本論文提出一套使用無光罩曝光系統直接於滾筒模仁表面製作二維任意微米結構的製程方式。本研究自行建置一套滾筒式的無光罩曝光系統，透過此系統將塗佈於滾筒模仁表面上的光阻層直接進行無光罩式曝光，後續經由光阻的顯影製程，得到大面積、無接縫與任意完整複雜圖形的二維光阻結構，並依據此光阻結構利用蝕刻的方式，完成滾筒模仁之製作。
本論文使用現有的三項技術: 曲面光阻噴塗系統、數位光學處理技術 (Digital Light Processing, DLP)、光點陣列式斜掃描曝光技術；並自行建置一套滾筒式的無光罩曝光系統，此系統包含了光學引擎系統 (Digital UV Exposure System) 與多軸運動控制系統 (Multi-Axis Motion Control System)。利用曲面光阻噴塗系統於滾筒表面形成均勻的光阻層，接著透過光學引擎系統中的數位微反射鏡面裝置結合數位光學處理技術，可於光學成像鏡組景深範圍內實現無光罩曝光，並利用光點陣列式斜掃描曝光技術達到增加橫向解析度目的，使無光罩曝光可定義更複雜的二維圖形結構。本研究使用滾筒式的無光罩曝光系統，可於滾筒模仁表面製作並完成最小線寬20 μm的光阻層二維任意結構定義，並於後續蝕刻製程中製作最小線寬40 μm深度10 μm之二維任意結構。

This thesis proposes a method for directly fabricating microstructures on the surface of a roller mold using a maskless exposure system. A roller-style maskless ultraviolet (UV) light exposure system is developed for UV patterning a photoresist (PR) coated on the surface of roller mold. After the PR developing process, seamless and complex two-dimensional PR microstructures are obtained. The roller mold fabrication is then completed by direct wet etching on the roller mold surface using the patterned PR structures as the etching mask.
This thesis utilizes three existing technologies: curved photoresist spray coating system, digital light processing (DLP) technology, and light point array oblique scanning UV exposure. A roller-style maskless UV-light exposure system is constructed, it consists of a digital UV exposure system and a multi-axis motion control system. A uniform PR layer is first coated on the roller’s surface. Then, the digital micromirror device (DMD) in DLP enables maskless exposure along with an optical imaging lens system. The projected UV spots by DMD are obliquely scanning across the roller surface to pattern the PR layer in a maskless manner. After the PR developing, a patterned PR layer is formed on the roller’s surface with the smallest linewidth of 20 μm. Finally, a roller mold with the smallest feature size of 40 μm and a depth of 10 μm is obtained and can be used for a continuous roll-to-roll imprinting process.

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