本論文以全自動型虛擬量測(Automatic Virtual Metrology, AVM)技術為基礎，設計與實作一個虛擬量測管理系統 (Virtual Metrology Management System, VMMS)，具有自動建模(Automatic Model Creation)、自動模型移植(Automatic Model Fanning Out)、遠端監控與管理AVM系統、集中儲存模型資料及推測結果，以及提供友善的圖形使用者介面等功能。本虛擬量測管理系統採用介面A (Interface-A)為各個子系統間資料交換之介面，其資料擷取之便利性與安全性可符合目前半導體及TFT-LCD製造廠之需求。此外，本系統設計有可抽換式的介面與功能模組，因此，只要根據需求抽換上所需的功能模組，本系統便可應用於不同型式之機台，進而可容易地進行系統之全廠導入。相信本論文所研發之虛擬量測系統可實際應用於半導體及TFT-LCD產業。

Based on the automatic virtual metrology (AVM) technology, a virtual metrology management system (VMMS) is designed and implemented in this thesis. The VMMS has capabilities of automatic model creation, automatic model fanning out, monitoring and managing AVM systems remotely, storing model data and conjectured results centrally, and providing various friendly graphical user interfaces. Interface A is adopted as the data exchange interface between the sub-systems of the VMMS. Thus, the convenience and security of data acquisition provided by the VMMS can satisfy the requirements of semiconductor and TFT-LCD manufacturing factories. Also, pluggable interfaces and functional modules are designed in the VMMS. Thus, by plugging the associated functional module according to desired requirements, the VMMS can be applied to different types of equipment. In turn, applying the VMMS to all pieces of equipment in the factory can be easily achieved. It is believed that the developed VMMS can be practically applied in the semiconductor and TFT-LCD industries.

[1] 2003 International Technology Roadmap for Semiconductors (ITRS), December 2003. http://public.itrs.net/
[2] Y.-C. Chang and F.-T. Cheng, “Application Development of Virtual Metrology in Semiconductor Industry,” in Pro. of the 31st Annual Conference of the IEEE Industrial Electronics (IECON 2005), Raleigh, North Carolina, USA, pp. 124-129, November 2005.
[3] P.-H. Chen, S. Wu, J.-S. Lin, F. Ko, H. Lo, J. Wang, C.-H. Yu, and M.-S. Liang,, “Virtual Metrology: a Solution for Wafer to Wafer Advanced Process Control,” in Proc. 2005 IEEE International Symposium on Semiconductor Manufacturing, San Jose, CA ,USA, pp.155-157, Sept. 2005.
[4] Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, “A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing,” IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 183-194, May 2006.
[5] Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, “Intelligent Prognostics System Design and Implementation,” IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 195-207, May 2006.
[6] Y.-J. Chang, Y. Kang, C.-L. Hsu, C.-T. Chang, and T. Y. Chan, “Virtual Metrology Technique for Semiconductor Manufacturing,” in Proc. 2006 International Joint Conference on Neural Networks (IJCNN’06), pp. 5289-5293, July 2006.
[7] M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, “A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing,” IEEE/ASME Transactions on Mechatronics, vol. 12, no. 3, pp. 308-316, June 2007.
[8] F.-T. Cheng, H.-C. Huang, and C.-A. Kao, “Developing a Dual-Phase Virtual Metrology Scheme,” to appear in IEEE Transactions on Semiconductor Manufacturing, November 2007.
[9] D. Parsons, A. Rashid, A. Speck, and A. Telea, “A “Framework” for Object Oriented Frameworks Design,” Proceedings of the Technology of Object-Oriented Languages and Systems, p.141, June 07-10, 1999.
[10] D. Parsons, A. Rashid, A. Speck, and A. Telea, “A “Framework” for Object Oriented Frameworks Design,” Proceedings of the Technology of Object-Oriented Languages and Systems, p.141, June 07-10, 1999.
[11] M. E. Fayad and D. C. Schmidt, “Object-oriented application frameworks,” Communications of the ACM, vol. 40, No. 10, 1997, pp. 32-38.
[12] D. F. D'Souza , and A. C. Wills, Objects, Components, and Frameworks with UML: The Catalysis(SM) Approach, Addson-Wesley Professional, 1998.
[13] D. Kaye, Loosely Coupled: The Missing Pieces of Web Services, Rds Associates, August 2003.
[14] Hao He, What Is Service-Oriented Architecture, September, 2003 [Online]. Available: http://webservices.xml.com/pub/a/ws/2003/09/30/soa.html
[15] SEMI E133-0306, Provisional Specification for Automated Process Control Systems Interface, U.S.A., 2004.
[16] J. Moyne, E. del Castillo, and A.M. Hurwitz, Run-to-Run Control in Semiconductor Manufacturing. CRC Press, 2001.
[17] G. Booch, J. Rumbaugh, I. Jacobson, The Unified Modeling Language User Guide, ADDISON-WESLEY, April 2000.
[18] F.-T. Cheng Semiconductor Manufacturing Automation Institute of Manufacturing Engineering in National Cheng Kung University, September 22, 2006.
[19] Charming Systems, The Recipe Management Proposal , December 21, 2004
[20] Gino Crispispieri, ISMI Manufacturing Initiative, Interface A Standards Implementation, 1998.
[21] Gino Crispispieri, ISMI Manufacturing Initiative, Interface A Usage Guidance, 1998.
[22] ISMI Manufacturing Initiative, Interface A Standards E120, March 2004.
[23] ISMI Manufacturing Initiative, Interface A Standards E125, March 2004.
[24] ISMI Manufacturing Initiative, Interface A Standards E127, March 2004.
[25] ISMI Manufacturing Initiative, Interface A Standards E132, March 2004.
[26] ISMI Manufacturing Initiative, Interface A Standards E134, March 2004.
[27] C.-C. Liu, Virtual Metrology Model Creation Server Design and Implementation , Master Thesis, National Cheng Kung University, September 2008.