本實驗室研究“奈米球鏡微影術”已有兩年的時間，這個方法可以快速製作出高品質的奈米圓盤陣列結構(光子晶體結構)，並且其製作出的面積大、製造成本也低。這個技術仍有些缺點其中之一是奈米球陣列沒有辦法重複使用，另一點是其所製作的奈米圓盤陣列不能在我們預先選擇的區域製作。在本篇論文中，我們將研究幾種解決的方案，可重複使用的奈米球鏡光罩以及使奈米球鏡微影術能夠在預先選擇的區域製作奈米結構。
首先我們將採用一種叫做“alternative electric field (AEF) method”新方法排列納米球陣列，這是一種能夠將奈米球排列進特定圖形區域的方法。雖然我們利用AEF這個方法排出幾個圖形的奈米球陣列，但是品質太差，無法提供我們製作高品質的奈米結構。製作可重複性使用的奈米球光罩方面，我們利用石英當作基板鋪上silica球，經過熱退火處理後當作球光罩。但是因為silica球陣列和光阻之間的contact條件是一個很大的問題。之後我們發現PS球不僅能有更好的球陣列排列，其作為球透鏡聚焦紫外光的效果比silica球更好。最後我們使用PS球搭配一般光罩，能夠在預先選擇區域製作出奈米圓盤陣列。而可重複利用的奈米球光罩現在正在做更詳細的研究。
另外我們還發現因為光罩邊緣造成的繞射現象會使被光罩擋住的部份也曝光。經過仔細的研究這個現象，並且調整了一些參數，包括奈米球的直徑和墊片的厚度。我們能夠製造出一些有趣的光子晶體結構，我們相信這種現象能夠找到合適的工業應用，製造某些光電元件上。

Nanospherical-Lens Lithography (NLL), which has been developed in our laboratory for the last two years, is capable of fabricating high-quality nanodisk arrays(Photonic-Crystal Structure) very quickly. The fabricated nanodisk arrays cover large area and very low cost. One of the major disadvantages of NLL is that the nanosphere lens array is not reusable. The other is that the nanodisk arrays cannot be fabricated at a pre-selected location. In this dissertation, we will study several solutions to fabricate reusable Nanospherical-lens mask and to fabricate nanostructures at a pre-selected area.
We will first employ a new way to align nanosphere arrays, which is referred as “alternative electric field (AEF) method”. AEF method is capable of aligning nanospheres into a certain patterns. Several parameters, including temporal and spatial frequencies are studied. Although several patterned nanosphere arrays are obtained using AEF method, the quality is too low to fabricate high-quality nanostructures. To fabricate reusable nanosphere mask, annealed silica spheres on top of quartz substrates were used as the lithography mask. However, the contact condition between the silica sphere arrays and the photoresist is a major problem. We also discover that polystyrene nanospheres not only can form better nanosphere arrays but also work better as a ball lens for the incoming UV light. By using polystyrene nanospheres and a regular photolithography mask, we are able to fabricate nanodisk arrays at a pre-selected area. The reusability of the nanosphere mask is now under more detailed study.
In addition, we also discover that the diffraction effect caused by the photo-mask pattern is able to exposure the covered area. By carefully study this phenomenon by adjusting several parameters, including nanosphere diameters and spacer thickness. We are able to fabricate several interesting photonic crystal structures. We believe this phenomenon will find suitable industrial applications in fabricating certain photonic devices.

[1] R. Micheletto, H. Fukuda, and M. Ohtsu, “A Simple Method for the Production of a Two-Dimensional Ordered Array of Small Latex Particles”, Langmuir.8, 3333-3336 (1995)

[2] K. H. Li and H. W. Choi, “Air-spaced GaN nanopillar photonic band gap structures patterned by nanosphere lithography”, JOURNAL OF APPLIED PHYSICS 109, 023107 (2011)

[3] N. D. Denkov, O. D. Velev, P. A. Kralchevsky, I. B. Ivanov, H.Yoshimura and K. Nagayama,“Mechanism of formation of two-dimensional crystals from latex particles on substrates”, Langmuir .8, 3183-3190 (1992)

[4] R. Xie and X.Y. Liu, “Electrically Directed On-Chip Reversible Patterning of Two-Dimensional Tunable Colloidal Structures”,Adv. Funct. Mater. 2008, 18, 802–809

[5] A. Mohammadkhani and K. Jiang, “Fabrication of Dual Patterned Nanocavities Using Double Layer Nanosphere Lithography”, 2011 11th IEEE International Conference on Nanotechnology Portland Marriott August 15-18, 2011, Portland, Oregon, USA

[6] Wei Wu, Dibyendu Dey, Omer G. Memis, Alex Katsnelson, Hooman Mohseni, “Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography”, Nanoscale Res Lett (2008) 3:351–354.

[7] Jong-Bin Yeo and Hyun-Yong Lee, “Realization of multi-paired photonic crystals by the multipleexposure nanosphere lithography process”, Scripta Materialia 66 (2012) 311–314.

[8] E. Yablonovitch, “Inhibited Spontaneous Emission in Solid-State Physics and Electronics”, Phys. Rev. Lett. 58, 2059 (1987).

[9] S. John, “Strong localization of photons in certain disordered dielectric superlattices”, Phys. Rev. Lett. 58, 2486 (1987).

[10] 欒丕綱,陳啟昌,“光子晶體---從蝴蝶翅膀到奈米光子學”,五南圖書出版社

[11] 張高德、欒丕綱,“光子晶體簡介”,光學工程 第九十五期95.09

[12] L. Brillouin, “Wave propagation in periodic structure”2nd, 1946, Mineola, New York.

[13] J. C. Knight, J. Broeng, T. A. Birks, and P. St. J.Russell, “Photonic band gapguidance in opticalfibers”, Sicience, 282, 1476 (1998)

[14] A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, and J.D. Joannopoulos, “High Transmission through Sharp Bends in Photonic Crystal Waveguides” ,Phys. Rev. Lett. 77, 3787 (1996).

[15] A. A. Erchak, D. J. Ripin, Sh. Fan, P.Rakich, J. D. Joannopoulos, E. P. Ippen, G. S. Petrich and L. A. Kolodziejski, “Enhanced coupling to vertical radiation using a two-dimensional photonic crystal in a semiconductor light-emitting diode”, Appl. Phys. Lett. 78, 563 (2001)

[16] Attila Mekis, J. C. Chen, I. Kurland, Shanhui Fan, Pierre R. Villeneuve, and J. D. Joannopoulos ,“High Transmission through Sharp Bends in Photonic Crystal Waveguides”,Phys. Rev. Lett. 77, 3787–3790 (1996)

[17]曾重賓，氧電漿輔助奈米球微影術之研究與應用，碩士論文，國立成功大學(2010)

[18]儀器分析講義，SEM講義，元智大學