本論文研發出一套無光罩式的紫外光曝光系統，可以在滾筒模仁上製作出任意圖形的光阻微結構。此一滾筒模仁曝光系統包含一個內含數位光學處理(Digital Signal Processing, DLP)能力的光機系統，可以用數位微反射鏡晶片(Digital Mirror Device, DMD)將UV光投射至一個15x15的二維微透鏡陣列；每一個微透鏡的下方聚焦處裝配有一光纖，可以將UV光傳送至遠端；接著將這225根光纖排列成間距0.5 mm、總長度112.5 mm 的一直線，每一根光纖的出口處則加工有另一個微透鏡，可以將UV光聚焦成一個微小的UV光點；接著將此一維的UV光點直線陣列投射於塗佈在滾筒表面的光阻層，最後配合 DMD的 On/Off 開關、一維UV光點陣列的位移、與滾筒的轉動，即可在滾筒模仁上製作出任意圖形的光阻微結構。
本研究以Matlab程式進行圖案的二值化以控制DMD，並採用波長405 nm 的紫外光源，同時利用準分子雷射拖拉法，製作出對應於光纖的二維與一維非球面微透鏡陣列。在滾筒光阻噴塗方面，則以光阻噴塗系統將稀釋後的光阻均勻塗佈於直徑5公分、長度15公分之金屬滾筒模仁，形成光阻薄膜。最終搭配精密旋轉機構、高精密位移平台、與程式控制，在滾筒模仁上曝出多種的任意圖形；此外，本系統也可以應用於金屬網格滾筒模仁的製作。完成UV曝光與光阻顯影之後，再將滾筒模仁進行化學濕式蝕刻與電解拋光，即可應用於滾印製程。實驗結果顯示，利用此系統已成功在滾筒模仁上製作出最小線寬6 μm、線增量4 μm、幅寬112 mm之任意光阻微結構。

This thesis investigates a maskless ultraviolet (UV) light exposure system for fabricating microstructures of arbitrary patterns on a roller mold. This system consists of an optical engineering with a digital mirror device (DMD) to reflect UV light to a two dimensional (2D) 15x15 microlens array. At the focal point of each microlens, there is an optical fiber to collect and transfer the UV light. These 225 fibers are placed into a one-dimensional (1D) array and each fiber is aligned with a microlens to focus the UV light into a small UV spot. By aligning this 1D UV spots onto a photo-resist (PR) layer coated on a metal cylinder, one can achieve arbitrary UV patterns by synchronizing the DMD operation, the 1D UV spots translation, and the rotation of roller mold.
A Matlab program is developed to divide the patterns into binary data needed for DMD control and UV exposure. The microlens arrays corresponding to the 1D and 2D optical fiber arrays are fabricated by excimer laser micromachining method. A spray coating system is used to uniformly coat a thin PR layer onto the cylindrical surface of a roller mold. By accurate mechanical alignment and precision control of both rotation and longitudinal scanning of the roller mold with respect to the 1D arrayed UV spots, one can achieve arbitrary photoresist patterns. It is noticed that this system is particularly useful for patterning metal mesh patterns for applications in touch panels. Finally, the surface photoresist patterns are transferred to the metal roller surface by etching process. From the experiment result, this system can successfully get a smallest linewidth of 6 μm、a line increment of 4 μm over a total patterning range 112 mm.

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