中文摘要
由於科技的進步，產品的微小化逐漸成為一種趨勢，因此製程所要求的特徵也越來越小，目前發展出一種新興的製程技術--奈米壓印技術，具有製程簡單、成本低廉、又兼具量產的優勢，並且可以輕易的製作出奈米級的微結構，是相當被看好的新製程技術。本研究是針對奈米壓印發展一新的數學模型。在過去研究中，有一些新的數學模型被發展出來，但是大多將光阻是為一牛頓流體。然而光阻為一高分子物質，分子鏈遠長於一般流體，光阻由固態加熱到產生液體狀態的流動方式，應與一般液體有所差異，因此在本論文中導入高分子熔液常使用的指數律，以描述流動時溫度對黏滯力產生的影響，並建構一個新的數學模型以估計壓印時微結構的充填深度。另外實驗方面則是以類LIGA製程自製模仁，在固定的力量下壓印。其後使用AFM儀器檢驗壓印的結果，再與模擬做比較並加以探討。

Abstract
Subject: Study of Processing Parameters in the Nanoimprint Lithography
Student: I-Chin Hsin
Advisor: Wen-Bin Young

In recent years, many new lithography techniques have been developed for nano-scale fabrication. Among those techniques, nanoimprint lithography provides a low-cost, high resolution, and high throughput manufacturing of nanostructures. It is regarded as one of the most successful alternative lithography techniques. In this study, we construct a new mathematics model to simulate polymer filling of the microstructure. A power law model is applied to describe the viscosity of the polymer photoresist when polymer layer is heat to turn into melt state. In the experiment, we use the LIGA-LIKE lithography process to construct the micro mold insert. A constant force is applied during the imprint process. The results of simulations are compared to the experimental data for verification.

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