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研究生: 江宜恬
Chiang, Yi-Tien
論文名稱: 二維材料光偵測器的光閘效應及電偶極誘發的光響應
The Photo-gating Effect and Dipole-induced Photo-response of 2D Material-based Photodetectors
指導教授: 張守進
Chang, Shoou-Jinn
林時彥
Lin, Shih-Yen
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 102
中文關鍵詞: 二維材料半導體異質結構光偵測器光閘效應電偶極效應
外文關鍵詞: 2D material, Semiconductor, heterostructure, photo detector, photogating effect, dipole-induced effect
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  • 隨著光電元件朝向高靈敏度、寬頻響應與微型化方向發展,新型二維材料因其原子級厚度、可調控能帶結構與優異載子傳輸特性,逐漸成為次世代光偵測器的重要候選材料。其中,石墨烯具有極高載子遷移率與優異導電特性,可作為高速載子傳輸通道;而二硫化鉬( MoS₂)以及傳統半導體材料 (如Si、GaAs、InP)則具備良好的光吸收能力以及不同的能隙,可作為吸光層。透過異質結構設計,可將載子傳輸與光吸收功能分離,進而提升元件的特性。然而,目前二維材料光偵測器之操作機制仍存在不同解釋,特別是在高響應度來源方面,究竟是由傳統的光激載子的收集形成光電流或是由於吸光層的載子累積所導致的通道層費米能階調變之光閘效應 (Photogating Effect)存需進一步釐清。此外,材料層數、基板種類、摻雜濃度與介電層插入等因素,皆可能對元件操光電特性與響應時間產生重要影響。本研究利用石墨烯作為載子通道層,製備石墨烯/二硫化鉬異質結構光偵測器,並探討其光閘效應主導之元件運作機制。透過分析具不同能隙的半導體材料作為吸光層之石墨烯/半導體異質結構光偵測器,比較不同材料系統之響應度與波長響應範圍。此外,本研究亦於傳輸層及吸光層中加入氧化鋁介電層,運用吸光層表面因照光所產生之電偶極對二維材料通道之費米級的影響,以此電偶極誘發之光響應效應製作出二維材料/氧化鋁/半導體偵測器並觀察到此元件相較於光閘效應偵測器較短的反應時間。透過系統性比較光閘效應與電偶極誘導機制之差異,本研究建立二維材料異質結構光偵測器之整體物理模型,並分析材料層數、基板選擇與介面處理對元件性能之影響。研究結果可為未來高靈敏度、快速響應與寬頻光偵測元件之設計提供重要參考,並促進二維材料於新世代光電元件之應用發展。

    This thesis presents a systematic study on two-dimensional (2D) material-based photodetectors, focusing on the optimization of device performance through mechanism engineering, material selection, and structural design. The primary objective is to achieve high responsivities while suppressing dark currents. Various heterostructures are investigated, including graphene, molybdenum disulfide (MoS₂), and non-graphene 2D materials such as germanene and stanene as channel layers, combined with different semiconductor substrates (Si, InP, GaAs, and In₀.₁₅Ga₀.₈₅As) as light absorption layers. Two major operating mechanisms, namely the photo-gating effect and dipole-induced photo-response, are systematically analyzed and compared.

    摘要 i Abstract ii 目錄 vii 表目錄 xi 圖目錄 xii 第一章 緒論 1 1.1 研究動制與論文架構 1 1.2 二硫化鉬的基本特性 2 1.2.1 二硫化鉬的晶體結構與特性分析 2 1.2.2 二硫化鉬的拉曼光譜分析 3 1.2.3 二硫化鉬的光激發螢光光譜分析 4 1.2.4 二硫化鉬的製備方式 5 1.3 石墨烯的特性分析 7 1.3.1 石墨烯的晶體結構與特性 7 1.3.2 石墨烯的拉曼光譜分析 8 1.3.3 石墨烯的製備方式 9 1.4 鍺烯特性分析 11 1.4.1 鍺烯的晶體結構與特性 11 1.4.2 鍺烯的拉曼分析 12 1.5 錫烯特性分析 13 1.5.1 錫烯的晶體結構與特性 13 第二章 實驗儀器與原理 14 2.1 二硫化鉬成長統統 14 2.1.1 射頻濺鍍統統 (Radio-Frequency Sputter System) 14 2.1.2 低壓硫化統統 (Low Pressure Sulfurization System) 15 2.2 石墨烯成長統統 16 2.2.1 低壓氣相沉積統統 (Low Pressure Chemical Vapor Diffusion, LPCVD) 16 2.3 四族元素(鍺烯、錫烯)成長系統 18 2.3.1 熱蒸鍍制 (Thermal Evaporator) 18 2.4 氧化層成長系統 19 2.4.1 原子層沉積(Atomic Layer Deposition, ALD) 19 2.5 二維材料分析儀器 20 2.5.1 高解析共軛焦拉曼光譜儀 (Confocal Raman Spectrometer) 20 2.5.2 光激發螢光光譜儀 22 2.5.3 四點探針 (Four point probe) 23 2.5.4 原子力顯微鏡 Atomic Force Microscope, AFM) 24 2.5.5 穿過式電子顯微鏡 (Transmission Electron microscope, TEM) 25 2.5.6 X 射線繞射儀 (X-Ray Diffraction, XRD) 26 2.6 元件製程設備 27 2.6.1 旋轉塗佈機 (Spin Coater) 27 2.6.2 曝光機 (Mask Aligner) 28 2.6.3 電子束蒸鍍機 (Electron Beam Evaporator) 29 2.6.4 反應離子蝕刻機 (Reactive-Ion Etching, RIE) 31 2.7 光電量測分析儀器 32 2.7.1 元件三端點量測系統 32 2.7.2 光電流量測統統 33 第三章 光閘效應主導操石墨烯異結結構光偵測器 35 3.1 石墨烯/二硫化鉬異結結構光偵測器 35 3.1.1 石墨烯的成長與轉移技術 35 3.1.2 石墨烯/二硫化鉬異結結構光偵測器操元件製程 37 3.1.3 石墨烯/二硫化鉬異結結構光偵測器操元件特性 40 3.2 光閘效應之操作機制 43 3.2.1 光激發載子分離與電洞累積 43 3.2.2 光導增益與響應分析 44 3.3 石墨烯/半導體異結結構光偵測器 45 3.3.1 以半導體基板作為吸光層之光偵測器特性分析 45 3.3.2 以分子束磊晶技術成長操磊晶層作為吸光層之光偵測器特性分析 48 3.4 石墨烯層數對元件特性之影響 53 3.4.1 單。至三。石墨烯/矽光偵測器操元件特性 53 3.4.2 石墨烯。數增加對費米能階調變能力之影響 55 3.5 結論 56 第四章 電偶極誘發主導以及非石墨烯操二維材料光偵測器 58 4.1 石墨烯/氧化鋁/矽光偵測器 58 4.1.1 石墨烯/氧化鋁/矽光偵測器操元件特性 58 4.1.2 電偶極誘導光響應之運作機制 61 4.2 二硫化鉬/氧化鋁/矽光偵測器 63 4.2.1 二硫化鉬的成長與轉移技術 63 4.2.2 單層至多層二硫化鉬/氧化鋁/矽光偵測器操元件特性 65 4.2.3 二硫化鉬層數增加對電偶極誘導光響應之影響 68 4.3 光閘效應與電偶極誘發機制之比較 69 4.3.1 機制原理比較 69 4.4 二維材料轉印問題與瓶頸 71 4.4.1 轉印後表面殘留 71 4.3.1 轉印後表面的平整度與破損 72 4.5 非石墨烯操二維材料通道光偵測器 73 4.5.1 鍺烯/二硫化鉬光偵測器操元件特性 73 4.5.2 錫烯/二硫化鉬光偵測器操元件特性 76 4.6 結論 78 第五章 總結 80 參考文獻 82

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