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研究生: 張祐銘
Chang, Yu-Ming
論文名稱: 釩摻雜之二硒化鎢薄膜的光學特性與電性研究
Optical and Electrical Properties of V-Doped WSe2 Thin Films
指導教授: 王書瑋
Wang, Shu-Wei
學位類別: 碩士
Master
系所名稱: 智慧半導體及永續製造學院 - 半導體製程學位學程
Program on Semiconductor Manufacturing Technology
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 108
中文關鍵詞: 二硒化鎢層數相依性釩摻雜濃度相依性拉曼光譜光致發光光譜
外文關鍵詞: WSe2, layer dependence, V-doping dependence, Raman spectroscopy, photoluminescence
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  • 本研究系統性探討釩(vanadium, V)取代式摻雜對二硒化鎢(WSe2)之振動、光學與電性的影響。以化學計量式VxW1−xSe2表示樣品,建立四種摻雜濃度(x = 0、0.002、0.003、0.005)與四種層數(單層至四層)共十六個樣品之系統性矩陣,進行拉曼光譜與光致發光光譜分析;並針對V0.003W0.997Se2之雙層與四層樣品,透過電子束微影(electron beam lithography, EBL)與反應性離子蝕刻(reactive ion etching, RIE)製作霍爾元件(Hall bar),進行電性量測。
    拉曼光譜分析顯示,釩摻雜誘發 E_2g^1 、 A_1g 與 B_2g^1 三個振動模態之系統性紅移:顯示 V 原子取代 W 位點後可能造成局部鍵結環境改變,並降低有效鍵結力常數,使相關聲子模態呈現軟化現象。E_2g^1 紅移量隨層數增加而遞減(單層:1.47 cm⁻¹、四層:0.47 cm⁻¹),反映層間凡德瓦耦合對摻雜效應之穩定化作用。光致發光分析則顯示釩摻雜引發顯著之光譜紅移(單層約 60 meV、多層約 20–30 meV)、線形展寬與發光強度衰減,源於能帶重整化、能隙內缺陷態與非輻射復合通道之共同作用。電性量測結果顯示,雙層與四層元件均呈現雙極性傳輸行為,確認釩摻雜引入有效之受體能階。V0.003W0.997Se2之雙層元件具備較佳之閘極控制能力,四層元件則展現較高之場效遷移率與較大之開關電流比。
    綜合上述結果,釩取代式摻雜於 WSe2 中所引發之鍵結軟化、晶格無序、能帶重整化等現象呈現相互呼應之物理機制,並隨層數展現顯著之相依行為。

    This study systematically investigates the optical and electrical properties of vanadium-doped WSe2. V-doped WSe2 samples are denoted by VxW1−xSe2, where x is the fraction of W lattice sites substituted by V. A 4 × 4 sample matrix of four doping levels (x = 0, 0.002, 0.003, 0.005) and four layer thicknesses (monolayer to four-layer) was prepared for Raman and photoluminescence (PL) characterization, and Hall bar devices were fabricated from V0.003W0.997Se2 bilayer and four-layer flakes for electrical transport measurements at room temperature.
    Raman analysis shows that V doping induces systematic redshifts in theE_2g^1,A_1g, and B_2g^1vibrational modes, suggesting that V substitution at W sites modifies the local bonding environment and reduces the effective force constant, leading to phonon softening. The E_2g^1 redshift magnitude decreases from 1.47 cm⁻¹ in monolayer to 0.47 cm⁻¹ in four-layer samples, evidencing the stabilizing influence of interlayer van der Waals coupling. PL spectroscopy further reveals a pronounced doping-induced redshift (~60 meV for monolayer, ~20–30 meV for multilayer), accompanied by linewidth broadening and emission quenching, arising from bandgap renormalization, in-gap defect states, and defect-mediated non-radiative recombination. Both bilayer and four-layer devices exhibit ambipolar transport behavior, confirming that V doping introduces effective acceptor states.
    Overall, V substitution in WSe2 gives rise to bond softening, lattice disorder, band-structure modification, and acceptor-state formation, with pronounced layer-dependent behavior throughout.

    摘要 I SUMMARY II 誌謝 VII Contents VIII 表目錄 XI 圖目錄 XII Chapter 1 緒論 1 1.1 研究背景 1 1.2 研究動機與目的 3 Chapter 2 相關理論與文獻回顧 5 2.1 二維材料之基本理論 5 2.2 過渡金屬二硫族化物與 WSe2 材料特性 7 2.3 Raman 光譜分析原理 9 2.4 Photoluminescence 光譜分析原理 11 2.5 WSe₂ 之層數相依光學特性 13 2.6 V摻雜對 WSe₂ 材料特性之影響 15 2.7 WSe2 場效電晶體與轉移特性分析 17 2.7.1 開關電流比 17 2.7.2 次臨界擺幅 18 2.7.3 場效遷移率 19 2.7.4 轉移特性與接觸行為 20 Chapter 3 實驗方法與製備流程 22 3.1 WSe2 與 V-doped WSe2 晶體生長 22 3.2 基板清洗與前處理 23 3.3 ICP 氧電漿表面處理 24 3.4 機械剝離與乾式轉移技術 26 3.4.1 機械剝離 26 3.4.2 PC/PDMS 乾式拾取轉移 28 3.5 Hall bar元件製作流程 30 3.5.1 光阻旋塗與第一次電子束微影:mesa 圖案定義 30 3.5.2 反應離子蝕刻:Hall bar mesa 結構製作 32 3.5.3 光阻旋塗與第二次電子束微影:contact 圖案定義 34 3.5.4 金屬電極蒸鍍與 lift-off 35 Chapter 4 實驗量測架構 37 4.1 原子力顯微鏡(AFM)厚度量測 37 4.2 掃描穿透式電子顯微鏡與能量散射X光譜儀(STEM-EDS)成分分析 39 4.3 Raman 光譜量測系統 41 4.4 Photoluminescence 光譜量測系統 43 4.5 電性量測平台 44 Chapter 5 實驗結果與討論 45 5.1 樣品基本表徵結果 45 5.1.1 薄片層數確認(OM 與 AFM) 45 5.1.2 V 摻雜濃度確認(EDS) 48 5.1.3 Hall bar 元件完成樣品 51 5.2 層數相依之光學特性分析 54 5.2.1 Raman 光譜之層數相依性變化 54 5.2.2 PL 光譜之層數相依性變化 66 5.3 V 摻雜濃度相依之光學特性分析 69 5.3.1 Raman 光譜之摻雜濃度相依性變化 69 5.3.2 PL 光譜之摻雜濃度相依性變化 76 5.4 V0.003W0.997Se2 Hall bar 元件電性特性 81 5.4.1 轉移特性曲線 81 5.4.2 電性量測結果 84 Chapter 6 結論 88 References 91

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