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研究生: 許友源
Khosasi, Daniel Harta
論文名稱: 堆疊單層石墨烯的光導特性
Photoconductivity of Stacked Monolayer Graphene
指導教授: 曾永華
Tzeng, Yon-Hua
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2017
畢業學年度: 105
語文別: 中文
論文頁數: 69
中文關鍵詞: 石墨烯鑽石光響應電漿輔助化學氣相沉積化學氣相沉積法
外文關鍵詞: graphene, photoconductivity, diamond film, optical measurement
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  • 石墨烯是具備良好的電、光、熱、磁、化以及機械性質,而此非常適合使用在研究新式的奈米元件。石墨烯具有很寬的吸收頻譜,但是其對於光資的吸收與轉換效率低弱。雖然石墨烯電子遷移率很好以擁有多關於電子元間的應用,但是微弱的光影響能讓石墨烯光學感測元件發展之路受到一定的限制。
    本研究中的孔洞基板使用微波電漿輔助化學氣相沉積法在矽基板成長一層鑽石薄膜,而利用標準黃光微影程序定義圖形於鑽石薄膜基板,以氧電漿乾蝕刻系統來蝕刻鑽石,再使用氫氧化鉀蝕刻矽晶圓,而得到深約15-20 μm的孔洞和溝槽於鑽石薄膜基板。將準備好的孔洞和溝槽基板拿去鍍電極,使用蒸鍍機系統鍍鉻和金(Au/Cr)。此時,使用CVD熱化學氣相沉積法成長高品質連續薄膜石墨烯,將石墨烯轉移至孔洞和溝槽基板,並使用光學顯微鏡和Raman分析。
    將製備好的元件於在高真空光學量測,使用不同的波長二極體雷射實驗,如:藍光(405nm)、紅光(660nm)、綠光(532nm),並探討懸浮石墨烯的光導效應,於不同的偏壓和雷射光源的功率來分析石墨烯的光電導率效應。

    In this work, ultrananocrystalline diamond film is used as a pattern technology to make a cavity on silicon substrate. The low surface tension solution and substrate placement was used to prevent the graphene broken when removing the supported layer. The suspended stacked graphene was successfully fabricated from 40um length channel. Optical Microscope, Raman Spectroscopy, Scanning Electron Microscope, Electrical measurement and Optical measurement are used to analyze the stacked graphene. In the optical measurement part, under blue, red and green laser illumination, it shows a positive photoconductivity. When applying low power, the number of photons of red laser is more than blue laser makes the photoconductivity of red laser is higher than blue laser. With increasing the power, the photoconductivity of blue laser will surpass the photoconductivity of red laser and the difference will be bigger because the red laser will saturate first.

    摘要 I Abstract II 誌謝 VI 目錄 VII 圖目錄 IX 表目錄 XII 第一章 緒論 1 第二章 文獻回顧 3 2.1 鑽石與石墨烯文顯回顧 3 2.1.1 CVD鑽石前處理(Pre-treatment) 3 2.1.1.1機械式拋磨法(Mechanical abrasion/ scratching) 4 2.1.1.2超音波震盪法(Ultrasonic agitation treatment) 5 2.1.2 CVD鑽石製程機台種類 6 2.1.2.1直流電漿化學氣相沉積法(DC arc-jet plasma CVD) 7 2.1.2.2熱燈絲化學氣相沉積法(HFCVD) 7 2.1.2.3微波電漿輔助化學氣相沉積法(MPECVD) 8 2.1.3 CVD鑽石的種類 10 2.1.3.1微米多晶鑽石(MCD) 10 2.1.3.2奈米多晶鑽石(NCD) 11 2.1.3.3超奈米多晶鑽石(UNCD) 11 2.1.4石墨烯的製備方法 12 2.1.4.1機械式剝離法(Mechanical exfoliation) 13 2.1.4.2氧化還原法(Oxidation and reduction) 13 2.1.4.3化學氣相沉積(Chemical vapor deposition) 14 2.1.5石墨烯轉移技術 17 2.1.5.1 PMMA和PDMS轉移 17 2.1.5.2 Roll to roll 18 2.1.5.3乾式轉移法(Dry transfer) 18 2.1.5.4 Solvent Replacement Method 20 2.1.6石墨烯的光響應機制與原理 21 2.1.6.1 載子倍增機制(Carrier Multiplication) 21 2.1.6.2 熱載子倍增(Hot carrier multiplication) 22 2.1.6.3 光響應 (Photo-response and photoelectric) 25 第三章 實驗儀器設備介紹 27 3.1 實驗耗材與溶液 27 3.1.1 實驗耗材 27 3.1.2 PMMA與光阻(Photoresist, PR) 28 3.1.3 實驗溶液 29 3.2 製程設備 31 3.2.1 熱化學氣相沉積系統(Thermal CVD) 31 3.2.2 微波電漿化學氣相沉積系統(Microwave plasma enhanced CVD, MPECVD) 33 3.2.3 熱蒸鍍系統(Thermal Evaporation system) 34 3.2.4 金線打線機 35 3.2.5 氧電漿乾蝕刻系統 36 3.2.6 對準曝光機(Aligner) 37 3.3 分析與量測儀器 39 3.3.1 光學顯微鏡(Optical microscope, OM) 39 3.3.2 拉曼光譜儀(Raman spectroscope) 39 3.3.3 分光光譜儀(Optical emission spectroscope, OES) 41 3.3.4 光電量測設備 42 3.3.5 掃描式電子顯微鏡(Scanning electron microscope, SEM) 43 第四章 實驗內容與結果 45 4.1 實驗步驟與流程 45 4.1.1 CVD石墨烯的備製 45 4.1.2 鑽石基板備製 47 4.1.3 石墨烯轉移 51 4.1.4 製造堆疊石墨烯於UNCD基板 55 4.2 實驗結果與討論 56 4.2.1懸浮堆疊單層石墨烯光響應量測於分析 59 4.2.2堆疊單層石墨烯光響應量測於分析 62 第五章 結語與未來展望 65 第六章 參考文獻 67

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