| 研究生: |
呂志鋒 Lu, Chih-Feng |
|---|---|
| 論文名稱: |
光學相位延遲板雙折射性質及晶體厚度之高精度量測系統研發 Development of New High Accuracy Measuring System for Birefringence Index and Thickness of Optic Waveplates |
| 指導教授: |
陳朝光
Chen, Cha'o-Kuang 賴新一 Lai, Hsin-Yi |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2003 |
| 畢業學年度: | 91 |
| 語文別: | 中文 |
| 論文頁數: | 87 |
| 中文關鍵詞: | 光學機構 、光程差 、雷射干涉儀 、折射率 |
| 外文關鍵詞: | laser interferometer, optical mechanism, optical path length difference., refractive index |
| 相關次數: | 點閱:117 下載:2 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本研究係關於一光學晶體折射率及厚度高精度量測系統之研發,本量測系統係由一精密測距雷射干涉儀系統、電動旋轉馬達搭配數學解析計算所組成。本研究利用雷射干涉儀可測量隅角反射鏡線性移動的特性,在極化分光鏡和隅角反射鏡中間架設一組單軸電動旋轉馬達,並且固定隅角反射鏡不動,再將電動旋轉馬達上夾持住光學待測試片,利用馬達帶動試片轉動,造成光路上的改變。由於此改變而造成之光程差會使干涉儀測得不同於實際距離之數值,藉由本研究所推導之光程差與試片折射率的關係,便可量得試片之折射率。本論文所建構之量測系統具有簡便易操作、易校正及少雜訊干擾之優點,且有溫度、壓力、溼度等環境補償之功能,經實驗結果證實,本量測系統可快速且穩定的獲得高量測精度。
另外,在厚度高精度量測方面,本研究提出一非破壞性檢測技術,除可量測大厚度之試材(公分等級)外,亦可使精度保持在奈米等級,對精密測厚技術之應用有很大的助益。
In this study, a new highly accuracy measurement system for birefringence index and the thickness of an optic waveplate is proposed. This measurement system is composed of a laser interferometer for accurate length measuring, a precise rotatory stepping motor, and a computer for data calculation. Using the characteristic of the laser interferometer for measuring the linear translation, a tested waveplate is holding on a rotatory stepping motor. It placed between the polarization beam splitter and the cube reflector, which is fixed on the optic table. The optical path difference is obtained by the rotational angles control of stepping motor. Based on the optical path length difference, a different measured value compared with real length is shown by the laser interferometer. By means of the relations of optical path length difference and refractive index of the tested waveplates, the refractive index of waveplate can be fast and accurately obtained. It has some advantages of this measurement method, such as, easier operation and calibration, fewer signal noise, and environment compensation is considered, etc. The experiments show fast and stable measuring results can be obtained by the measurement method.
Besides, a new nondestructive measurement system for crystal thickness is also proposed. This measurement method not only can measure large thickness (cm degree), but also can keep the measurement accuracy within nano-degree. It is very helpful for the application of accurately thickness measurement technique.
[1].Bahaa E.A.S., Malvin C.T., 1991, Fundamentals of photonics, New York, Wiley.
[2].Cameron, B.D. and C,ote G.L., 1997, “Noninvasive Glucose Sensing Utilizing a Digital Closed-Loop Polarimetric Approach,” IEEE Transactions on Biomedical Engineering., Vol. 44, No.12, pp.1221-1227.
[3].Chiu, M.H., Chen, C.D., and Su, D.C., 1996, “Method for determining the fast axis and phase retardation of a wave plate,” J.Opt.Soc.Am.A, Vol. 13, No.9, pp.1924-1929.
[4].Feng, C.M., Huang, Y.C., Chang, J.G., Chang, M. and Chou, C., 1997, “A ture phase sensitive optical heterodyne polarimeter on glucose concentration measurement,” Optic Comm., Vol. 141, pp314-321.
[5].Fowles, G.R., 1975, Introduction to modern optics, New York, Holt, Rinehart and Winston.
[6].Hecht, E., 1998, Optics, Addison Wesley, third edition.
[7].Hermann, A. H., 1984, Waves and fields in optoelectronics, Englewood Cliffs, NJ, Prentice-Hall.
[8].Huang, Y.C., Chou, C. and Chang, M., 1997, “Direct measurement of refractive indices( , )of a linear birefringent redardation plate,” Optic Communication, Vol.133, pp.11-16.
[9]. Mathieu, J.P., 1975, “Optics” Oxford, Pergamon Press, New York.
[10].Mark, F., 2001, Optical properties of solids, Oxford, Oxford University Press, New York.
[11].Optic Guide, CASIX co., 1995, [ =1.5427. =1.5518(633nm)].
[12].Heavens,O.S., 1965, Optical properties of thin solid films, New York, Dover Publications.
[13].Serreze, H.B. and Goldner, R.B., 1974, “A Phase-Sensutive Technique for Measuring Small Birefringence Changes,” Rev.Sci.Instrum, Vol.45, pp.1613-1614.
[14].Shindo, Y. and Hanabusa, H., 1983, “Highly Sensitive Instrument for Measuring Optical Birefringence,” Polymer Communication, Vol.24, pp.240-244.
[15].丁勝懋,民74,雷射工程導論,中央圖書,臺北巿。
[16].水野博之撰,高正雄譯,民74,光電工學的基礎:基本原理、應用實例,復漢,臺南市。
[17].李正中,民88,薄膜光學與鍍膜技術,藝軒,臺北縣新店市。
[18].李冠卿,民77,近代光學,聯經,臺北巿。
[19].陳錫桓,民72,光學-近化物理,中央圖書,臺北市。
[20].譚久彬,民84,精密測量中的誤差補償技術,哈爾濱工業大學出版社,哈爾濱。
[21].http://www.casix.com/optics/waveplate2.htm
[22].http://www.cerac.com/pubs/proddata/mgf2.htm