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研究生: 黃彥鈞
Huang, Yan-Jun
論文名稱: SU-8基板之光化學還原製備銀/SU-8奈米複合物研究
Direct synthesis of silver/SU-8 nanocomposites by photoreduction on SU-8 substrates
指導教授: 林俊宏
Lin, Chun-Hung
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2022
畢業學年度: 110
語文別: 中文
論文頁數: 100
中文關鍵詞: 奈米複合物光還原銀奈米粒子
外文關鍵詞: Nanocomposite, Photoreduction, Silver Nanoparticles
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  • 近年來,奈米材料一直備受關注,奈米粒子與聚合物基質所形成的奈米複
    合物(nanocomposite),因其製作上的便利性以及奈米粒子於光學、電學、生醫上特性所長的結合,也帶來許多領域的應用及討論。此篇文章中,我們嘗試使用 SU-8 光阻以光還原法的方式,了解相對前體鹽類混合後還原、先製作奈米粒子後混入等常見製程,製作奈米複合物上的差異以及優劣。
    由於銀奈米粒子具有相當強的表面電漿共振(Localized surface plasmon resonance)吸收,利用光還原製程特性,可以調整前體鹽濃度 0.5mM 至 50mM 區間、還原重複次數(一至數十次)等相關製程參數,改變銀奈米粒子分佈及數量來改變光性質的效果,也能結合同系統環境下,衍生製作奈米金銀的複合表面材料,創造更多元維度的頻譜控制效果,可分別調控 420nm 以及 600 至 700nm 波長區間頻譜。利用奈米壓印製作 300 至 500nm點、洞陣列 SU-8 結構後,進行複合物製作,並於後驗證了能於微米級圖案 SU-8 製作的曝光微影後還原的可能性。總體而言,我們方式能解決常見的複合物製作方法預先製作以及繁雜工序、難以保存等缺點,並為廣泛 SU-8 所製元器件,再次加工改質提供了可行性以及新的方向。此一製程具有步驟簡單、單一次製程僅需 30 分鐘、可一次大量製作數十片以上樣品、以及製程可分段化(製程間隔可分隔數十天)等特點,甚至是奈米銀的抗菌性質,並能由單樣品提供 80??2以上的抑菌面積,此些特性也能於後續提供電學、生醫等應用研究方向。

    In recent years, nanomaterials have been attracting much attention. The nanocomposite formed by nanoparticle and polymer is due to its convenience in fabrication and the optical, electrical, and biomedical properties of nanoparticle. The combination of these has also brought applications and discussions in many fields. In this article, we will use SU-8 photoresist to make silver nanocomposite by photoreduction method, due to the strong localized surface plasmon resonance absorption of silver nanoparticles. Using the back section process characteristics, the process parameters can be adjusted. The distribution and quantity of silver nanoparticles can be changed to change the effect of optical properties, and it can also be combined with the same system environment, combined with the process architecture of the nano-imprinted gold nanostructures, derivative production the composite surface material of nano-gold and silver creates multi-dimensional spectrum control effects. After the SU-8 structure is fabricated by different patterning methods, the complex is fabricated, which have spectrum differences in different structures and under different process parameters. The possibility of restoration after exposure lithography provides the feasibility for re-processing and modification of components made by SU-8. This process is simple, fast, can be mass-produced, and the process can be segmented, which is also convenient for the promotion of the process and the expansion of the scope of application.

    摘要 I 致謝 IX 目錄 X 表目錄 XIII 圖目錄 XIV 第 一 章 緒論 1 1.1 前言 1 1.2 研究動機 3 1.3 論文架構 3 第 二 章 理論原理與文獻回顧 5 2.1 銀奈米粒子 5 2.1.1 銀奈米粒子特性及應用 5 2.1.2 銀奈米粒子製作方式與特點 6 2.2 聚合物複合物與各式製程 7 2.2.1 聚合物性質與發展 7 2.2.2 聚合物製程介紹與應用 8 2.3 光還原製程 10 第 三 章 研究方法 21 3.1 各式模具製作與藥品配置 21 3.1.1 藥品配置 21 3.1.2 矽母模具製作 24 3.1.3 全氟聚醚軟(PFPE)模具製作 25 3.2 複合物與金奈米粒子還原製程 27 3.2.1 金及銀奈米粒子還原製程 27 3.2.2 奈米金結構製作 29 3.3 光阻圖案化製程 31 3.3.1 紫外光曝光微影 31 3.3.2 奈米壓印微影 32 3.4 抗菌擴散濾紙樣品製作 34 3.5 結果量測與分析數值方法 35 3.5.1 簡易架構光譜量測 35 3.5.2 均勻性光學量測 36 3.5.3 檢視結構與分析儀器 37 3.5.4 頻譜色彩對應 37 第 四 章 實驗結果與討論 44 4.1 銀奈米複合物薄膜製程 44 4.1.1 奈米複合物TEM影像分析與視覺觀測討論 44 4.1.2 奈米複合物製程參數討論 46 4.1.3 銀奈米複合物於溫度下的影響以及其他特性 49 4.2 金銀奈米複合表面之探討 52 4.2.1 金銀奈米粒子複合還原可行性探討 52 4.2.2 金銀奈米複合表面 54 4.3 奈米圖案銀複合物結構使用與研究 55 4.3.1 奈米壓印方式製作 56 4.3.2 曝光微影方式製作 59 4.4 銀奈米複合物初步抗菌能力探討 60 第 五 章 結論與展望 91 5.1 結論 91 5.2 未來展望 92 第 六 章 參考文獻 94

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