本論文利用光學模擬與奈米製作與光學量測進行金屬超穎介面的分析。首先利用嚴格耦合分析法來探討對稱/不對稱U型金超穎陣列的方位旋轉角以及橢偏率，由於經過不對稱結構後出射光的左/右圓偏振分量的相位與振幅不復相同，因此在紅外光波段有巨大光學訊號的產生。有了預期的光學模擬結果後，我們利用軟模具氣壓式輔助熱壓印搭配乾式蝕刻製作出工作矽模具後，將工作矽模具鍍金後利用奈米金轉印技術成功地在目標基板上製作出對稱/不對稱U型金超穎陣列，上述方法具有低成本、高產量、且大面積製作之優點，除此之外工作矽模具經由食人魚酸清洗後方可再次使用，因此具有重複使用的特性。最後利用吾人自行架設的光學量測系統進行對稱/不對稱U型金超穎陣列的量測分析，主要是先量測經過結構後出射光的斯托克參數，再經由公式換算後求得金超穎陣列的方位旋轉角以及橢偏率，最後我們將模擬與量測的結果作分析與討論。
經過不對稱U型金超穎陣列的光學量測後，其方位角旋轉在1310 nm時得到最大值25.9度而橢偏率在1330 nm時得到最大值0.87，而模擬與量測的結果近乎相同。
本論文在提出金超穎介面的光學模擬與奈米製作與光學分析後，我們可以藉由適當地調控結構參數，讓金屬超穎介面具有超薄旋轉片或超薄圓偏振片等特性。

In this master thesis, we exploit the Rigorous-Couple Wave Analysis (RCWA) to simulate the optical response of the symmetry/asymmetry U-shape gold metasurface; that is, the azimuth angle and ellipticity. Since the phase and amplitude of the asymmetry U-shape gold metasurface are not the same, there are enormous optical responses occurred in the near-infrared region. Following we have the expected simulation results, we make use of the air press-assisted thermal imprint with PFPE soft mold to define the U-shaped photoresist pattern on Si mold and use the dry-etching method to fabricate the working mold. Finally, we deposit Au on the working mold by E-gun evaporator and exploit the nano-transfer technique to transfer the Au from working mold to our target PC substrate. The working mold also can be used after the piranhna acid clean so it has reusable characterization. Last but not least, we use the optical characterization setup assembled on my own to measure the optical response of the symmetry/asymmetry U-shape gold metasurface. First we measure the stoke-parameters of the emergent light after incident the Au metasurface and by equation we acquire the azimuth angle and ellipticity of the gold structure. Finally, we compare the measurement result with the simulation one.

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