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研究生: 葉鎧熤
Ye, Kai-Yi
論文名稱: Zn-25Sn-xTi(x=0、0.02)高溫無鉛銲錫接點界面微結構與界面反應之研究
The Interfacial Microstructure and Interfacial reactions of Zn-25Sn-xTi(x=0、0.02) High Temperature Pb-free Solder Joints
指導教授: 林光隆
Lin, Kwang-Lung
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年: 2020
畢業學年度: 108
語文別: 中文
論文頁數: 144
中文關鍵詞: 高溫無鉛銲錫鋅錫合金鈦添加界面反應界面微結構多重迴焊
外文關鍵詞: High temperature Pb-free solder joint, Zn-Sn alloy, Ti addition, Interfacial reaction, Interfacial microstructure, Multiple reflows
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  • 本研究添加鈦元素(0.02wt%)於Zn-25Sn銲錫合金中,分別與銅、鎳基板接合並經過多重迴焊製程後,探討界面介金屬化合物及其成長動力學,並分析介金屬化合物微結構的變化。微結構觀察分析結果顯示,合金部份由富鋅相及鋅錫共晶相所組成,所添加之鈦元素大多散佈在共晶相中;合金與銅基板間包含靠近銲錫合金的ε-CuZn5及靠近銅基板的γ-Cu5Zn8兩種介金屬化合物,銲錫合金中的富鋅相會與CuZn5相接;合金與鎳基板間則僅生成γ-Ni5Zn21一種介金屬化合物,銲錫合金中的共晶相會與Ni5Zn21相接。介金屬化合物成長動力學分析結果顯示,CuZn5及Cu5Zn8的成長機制皆為反應控制,銲錫中未添加鈦時,成長活化能分別為62.12kJ/mol及32.56kJ/mol;銲錫中添加0.02wt%鈦後,會使兩者的成長活化能上升,分別為92.70kJ/mol及39.46kJ/mol;Ni5Zn21的成長機制亦為反應控制,銲錫中未添加鈦時,成長活化能為9.23kJ/mol;添加鈦元素(0.02wt%)會顯著提升其成長活化能至95.63kJ/mol。針對Cu5Zn8介金屬化合物之微結構觀察結果顯示,迴焊試片之Cu5Zn8是由晶粒尺寸差異不大的等軸晶所構成,經多重迴焊製程後,接近銅基板的部份生成晶粒尺寸更小的細等軸晶,隨著迴焊次數增加,細小等軸晶的數目會隨之增加,使整體厚度增長。根據晶粒型態與晶粒大小的差異,Ni5Zn21介金屬化合物具有四個分層。

    In this study, titanium(0.02wt%) was added to the Zn-25Sn solder alloy, which was joined to the Cu/Ni substrates and then subjected to multiple reflow processes. Subsequently, interfacial intermetallic compounds and its growth kinetics were discussed, and the microstructure evolutions of IMCs were analyzed. The microstructure investigation show that the alloy was composed of Zn-rich phase and Sn-Zn eutectic phase, and the titanium added was mostly dispersed in the eutectic phase. Solder/Cu interface consisted of ε-CuZn5 near solder and γ-Cu5Zn8 near Cu substrate. The Zn-rich phase in solder alloy was connected to CuZn5. There was only one intermetallic compound, γ-Ni5Zn21, formed at the solder/Ni interface. The eutectic phase in solder alloy was adjacent to Ni5Zn21. Growth kinetics analysis showed that the growth mechanism of CuZn5 and Cu5Zn8 was reaction-controlled, and the growth activation energy of these two IMCs would be 62.1kJ/mol and 32.6 kJ/mol, respectively, if no titanium was added into the solder. After addition of 0.02wt% Ti, the growth activation energy increased to 92.7kJ/mol and 39.5kJ/mol. The growth mechanism of Ni5Zn21 was also reaction-controlled, and the growth activation energy of Ni5Zn21 would be 9.2kJ/mol if titanium was not added into the solder. After Ti addition(0.02wt%), the growth activation energy significantly increased to 95.6kJ/mol. Based on the microstructure observation for Cu5Zn8 IMC, Cu5Zn8 of the as-reflowed specimen was composed of equiaxed grains. After multiple reflow process, fine equiaxed grains appeared near Cu substrate. With the increment in reflow cycles, the number of fine equiaxed grains increased, thus leading to the increment in Cu5Zn8 thickness. Based on the grain structure, Ni5Zn21 IMC possessed four sublayers.

    總目錄 中文摘要…………………………………………………………………….Ⅰ Extended Abstract……………………………………………………………Ⅲ 誌謝………………………………………………………………….ⅩⅩⅠⅤ 總目錄………………………………………………………………….ⅩⅩⅤ 表目錄……………………………………………………………………….Ⅴ 圖目錄……………………………………………………………………….Ⅶ 第壹章、 簡介………………………………………………………………...1 1-1電子構裝(Electronic Packaging)技術……………………………….1 1-2傳統高溫鉛錫系統……………………………………………..........7 1-3高溫無鉛銲錫系統…………………………………………………11 1-3-1高溫銲錫性質需求……………………………………..........11 1-3-2金錫(Au-Sn)合金系統……………………………………….12 1-3-3鉍銀(Bi-Ag)合金系統……………………………………….14 1-3-4鋅鋁(Zn-Al)合金系統………………………………………..16 1-3-5鋅錫(Zn-Sn)合金系統……………………………………….16 1-4介金屬化合物的成長動力學………………………………………20 1-4-1常見之金屬化基板……………………………………..........20 1-4-2銲錫與金屬基板間之界面反應………………………..........20 1-5研究動機…………………………………………………………....24 第貳章、實驗方法與步驟………………………………………………….26 2-1實驗構想……………………………………………………………26 2-2鋅錫銲錫合金製備…………………………………………………28 2-3銲錫接點試片製作…………………………………………………28 2-4多重迴焊處理………………………………………………………30 2-5高溫無鉛銲錫接點之界面微結構觀察與分析……………………30 2-5-1欲觀察截面之前處理…………………………………..........30 2-5-2掃描式電子顯微鏡……………………………………..........32 2-5-3電子微探儀……………………………………………..........32 2-5-4雙束型聚焦離子束儀…………………………………..........32 2-5-5介金屬化合物厚度計算………………………………..........33 第參章、結果與討論………………………………………………………..34 3-1銲錫接點之界面微結構……………………………………………34 3-1-1 Zn-25Sn-xTi與銅基板之界面微結構………………………34 3-1-2 Zn-25Sn-xTi與鎳基板之界面微結構………………………43 3-2 Zn-25Sn-xTi銲錫與銅/鎳基板間之界面反應…………………….52 3-2-1 Zn-25Sn-xTi與銅基板經多重迴焊處理之界面反應………52 3-2-2 Zn-25Sn-xTi與銅基板間介金屬化合物之成長動力學.......................................................................................................62 3-2-3活化能對於介金屬化合物成長的意義…………………….72 3-2-4 Zn-25Sn-xTi與鎳基板經多重迴焊處理之界面反應……….74 3-2-5 Zn-25Sn-xTi與鎳基板間介金屬化合物之成長動力學.......................................................................................................85 3-2-6 Ni5Zn21介金屬化合物之成長動力學探討………………….93 3-3多重迴焊之問題討論……………………………………………....96 3-3-1多重迴焊製程對介金屬化合物生成速率之影響……..........96 3-3-2活化能計算的修改………………………………………....106 3-4 銲錫與基板間介金屬化合物的微結構分析…………….……....110 3-4-1 Zn-25Sn/Cu界面間Cu5Zn8介金屬化合物之微結構變化..110 3-4-2 Zn-25Sn/Ni界面間Ni5Zn21介金屬化合物之微結構變化..118 3-5介金屬化合物在不同成長機制下的成長活化能………………..123 第肆章、結論……………………………………………………………...135 參考文獻…………………………………………………………………...136 附錄1……………………………………………………………………....143 附錄2……………………………………………………………………....144 表目錄 表1-1高溫銲錫的應用及其主要性質需求………………………………….9 表3-1 CuZn5在不同峰值溫度、迴焊次數下之厚度………………………60 表3-2 Cu5Zn8在不同峰值溫度、迴焊次數下之厚度………………..........61 表3-3鋅錫銲錫與銅基板間介金屬化合物厚度對反應時間作圖後之回歸 線相關係數值………………………..................................................67 表3-4鋅錫銲錫與銅基板間介金屬化合物之成長速率……………..........68 表3-5不同成份銲錫與銅基板間介金屬化合物之成長活化能…………...71 表3-6 Sn-9wt%Zn/Ni界面之Ni5Zn21在不同反應溫度下的反應速率常數 ………………………………………………………………………..83 表3-7 Ni5Zn21在不同峰值溫度、迴焊次數下之厚度…………………….84 表3-8 Ni5Zn21介金屬化合物厚度對反應時間作圖後之回歸線相關係數值 …………………………………………………………......................88 表3-9 Ni5Zn21介金屬化合物之成長速率………………………………….89 表3-10不同成份銲錫與鎳基板間Ni5Zn21之成長活化能Q(kJ/mol) ………………………………………………………………………..92 表3-11 Ni5Zn21在不同峰值溫度下、經五次迴焊之厚度…………………98 表3-12 Ni5Zn21在不同峰值溫度(不持溫)下之成長速率…………...........100 表3-13多重迴焊之峰值溫度不持溫(0 min)與持溫(3 min)狀況下,Ni5Zn21 之活化能Q(kJ/mol)…………………………………......................101 表3-14 Ni5Zn21在不同峰值溫度下之成長速率(持溫階段)………...........109 表3-15鋅錫銲錫與銅基板間介金屬化合物之成長速率(n=0.5)………...130 表3-16 Ni5Zn21介金屬化合物之成長速率(n=0.5)………………………..131 表3-17不同成份銲錫與銅基板間介金屬化合物之成長活化能(n=0.5)...132 表3-18不同成份銲錫與鎳基板間Ni5Zn21之成長活化能(n=0.5)………..133 圖目錄 圖1-1電子構裝主要功能…………………………………………………….2 圖1-2電子構裝層級…………………………………………………………3 圖1-3晶片級封裝之接合技術(A)打線接合 (B)捲帶式自動接合 (C)覆晶 接合…………………………………………………………………....6 圖1-4鉛錫(Pb-Sn)二元相圖………………………………………………..10 圖1-5金錫(Au-Sn)二元相圖……………………………………………….13 圖1-6鉍銀(Bi-Ag)二元相圖…………………………………………..........15 圖1-7鋅鋁(Zn-Al)二元相圖…………………………………………..........17 圖1-8鋅錫(Zn-Sn)二元相圖…………………………………………..........18 圖2-1實驗流程圖……………………………………………………...........27 圖2-2石英封管流程圖………………………………………………..........29 圖2-3銲錫接點single lap solder joint試片示意圖…………………..........31 圖3-1 Zn-25Sn與Cu基板於425℃持溫15分鐘進行接合(as-reflowed)之 界面微結構…………………………………………………………..36 圖3-2 Zn-25Sn-0.02Ti與Cu 基板於425℃持溫15分鐘進行接合(as- reflowed)之界面微結構………………………………………...........37 圖3-3 Zn-25Sn與Cu 基板界面WDS分析結果(實驗條件:425℃、持溫 15分鐘)……………………………………………………................38 圖3-4 Zn-25Sn-0.02Ti與Cu基板界面WDS分析結果(實驗條件:425℃、 持溫15分鐘)………………………………………..…………..........39 圖3-5 Zn-25Sn/Cu經多重迴焊5次之界面元素分佈分析結果(紅色方框框 選處為介金屬化合物部份)………………………………………….41 圖3-6 Zn-25Sn-0.02Ti/Cu經多重迴焊5次之界面元素分佈分析結果(紅色 方框框選處為介金屬化合物部份)…………………………….........42 圖3-7 Zn-25Sn與Ni 基板於425℃持溫15分鐘進行接合(as-reflowed)之 界面微結構……………………………..............................................45 圖3-8 Zn-25Sn-0.02Ti與Ni 基板於425℃持溫15分鐘進行接合(as- reflowed)之界面微結構……………………………..........................46 圖3-9 Zn-25Sn與Ni基板界面之成份定量分析結果(實驗條件:425℃、 持溫15分鐘)…………………………………………………...........47 圖3-10 Zn-25Sn-0.02Ti與Ni 基板界面之成份定量分析結果(實驗條件: 425℃、持溫15分鐘)………………………………….....................48 圖3-11 Zn-25Sn/Ni經多重迴焊5次之界面元素分佈分析結果(紅色方框框 選處為介金屬化合物部份)…………………………….....................49 圖3-12 Zn-25Sn-0.02Ti/Ni經多重迴焊5次之界面元素分佈分析結果(紅色 方框框選處為介金屬化合物部份)………………….........................50 圖3-13 Zn-25Sn-0.02Ti/Ni經多重迴焊5次之界面處經EPMA線掃描分析 結果…………………………………………………………………..51 圖3-14 峰值溫度270℃之單次迴焊條件(銅基板)……………………….53 圖3-15 峰值溫度300℃之單次迴焊條件(銅基板)……………………….54 圖3-16 峰值溫度330℃之單次迴焊條件(銅基板)……………………….55 圖3-17 Zn-25Sn與Zn-25Sn-0.02Ti與銅基板經不同次數多重迴焊之界面 SEM圖(峰值溫度270℃)……………………………………………56 圖3-18 Zn-25Sn與Zn-25Sn-0.02Ti與銅基板經不同次數多重迴焊之界面 SEM圖(峰值溫度300℃)……………………………………………57 圖3-19 Zn-25Sn與Zn-25Sn-0.02Ti與銅基板經不同次數多重迴焊之界面 SEM圖(峰值溫度330℃)……………………………………………58 圖3-20 鋅錫銲錫與銅基板間介金屬化合物厚度與反應時間趨勢圖(峰值 溫度330℃)………………………………………..............................64 圖3-21 CuZn5介金屬化合物厚度對反應時間、反應時間開根號作圖,以 及相關係數大小之比較(峰值溫度330℃)…………………….........65 圖3-22 Cu5Zn8介金屬化合物厚度對反應時間、反應時間開根號作圖,以 及相關係數大小之比較(峰值溫度330℃)……………….................66 圖3-23 CuZn5及Cu5Zn8之成長速率取自然對數(ln(k))後對1000/T之作圖 結果…………………………………………......................................70 圖3-24 不同成分銲錫與銅基板間CuZn5及Cu5Zn8之成長速率比值 ………………………………………………………………………..73 圖3-25 峰值溫度270℃之單次迴焊條件(鎳基板)……………………….75 圖3-26 峰值溫度300℃之單次迴焊條件(鎳基板)……………………….76 圖3-27 峰值溫度330℃之單次迴焊條件(鎳基板)……………………….77 圖3-28 Zn-25Sn與Zn-25Sn-0.02Ti與鎳基板經不同次數多重迴焊之界面 SEM圖(峰值溫度270℃)……………………………........................78 圖3-29 Zn-25Sn與Zn-25Sn-0.02Ti與鎳基板經不同次數多重迴焊之界面 SEM圖(峰值溫度300℃)………………………………....................79 圖3-30 Zn-25Sn與Zn-25Sn-0.02Ti與鎳基板經不同次數多重迴焊之界面 SEM圖(峰值溫度330℃)……………………....................................80 圖3-31 鋅錫銲錫與鎳基板間介金屬化合物厚度與反應時間趨勢圖(峰值 溫度330℃)……………………..........................................................86 圖3-32 Ni5Zn21介金屬化合物厚度對反應時間、反應時間開根號作圖,以 及相關係數大小之比較(峰值溫度330℃)………………….............87 圖3-33 Ni5Zn21之成長速率取自然對數(ln(k))後對1000/T之作圖結果 ………………………………………..................................................91 圖3-34 不同成分銲錫與鎳基板間Ni5Zn21之成長速率比值………….....95 圖3-35 單次迴焊條件(holding time:0 min、heating rate:0.2℃/s、 cooling rate:-0.4℃/s),峰值溫度分別為(a)270℃ (b)300℃ (c)330℃…………………………………………………………………….97 圖3-36 迴焊過程中不同溫度下之速率說明圖(配合式(3-5))……..........102 圖3-37 共晶比例及其內鋅含量隨溫度變動之示意圖………………….104 圖3-38 峰值溫度300℃之單次迴焊條件,紅框為在峰值溫度的持溫階 段…………………………………………………………………...108 圖3-39 迴焊(as-reflowed)後Zn-25Sn/Cu界面處之縱剖面二次電子影像 ………………………………………………………………..........111 圖3-40 多重迴焊處理後Zn-25Sn/Cu界面處之縱剖面二次電子影像 (a)多 重迴焊3次 (b)多重迴焊5次……………………..........................112 圖3-41 Cu5Zn8介金屬化合物各分層的成長趨勢…………………..........114 圖3-42 Cu5Zn8介金屬化合物各分層的 (a)晶粒數量隨反應時間之變化 (b) 晶粒尺寸隨反應時間之變化……………………............................115 圖3-43 (a)多重迴焊處理5次後Zn-25Sn/Cu界面處之縱剖面二次電子影 像 (b)圖(a)紅色方框區域之放大圖(黃色虛線圈選處為較細小晶 粒)……………………………….......................................................117 圖3-44 (a)迴焊(as-reflowed)試片Zn-25Sn/Ni界面處之縱剖面二次電子影 像 (b)圖(a)紅色方框區域之放大圖……………………………….119 圖3-45 多重迴焊處理後Zn-25Sn/Ni界面處之縱剖面二次電子影像 (a)多 重迴焊3次 (b)多重迴焊5次…………………………………….120 圖3-46 Ni5Zn21介金屬化合物各分層的成長趨勢………………………121 圖3-47 Zn-25Sn/Cu間CuZn5介金屬化合物厚度對反應時間、反應時間開 根號作圖,並標示各溫度條件下的相關係數……………………..124 圖3-48 Zn-25Sn-0.02Ti/Cu間CuZn5介金屬化合物厚度對反應時間、反應 時間開根號作圖,並標示各溫度條件下的相關係數……………..125 圖3-49 Zn-25Sn/Cu間Cu5Zn8介金屬化合物厚度對反應時間、反應時間 開根號作圖,並標示各溫度條件下的相關係數…………………..126 圖3-50 Zn-25Sn-0.02Ti/Cu間Cu5Zn8介金屬化合物厚度對反應時間、反應 時間開根號作圖,並標示各溫度條件下的相關係數……………..127 圖3-51 Zn-25Sn/Ni間Ni5Zn21介金屬化合物厚度對反應時間、反應時間 開根號作圖,並標示各溫度條件下的相關係數…………………..128 圖3-52 Zn-25Sn-0.02Ti/Ni間Ni5Zn21介金屬化合物厚度對反應時間、反應 時間開根號作圖,並標示各溫度條件下的相關係數……………..129

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