本研究將各種不同晶型與直徑的氧化鋁粒子(Alumina, Al2O3)和Methacryloxypropyltrimethoxysilane (MPS)進行反應，研究氧化鋁不同晶型(alpha與gamma氧化鋁)和直徑(0.08~25um)對矽烷耦合劑的反應性。
FTIR結果顯示酸洗或鹼洗均無法在一定時間(16小時)內，增加微米級alpha-Al2O3表面OH基披覆量。奈米等級的alpha-Al2O3，由於表面積增加，與MPS間有較佳的反應性。而gamma-Al2O3表面有明顯較多的OH基批覆量，對矽烷耦合劑間的反應性最好。
固態NMR結果顯示gamma-Al2O3與MPS間可產生Si-O-Al鍵結。利用TGA分析可知當反應系統中的MPS/gamma-Al2O3重量比超過0.86時，反應於gamma-Al2O3上的MPS比例便不會隨著MPS添加量的增加而增加，而最高反應量約為0.12 g MPS/g gamma-Al2O3。FT-IR結果顯示MPS在230oC恆溫5分鐘後，已產生明顯的裂解。

In this research, we used several kinds of Al2O3 particles with different particle sizes or crystalline morphology to react with methacryloxypropyltrimethoxysilane (MPS). In an tempt to understand the reactivity of Al2O3 particles with MPS.

FT-IR results showed that neither acid nor base treatment did not produce OH group on the surface of micrometer-sized alpha-Al2O3 particles. The nanometer-sized alpha-Al2O3 particles had a slightly better reactivity with MPS due to the possession of a larger surface area. The gamma-Al2O3 particles had much more OH groups on surface than alpha-Al2O3 (or theta-Al2O3), and thus resulted in a better reactivity with MPS.

Solid-state NMR results showed the presence of Si-O-Al bonds between MPS and the gamma-Al2O3 particles after reaction. TGA results showed that the amount of grafted MPS did not increase when the weight ratio of MPS to gamma-Al2O3 in reaction system is over 0.86. The maximum amount of grafted MPS is about 0.12 g MPS/g gamma-Al2O3. MPS was apparently degraded after being held at 230oC for 5 min.

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