, T. Riedl,E. Becker, H. H. Johannes, and W. Kowalsky, Applied Physics Letters,83, 5071 (2003)
[78] Se-W.Park , Jeong-M. Choi , Eugene Kim , Seongil Im , Applied Surface Science, 244,439-444,(2005)
[79] G. Gu, V. Bulović, P. E. Burrows, S. R. Forrest, and M. E. Thompson,Applied Physics Letters, 68, 2606 (1996)
[80] L. S. Hung, C. W. Tang, M. G. Mason, P. Raychaudhuri, and J. Madathil, Applied Physics Letters, 78, 544 (2001)
[81] C. W. Chen, P. Y. Hsieh, H. H. Chiang, C. L. Lin, H. M. Wu, and C. C. Wu, Applied Physics Letters, 83, 5127 (2003)
[82] H. Riel, S. Karg, T. Beierlein, B. Ruhstaller, and W. Rieß, Applied Physics Letters, 82, 466 (2003)
[83] Han-Ki Kim , Kyu-Sung Lee , J. H. Kwon , Applied Physics Letters, 88, 012103 (2006)
[84] G.L. Ma , A.G. Xu , G.Z. Ran , Y.P. Qiao , B.R. Zhang , W.X. Chen , L. Dai , G.G. Qin , Thin Solid Films 496, 665(2006)
[85] Shufen Chen, Zhonghai Jie, Zhenyuan Zhao, Gang Cheng, Zhijun Wu, Yi Zhao,Baofu Quan, and Shiyong Liu, Xue Li, Wenfa Xie, Applied Physics Letter, 89, 043505(2006)
[86] J. Blochwitz, M. Pfeiffer, T. Fritz, K. Leo, Applied Physics Letters., 73, 729(1998)
[87] M.G. Mason, L.S. Hung, C.W. Tang, S.T. Lee, K.W. Wong, M. Wang,
J. Appl. Phys. 86, 1688 (1999)
[88] G. Leftheriotis, P. Yianoulis, D. Patrikios, Thin Solid Films, 306, 92(1997)
[89]G. Leftheriotis, S. Papaefthimiou, P. Yianoulis, Solid State Ionics,136-137,655(2000)
[90]L. H. Smith, J.A. E. Wasey, W. L. Barnes, Applied Physics Letters,84,2986,(2004)
[91] H. Raether, Surface Plasmons, Springer-Verlag,Hamberg,1989
[92] D. Sarid, Phys. Rev. Lett.,47,1927(1981)
[93]S. Wedge, A. Giannattasio, W. L. Barnes, Organic Electroncs 8,136-137,(2007)
[94] R. B. Pode, C. J. Lee, D. G. Moon, and J. I. Han, Applied Physics Letters, 84, 4614 (2004)
[95] M.G. Mason, L.S. Hung, C.W. Tang, S.T. Lee, K.W. Wong, M. Wang,
J. Appl. Phys. 86, 1688 (1999)
[96]K. Furukawa, Y. Terasaka, H. Ueda, M. Matsumura, Synth. Met.,91,99(1997)
[97] H. B. Michaelson, IBM J. Res. Dev. 22, 72 (1978)
[98] Chieh-Wei Chen, Ping-Yuan Hsieh, Huo-Hsien Chiang, Chun-Liang Lin, Han-Ming Wu, and Chung-Chih Wu, Appl. Phys. Lett.,83,5127(2003)
[99] I-Min Chan, Tsung-Yi Hsu, and Franklin C. Hong , Appl. Phys. Lett.,81,1899,(2002)
[100] H. Sato, T. Minami, S. Takata, and T. Yamada, Thin Solid Films, 236, 27 (1993)
[101] J. Olivier, B. Servet, M. Vergnolle, M. Mosca, and G. Garry, Synth. Met., 122, 87 (2001).
[102] I. D. Parker, J. Appl. Phys., 75, 1656 (1994)