本論文分為兩大部分，包括常壓微中空陰極陣列式均勻冷電漿技術的開發與探討，以及利用此技術在常壓下沉積大面積碳奈米結構。
傳統電漿製程操作在真空低壓下，當壓力逐漸提高，電漿容易因熱或電場的不穩定因而收縮形成集中的弧光放電，造成電極或電源供應器的損壞。利用中空陰極效應可在高壓下產生穩定的放電，若將放電孔徑縮小到微米級(約100微米)以下則可有效的抑制不穩定放電的產生，然而將微中空陰極以並聯方式放電以實現大面積的放電技術則有許多的挑戰仍待克服。本研究係探討電源頻率、放電孔洞之氣體流量以及電極材料對常壓微中空陰極陣列電漿特性的影響。分別以直流、脈衝(33.3 kHz)及高週波(13.56 MHz)電源供應器來研究電源頻率對微中空陰極陣列放電的影響，發現微中空陰極陣列的電漿電阻特性會隨著電源頻率的提高而降低，當電源頻率提高到高週波的範圍時，微放電陣列才可以穩定且均勻的操作。本研究可以在37 mm直徑圓形面積上，利用約700中空陰極孔洞產生均勻的常壓電漿。而通過微放電陣列孔洞的高流量氣體可以有效的將電極冷卻，並維持相當高的電漿效率。此外，電極材料對電漿放電效率影響極大，採用耐火性材料(鉻-氮化硼-鉻)的組合可使電極壽命大幅延長20倍以上。本研究尚利用光發射光譜儀(optical emission spectroscopy，OES)來探討電漿中的電子溫度及電漿密度隨操作條件的變化而改變的情形，並發現利用電極上自我偏壓極性的偵測即可預測電漿密度的變化，其相對關係並且在本文中深入的討論。
本論文的第二部份則利用此微中空陰極常壓電漿來進行具特殊奈米結構碳膜的沉積。本研究針對以電漿化學氣相沉積法在接近室溫環境下沉積碳膜，可應用在不耐高溫的基材，如塑膠等。本研究利用微中空陰極陣列式電漿在常壓下即可沉積大面積具特殊奈米結構的碳膜，包括奈米碳纖維(carbon nanofibers)、奈米碳球(carbon nanocages)及多層奈米碳管(multi-walled carbon nanotubes)，製程的溫度接近室溫，而且不需觸媒，並可在常壓下連續操作，具工業生產的潛力。本研究進一步探討反應氣體的成分對碳奈米結構的影響，包括在乙炔/氦氣反應物中加入各種氣體如氮氣、氧氣及一氧化碳等。其中添加一氧化碳有助於形成結晶性較佳的奈米石墨結構，而若加入氮氣與氧氣則可以大幅去除非晶質碳結構而獲得更高品質的碳奈米結構。並利用光發射光譜儀、掃瞄式電子顯微鏡、穿透式電子顯微鏡及拉曼光譜來探討碳奈米結構的合成機制，結果顯示最有可能形成碳奈米結構的區域在微中空陰極的孔洞中，而且碰撞頻繁的環境是具特殊碳奈米結構形成的主要因素，高溫環境非為必要條件。

The development of atmospheric pressure microhollow cathode discharge arrays for large area uniform cold plasma generation was studied and characterized, and using this method, large area carbon nanostructures were deposited under atmospheric pressure and room temperature.
Typically, plasma processes have to be operated under low pressure, and once the pressure is increased to a critical value; the glow discharge turn into unstable arcing due to thermal and electric instabilities and damage the power or the electrodes. By reducing the hole diameter to below several hundred micrometers, stable and high-density plasma could be generated by hollow cathode effect under atmospheric pressure. However, parallel operation of microhollow cathode discharge (HMCD) arrays is still an existing challenge. The atmospheric MHCD arrays were developed by studying the effects of power frequency, gas cooling and electrode materials. Dc, pulse (33.3 kHz) and rf (13.56 MHz) power were used to vary the frequency of the power in driving HMCD arrays. It was found that the characteristic resistance of the HMCD arrays was reduced with increasing the power frequency. Only with the power frequency in the radio frequency (MHz) range, the stable and uniform HMCD arrays could be established. A 37 mm diameter electrode with about 700 through holes was used for MHCD arrays. Electrode cooling by gas flow through the MHCD holes could efficiently quench the electrode temperature induced by plasma heating, and the high gas flow also helped sustain the high-density plasma by diluting contaminates. Electrode materials also significantly affected the plasma discharge efficiency. By employing the refractory material to make the electrode with the Cr-h-BN-Cr structure to replace the Ag paste-Clay-S.S mesh structure, the electrode could last much longer in discharging operation. The electron temperature and the density of the plasma were also characterized with optical emission spectroscopy (OES) under various operation conditions. The effect of plasma density on the dc self-bias, measured by an oscilloscope, was also studied and discussed.
Low temperature growth of carbon nanostructures was also attempted by the HMCD arrays. By feeding ethylene/helium mixture through the MHCD arrays, abundant carbon nanostructures like carbon nanofibers, carbon nanocages (also called carbon nanocapsules, carbon nanoparticles, or carbon polyhedral particles) and multi-walled carbon nanotubes were synthesized as observed in SEM and TEM. Surprisingly, these nanostructures could be grown near room temperature (lower than 80℃). By employing the atmospheric MHCD arrays, carbon nanostructures could be deposited on silicon substrate without any catalyst at a substrate temperature around 50℃, which would prevent the damage of thermal sensitive substrates. Since the MHCD arrays are operated at atmospheric pressure, the large area and continuous growth becomes feasible with good commercial potentials. By characterizing the carbon soot by Raman spectroscopy, the better crystalline graphene structure was observed in SEM and TEM by adding CO, N2 and O2 in the ethylene/He gases to etch the amorphous carbon away. As revealed from the OES analysis, the growth of carbon nanostructures likely occurred within the holes of the MHCD arrays. The high frequency collision should play a key role in the low temperature growth of carbon nanostructures.

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