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| 研究生： |
邱正宇 Chiu, Cheng-Yu |
|---|---|
| 論文名稱： |
雷射輔助滾輪式奈米直壓印及
接觸轉印與遮罩植入式顯影於微奈米結構製造與應用 Laser-Assisted Direct Roller Imprinting and Contact-Transferred & Mask-Embedded Lithography for Micro/Nano-Structures Fabrication and Applications |
| 指導教授： |
李永春
Lee, Yung-Chun |
| 學位類別： |
博士 Doctor |
| 系所名稱： |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年： | 2009 |
| 畢業學年度： | 98 |
| 語文別： | 英文 |
| 論文頁數： | 123 |
| 中文關鍵詞： | 滾輪壓印 、奈米壓印 、準分子雷射 、微影 、接觸轉印 、金屬轉印 、遮罩植入 、可撓式 、聚醯亞胺 、有機薄膜電晶體 、偏光板 |
| 外文關鍵詞： | roller imprinting, nanoimprinting, excimer laser, lithography, contact printing, metal transfer, mask embedded, flexibile, polyimide, OTFT, polarizer |
| 相關次數： | 點閱：184 下載：14 |
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奈米壓印與奈米轉印法為具有製作圖案或結構線寬尺寸低於100 nm之非傳統之奈米圖型佈植技術。此項新式奈米圖形佈值技術具有高製作效能、低成本、製程儀器簡單與製作時間快速等優勢，極具有成為下一世代微奈米圖形佈值技術的潛力。本文成功地發展出一快速且連續式的奈米滾輪壓印技術與一新式奈米轉印之方法，經由實驗結果顯示，此奈米壓印與轉印方法具有製作微奈米結構的能力，並且可以應用在光學與電子元件的開發與製作。
本論文的研究可根據奈米壓印或轉印製程中，有無使用中介材料作為微奈米圖形定義的緩衝材料層為標準，將論文內容區分為二大部份。首先，論文的第一部份提出以雷射輔助滾輪式直壓印法(Laser-Assisted Roller direct Imprinting，簡稱LARI)，用於解決傳統平面式雷射輔助直壓印(Laser-assisted Direct Imprinting，簡稱LADI)的缺點與所遭遇之限制。滾輪式雷射輔助直壓印技術平台藉由導入一高透UV光之柱狀石英元件，以提供壓印所需之線接觸式的集中壓印應力於預壓印之矽晶圓基板上；同時，柱狀石英元件能將準分子雷射光束進行光照射面積的倍縮，進而提昇矽晶圓表面單位照射面積上之雷射能量，完成連續式壓印微奈米尺寸之特徵圖形於矽晶圓表面。實驗結果顯示，滾輪式雷射輔助直壓印技術可以速度為1.5 cm2/min的速度，快速且成功地完成線寬400 nm，壓印面積大小為5 x 30 mm2 的柵狀奈米結構於矽晶圓基板表面上。
論文的另一部份介紹自行開發的新式奈米轉印技術，並將之稱為接觸轉印與遮罩植入式顯影(Contact-transferred and Mask-Embedded Lithography, 簡稱CMEL)。相較於其他奈米壓印或轉印方法，接觸轉印與遮罩植入式顯影技術的特點是可在相對低溫度與低壓印力下，於緩衝材料層上，進行微奈米尺寸之特徵圖形的金屬薄膜轉印技術。經實驗結果顯示，接觸轉印與遮罩植入式顯影技術可以大面積地將線寬65 nm的特徵圖形金屬薄膜轉印於緩衝材料層表面，並且可有效抵擋乾式蝕刻的作用，完成高深、寬比的奈米結構製作。此外，接觸轉印與遮罩植入式顯影技術可在相對低溫的壓印環境，於光學與電子元件製作中，所廣泛使用的熱固性材料聚醯亞胺表面上製作奈米結構。論文最後以接觸轉印與遮罩植入式顯影技術製作有機薄膜電晶體與可撓式偏光板，實驗結果顯示，接觸轉印與遮罩植入式顯影技術具有潛力成為下一世代奈米圖形佈值與結構製作的有效工具。
Nano-impriting and nano-printing are unconventional nano-patterning techniques for fabricating nano-structures with the advantages of small line-width (less than 100 nm), high throughput, low cost, and using simplified equipments and processing procedures. This dissertation has successfully developed several new types of nano-imprinting and nano-patterning methods and demonstrated their capabilities in fabricating micro/nano-structures with applications on optical and electrical devices.
The works presented in this dissertation can be divided into two parts according to whether a transition polymer layer is used in transferring patterns from a mold to a substrate. In the first part, a roller-based laser-assisted direct imprinting method (LADI) is proposed to overcome the drawbacks and limitations of conventional planar type LADI. The improvement in LADI has been achieved mainly by including a quartz roller which can focus a laser beam into a line and provide a uniform line contact pressure, and therefore allows continuous and direct formation of micro/nano-structures on substrates based on pulsed laser heating and contact loading pressure. Linear gratings with a line width of 400 nm have been patterned on a silicon substrate with an area size of 5 x 30 mm2 in a rate of 1.5 cm2/min.
On the second part of this dissertation, a novel contact nano-printing method named contact-transferred and mask-embedded lithography (CMEL) has been developed using a transition layer. This CMEL method is a low temperature nano-printing technique which transfers a patterned metal layer from a mold to a polymer layer on top of a substrate surface. It can achieve a resolution of 65 nm in large area patterning and the transferred metal patterns can efficiently resist dry etching process to fabricate nano-structures with a high aspect ratio. CMEL has a great potential for patterning nano-patterns on various materials. Among them, polyimide, a thermal setting polymer widely used in optical and electrical devices, has been demonstrated with CMEL and the nano-patterning can be executed at a relatively low temperature. Finally, the CMEL techniques have been a pplied to the fabrication of organic thin film transistors (OTFTs) device and a flexible nano-wired grid polarizer (NWGP). Experimental results successfully show that CMEL indeed has great potential as a powerful nano-patterning and nano-fabrication method for a variety of applications.
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