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研究生: 陳英棋
Chen, Ying-Chi
論文名稱: 基於塔姆電漿共振之二硫化鉬熱載子光偵測器研究
Study on MoS2-based Hot-Electron Photodetectors Enabled by Tamm Plasmon Resonant Enhancement
指導教授: 許進恭
Sheu, Jinn-Kong
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 91
中文關鍵詞: 二硫化鉬塔姆電漿共振熱載子紅外光偵測器布拉格反射鏡
外文關鍵詞: Two-dimensional materials, MoS2, Tamm plasmon resonance, Hot carriers, Infrared photodetector, Distributed Bragg reflector
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  • 本論文設計並實作了基於塔姆電漿共振 (Tamm Plasmon Resonance, TPR) 之二維材料二硫化鉬 (MoS2) 熱載子光偵測器。過渡金屬硫族化合物如單層 MoS2,因具備原子級厚度與優異的載子遷移率,在光電元件領域備受矚目。而單層 MoS2 的本徵能隙約為 1.8 eV,其光學吸收邊界限制在 680 nm 以下,這導致材料先天無法對紅外光譜區產生吸收響應。為突破此一物理能隙限制,本研究利用金屬薄膜激發表面電漿子,並透過朗道阻尼的非輻射衰減產生高動能熱載子,進而利用跨越蕭特基能障 (Schottky barrier) 的內部光電效應 (Internal Photoemission, IPE) 實現紅外光偵測。
    在元件製備與製程方面,本研究選用化學氣相沉積法 (CVD) 成長的單層 MoS2 作為主要的半導體通道材料,並針對近紅外光 (808 nm) 與短波紅外通訊波段 (1550 nm) 兩個目標波段進行調控。為了釐清熱載子的微觀傳輸機制,本研究設計了兩款不同的幾何光罩圖形,透過系統性地改變金屬反射鏡面積大小以及金屬與 MoS2 的幾何重疊比例,確立熱載子的收集條件。
    實驗結果顯示,在光學特性分析中,利用垂直入射反射光譜證實兩組元件結構皆成功激發了塔姆電漿共振模態,並透過不同入射角下的反射光譜驗證了共振吸收峰隨入射角增加而藍移的特性,提供了共振波長的調控彈性。在電性與光響應量測中,當使用能量低於材料能隙的 808 nm 與 1550 nm 雷射進行週期性照射時,元件均展現了與光照同步的開關響應,直接證實此結構能有效突破傳統半導體的吸收極限。
    透過不同幾何設計的數據對照,本研究揭示了熱載子的傳輸極限。金屬面積較大者的光響應度明顯不如面積較小者,證實熱載子在金屬內部的非彈性平均自由徑 (IMFP) 極短,遠距離生成的熱電子會在晶格傳輸中因頻繁散射而發生熱化損耗。而當採取材料與金屬完全重疊的夾層設計 (Au / MoS2 / DBR) 以縮短金屬端傳輸距離時,光電流顯著提升。兩個不同波段元件的最佳內部量子效率 (IQE) 均落在相同的數量級,在初始動能相差甚遠的條件下表現相近,有力地驗證了 TPR 架構能有效局域化光場並降低熱載子傳輸的能量衰減。

    Two-dimensional molybdenum disulfide (MoS2) has garnered significant attention in optoelectronics due to its atomic-scale thickness, good surface stability, and excellent optoelectronic properties. However, the intrinsic direct bandgap of monolayer MoS2 is approximately 1.8 eV, which primarily restricts its photoresponse to the visible-light spectrum. Consequently, its direct application in near-infrared (NIR) and short-wave infrared (SWIR) photodetection, such as the 808 nm and 1550 nm wavelength bands, is severely limited.
    This study proposes a novel hot-carrier photodetector architecture designed to overcome this fundamental bandgap limitation by integrating Tamm plasmon resonance (TPR) with a MoS2 metal-semiconductor junction. The device employs a vertical stacking structure consisting of Au/MoS2/DBR (distributed Bragg reflector). In this configuration, incident light induces a highly localized optical field at the interface between the top gold (Au) metal layer and the underlying DBR, generating high-energy hot carriers within the metal. Driven by the internal photoemission (IPE) mechanism, these hot carriers acquire sufficient energy to cross the Schottky barrier at the Au/MoS2 interface and are subsequently injected into the MoS2 transport channel to generate a measurable photocurrent.
    To validate this approach, two sets of Tamm plasmon polariton (TPP) photodetectors were systematically designed and fabricated, targeting the 808 nm and 1550 nm wavelength bands. The 808 nm device utilizes an SiO2/Si3N4 DBR structure, while the 1550 nm device employs a Ta2O5/SiO2 DBR structure to achieve the desired resonance wavelengths. Reflection spectroscopy confirmed the successful formation of distinct TPP absorption peaks near the target wavelengths, which exhibited a blueshift with increasing incident angles, perfectly aligning with the simulation results. Furthermore, optoelectronic measurements demonstrated that both devices exhibited stable photo-switching responses under 808 nm and 1550 nm laser illumination, despite the photon energies being considerably lower than the MoS2 bandgap.
    This study also conducted a comprehensive investigation into the hot-carrier transport and collection mechanisms by varying the geometrical design, specifically the Au metal area and the overlap ratio between the MoS2 channel and the Au metal reflector. The experimental results demonstrated that simply enlarging the metal absorption area does not proportionally enhance the photoresponse, as the effective transport distance of hot carriers within the metal is heavily constrained by scattering mechanisms. Conversely, maximizing the geometric overlap between the MoS2 channel and the Au/DBR resonance region effectively shortens the hot-carrier transport distance, leading to significantly enhanced photocurrent collection.
    In conclusion, this research successfully establishes a wavelength-tunable, planarized infrared photodetector platform capable of seamless integration with two-dimensional materials. This architecture presents a highly feasible and promising direction for the future development of low-cost, narrowband, and tunable infrared photodetection systems based on two-dimensional semiconductors.

    摘要 I ABSTRACT II 致謝 IX 目錄 XI 表目錄 XIV 圖目錄 XV 第一章、緒論 1 1.1 研究背景與動機 1 1.2 文獻回顧 2 1.3 研究目的與方法 3 第二章、理論背景 5 2.1 二維材料 MOS2 基本介紹 5 2.1.1 晶體結構與能帶特性[6] 5 2.1.2表面特性與費米能階釘扎[7] 7 2.2 塔姆電漿共振 8 2.2.1 光子晶體[8, 9] 8 2.2.2分布式布拉格反射鏡[10, 11] 10 2.2.3 表面電漿共振[12-14] 11 2.2.4 塔姆電漿共振[2, 3, 15, 16] 13 2.2.5 入射角度與塔姆電漿共振波長關聯[4] 15 2.2.6 熱載子激發與內部光電效應[17, 18] 17 2.3 光偵測器 18 2.3.1 光電流產生機制[19] 18 2.3.2 金屬-半導體介面物理 18 2.3.3 光偵測器重要性能參數 23 第三章、元件製程與量測 25 3.1 雙波段元件結構設計與實驗流程 25 3.1.1 808 nm 與 1550 nm 元件結構總覽 25 3.1.2 元件圖形結構設計 26 3.1.3 實驗流程圖 28 3.2 DBR基板參數設計 30 3.2.1 近紅外光區 (808 nm) DBR 結構參數 30 3.2.2 短波紅外光區 (1550 nm) DBR 結構參數 30 3.3 二維材料轉移與黃光製程步驟 31 3.3.1 MoS2濕式轉移製程 32 3.3.2 主動層定義與蝕刻 33 3.3.3 TPP 結構製作與金屬電極沉積 35 3.4 光學量測系統架設 37 3.4.1 可變入射角量測系統架構 37 3.4.2 Arduino 自動遮光系統 38 3.5 實驗藥品與儀器設備 38 3.5.1 實驗藥品列表 39 3.5.2 儀器設備與運作原理 39 第四章、結果與討論 42 4.1 元件結構與材料品質分析 42 4.1.1 顯微影像與元件結構分析 42 4.1.2 MoS2 拉曼與 PL 光譜分析 45 4.2 元件光學特性分析 46 4.2.1 垂直入射反射光譜量測 47 4.2.2 入射角度與吸收峰關係 48 4.3 元件基礎電性量測 50 4.3.1 I-V 曲線分析 50 4.3.2 寬頻白光開關響應 51 4.4 TPP 光響應量測與物理機制討論 52 4.4.1 808 nm 響應波段之元件 52 4.4.2 1550 nm 響應波段之元件 55 4.5 光電效能參數估算 57 4.5.1 入射光功率密度計算 57 4.5.2 有效照光面積估算 58 4.5.3 有效吸收率校正 60 4.5.4 光響應度計算 61 4.5.5 內部量子效率計算 65 4.5.6 數據總結與討論 66 第五章、未來展望 69 參考文獻 70

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