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研究生: 杜宜亮
Du, Yi-Liang
論文名稱: 應用瞬間相位移干涉術於表面形貌量測
Surface Profile Measurement With Instantaneous Phase-Shifting Interferometry
指導教授: 陳元方
Chen, Terry Yuan-Fang
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2008
畢業學年度: 96
語文別: 中文
論文頁數: 98
中文關鍵詞: 偏極板相位移法數位影像相關法四分之一波板極化分光鏡相位展開法瞬間相位移干涉儀
外文關鍵詞: Digital image correlation, Instantaneous phase-shifting interferometer, Quarter-wave plate, Polarizer, Polarized beam-splitter, Phase shifting, Phase unwrapping
相關次數: 點閱:199下載:14
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  • 在本文中利用極化分光鏡(Polarized Beam-Splitter, PBS),偏極板(Polarizer),四分之一波板(Quarter-Wave Plate, QWP)搭配參考面鏡(Reference Mirror)、分光鏡(Beam-Splitter)和CCD(Charge Couple Device)相機分別建立四CCD和單一CCD瞬間相位移干涉儀,可同時擷取多張不同相位移干涉條紋圖,利用相位移法得到相位值,再經由相位展開法與相位值與高度值轉換後,可得試件表面形貌。在干涉條紋模擬分析方面,利用已知高度之形貌,模擬出干涉條紋圖,將相位值做轉換後可得模擬形貌高度。利用計算改變模擬干涉條紋圖之位置所造成之誤差值,以模擬CCD擷取影像位置差異,並對於各種誤差來源進行分析。在實驗部份則是分別利用四CCD與單一CCD實驗架設擷取干涉條紋,利用數位影像相關法(Digital Image Correlation, DIC)與影像伸張強化校正其取像位置與光強度差異。並量測平面鏡與晶圓之表面形貌,與α-Step形貌量測儀量測之高度值比較, 以驗正實驗之正確性,在4 CCD實驗部份其平均誤差0.03μm~0.05μm之間。最大誤差約為0.1μm。在單一CCD實驗部份,其平均誤差為0.07μm~0.09μm,最大誤差約為0.2μm。

    In this article, the polarized beam-splitter (PBS), polarizers, quarter-wave plates, reference mirror, bema-splitter and CCDs are used to setup a multi-CCD and a single-CCD instantaneous phase-shifting interferometer (IPSI) to capture interference images with different phase-shiftings instantaneously. By applying phase shifting and phase unwrapping method, the surface profile of specimen can be determined. In the simulation and analysis of interference fringes, interference images can be simulated from a known surface profile, after converting the phase value to altitude value, the simulation surface profile can be obtained. By changing the position of these interference images to simulate the position mismatch while capturing interference images, the surface profile errors comparing with the known profile can be calculated. The error analysis is also carried out in this article to determine the contribution of error sources. In experiment, the interference images are captured by four CCD and single CCD experiment setup, the position mismatch and intensity difference of these images can be correct by using digital image correlation method(DIC) and image enhancement. The specimens used in the article are a mirror and a wafer. In order to verify the feasibility, the results of experiment would be compared with the profile measured by α-Step surface profile meter. According to the experiment result, the average error of the four CCD experiment lays between 0.03μm~0.05μm and the maximum error is about 0.1μm. The average error of one CCD experiment lays between 0.07μm~0.09μm and the maximum error is about 0.2μm.

    中文摘要 I 英文摘要 II 誌謝 III 目錄 IV 圖目錄 VII 表目錄 XII 符號說明 XIII 第一章 緒論 1.1 研究背景 1 1.2 研究目的 3 1.3 文獻回顧 4 1.4 本文架構 7 第二章 瞬間相位移干涉術原理 2.1 瞬間相位移干涉理論 8 2.2四步相位移法 14 2.3 相位展開法 15 2.4 中值濾波 16 2.5 數位影像相關法 17 第三章 干涉條紋模擬與誤差分析 3.1 斜面模擬與分析 19 3.2 曲面模擬與分析 24 3.3 光強值轉為灰階值之誤差分析 28 3.4 擷取影像位置誤差模擬與分析 29 3.5 擷取影像光強度差異之誤差分析 37 3.6 偏極板角度偏差之誤差分析 39 第四章 實驗裝置系統與校正 4.1 四CCD實驗裝置系統 42 4.3 校正偏極板之角度 45 4.4 DIC校正取像位置 47 4.4.1 四CCD實驗取像位置校正 47 4.4.2 單一CCD實驗取像位置校正 49 4.5 擷取影像光強校正 50 4.6 實驗流程 55 第五章 實驗結果與討論 5.1 四CCD實驗系統量測結果 56 5.1.1 四CCD實驗量測試件 56 5.1.2 平面鏡量測 59 5.1.3 傾斜平面鏡量測 63 5.1.4 晶圓量測 67 5.1.5 誤差來源討論 70 5.2 單一CCD實驗系統量測結果 72 5.2.1 單一CCD實驗量測試件 72 5.2.2 平面鏡量測 74 5.2.3 傾斜平面鏡量測 77 5.2.4 晶圓量測 80 5.2.5 誤差來源討論 83 5.3 CCD不同造成之影響 85 第六章 結論與未來展望 6.1 結論 93 6.2 未來展望 94 參考文獻 95

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