| 研究生: |
杜宜亮 Du, Yi-Liang |
|---|---|
| 論文名稱: |
應用瞬間相位移干涉術於表面形貌量測 Surface Profile Measurement With Instantaneous Phase-Shifting Interferometry |
| 指導教授: |
陳元方
Chen, Terry Yuan-Fang |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2008 |
| 畢業學年度: | 96 |
| 語文別: | 中文 |
| 論文頁數: | 98 |
| 中文關鍵詞: | 偏極板 、相位移法 、數位影像相關法 、四分之一波板 、極化分光鏡 、相位展開法 、瞬間相位移干涉儀 |
| 外文關鍵詞: | Digital image correlation, Instantaneous phase-shifting interferometer, Quarter-wave plate, Polarizer, Polarized beam-splitter, Phase shifting, Phase unwrapping |
| 相關次數: | 點閱:199 下載:14 |
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在本文中利用極化分光鏡(Polarized Beam-Splitter, PBS),偏極板(Polarizer),四分之一波板(Quarter-Wave Plate, QWP)搭配參考面鏡(Reference Mirror)、分光鏡(Beam-Splitter)和CCD(Charge Couple Device)相機分別建立四CCD和單一CCD瞬間相位移干涉儀,可同時擷取多張不同相位移干涉條紋圖,利用相位移法得到相位值,再經由相位展開法與相位值與高度值轉換後,可得試件表面形貌。在干涉條紋模擬分析方面,利用已知高度之形貌,模擬出干涉條紋圖,將相位值做轉換後可得模擬形貌高度。利用計算改變模擬干涉條紋圖之位置所造成之誤差值,以模擬CCD擷取影像位置差異,並對於各種誤差來源進行分析。在實驗部份則是分別利用四CCD與單一CCD實驗架設擷取干涉條紋,利用數位影像相關法(Digital Image Correlation, DIC)與影像伸張強化校正其取像位置與光強度差異。並量測平面鏡與晶圓之表面形貌,與α-Step形貌量測儀量測之高度值比較, 以驗正實驗之正確性,在4 CCD實驗部份其平均誤差0.03μm~0.05μm之間。最大誤差約為0.1μm。在單一CCD實驗部份,其平均誤差為0.07μm~0.09μm,最大誤差約為0.2μm。
In this article, the polarized beam-splitter (PBS), polarizers, quarter-wave plates, reference mirror, bema-splitter and CCDs are used to setup a multi-CCD and a single-CCD instantaneous phase-shifting interferometer (IPSI) to capture interference images with different phase-shiftings instantaneously. By applying phase shifting and phase unwrapping method, the surface profile of specimen can be determined. In the simulation and analysis of interference fringes, interference images can be simulated from a known surface profile, after converting the phase value to altitude value, the simulation surface profile can be obtained. By changing the position of these interference images to simulate the position mismatch while capturing interference images, the surface profile errors comparing with the known profile can be calculated. The error analysis is also carried out in this article to determine the contribution of error sources. In experiment, the interference images are captured by four CCD and single CCD experiment setup, the position mismatch and intensity difference of these images can be correct by using digital image correlation method(DIC) and image enhancement. The specimens used in the article are a mirror and a wafer. In order to verify the feasibility, the results of experiment would be compared with the profile measured by α-Step surface profile meter. According to the experiment result, the average error of the four CCD experiment lays between 0.03μm~0.05μm and the maximum error is about 0.1μm. The average error of one CCD experiment lays between 0.07μm~0.09μm and the maximum error is about 0.2μm.
1. O. Kwon, “Multichannel Phase-Shifted Interferometer”, Optics Letters, Vol. 9. NO. 2, 59-61, 1984
2. C.L. Koliopoulos, “Simultaneous Phase Shift Interferometer” Proc. of SPIE Vol. 1531, 119-127, 1991
3. S. Suja Helen, M.P. Kothiyal, R.S. Sirohi, “Achromatic Phase-Shifting by A Rotating Polarizer”, Optics Communications, Vol. 154, P249-254, 1998
4. B.B. Garcia, A.J. Moore, C. Perez-Lopez, L. Wang, T. Tschudi, “Spatial Phase-Stepped Interferometry Using A Holographic Optical Element,” Opt. Eng. 38(12), 2069-2074, 1999.
5. A. Hettwer, J. Kranz, J. Schwider, “Three Channel Phase-Shifting Interferometer Using Polarization-Optics and A Diffraction Grating”, Opt. Eng. 39, 960-966, 2000
6. B.K.A. Ngoi, K. Venkatakrishnan, N.R. Sivakumar, T. Bo, “Instantaneous Phase Shifting Arrangement for Microsurface Profiling of Flat Surfaces”, Optics Communications 190, 109-116, 2001
7. N. Mitsutani, H. Handa, K. Kawasaki, H. Haino, “Shape Masuring Apparatus”, U.S Patent 6, 496,269, 2001
8. N.R. Sivakumr, W.K. Hui, K. Venkatakrishnan, B.K.A. Ngo, “Large Surface Profile Measurement With Instantaneous Phase-Shifting Interferometry”, Opt. Eng. 42, 367-372, 2003
9. J.E. Millerd, J.C. Wyant, “Simultaneous Phase-Shifting Fizeau Interferometer”, U.S Patent 7,057,738, 2003
10. J.E. Millerd, N.J. Brock, J.B. Hayes, M.B. North-Morris, M. Novak, J.C. Wyant, , "Pixelated Phase-Mask Dynamic Interferometer," Proc. of SPIE Vol. 5531, 304-314, 2004.
11. N.J. Brock, J.E. Millerd, J.C. Wyant, J.B. Hayes, “Pixelated Phase-Mask Interferometer”, U.S Patent 7,230,717, 2005
12. S. Yoneyama, H. Kikuta, K. Moriwaki, “Intantaneous Phase-Stepping Interfeormetry Using Polarization Imaging With a Micro-Retarder Array” Experimental Mechanics Vol. 45, 451-456, 2005
13. P.A.A.M. Somers, N. Bhattacharya, “Polarization Plane Rotator Used as A Phase Stepping Device in A 2-channel Shearing Speckle Interferometer”, Proc. of SPIE Vol. 5856, 664-673, 2005
14. A.L. Fymat, “Jones's Matrix Representation of Optical Instruments. I: Beam Splitters”, Applied Optics Vol. 10, No. 11, 2499-2505, 1971
15. M.P. Kothiyal, C. Delisle, ”Polarization Component Phase Shifters in Phase Shifting Interferometry: Error Analysis”, Journal of Modern Optics Vol. 33 No. 6, 787-793, 1986
16. 楊韶綸, “條紋反射法之向量解析與應用”,國立成功大學機械工程研究所碩士論文,2007。
17. 莊佳橙, “應用自動化相位移陰影疊紋系統量測晶圓外型”,國立成功大學機械工程研究所碩士論文, 2003
18. 張柏毅, “應用條紋投影法及條紋反射法量測物體表面形貌”,國立成功大學機械工程研究所碩士論文, 2005。
19. W.W. Macy, “Two-Dimensional Fringe-Pattern Analysis,” Applied Optics Vol. 22 NO. 23, 3898-3901, 1983.
20. 葉力旗, “應用數位相關法於白光干涉形貌量測之縫合”, 國立成功大學機械工程研究所碩士論文,2007。
21. E. Hecht, “Optics Fourth Edition”, Addison Wesly,2002
22. G.L. Cloud, “Optical Methods of Engineering Analysis”, Press Syndicate of The University of Cambridge, 1995
23. F.L. Pedrotti, S.J. Leno, S. Pedrotti, “Introduction to Optics Second Edition”, Prentice-Hall Inc, 1993
24. 繆紹剛,“數位影像處理”,台灣培生教育出版股份有限公司,2003
25. N. Brock, J. Hayes, B. Kimbrough, J. Millerd, M. North-Morris, M. Novak, J.C. Wyant, “Dynamic Interferometry”, Proc. of SPIE Vol.5875, 2005
26. B.N. Saif, J. Millerd, T. Keski-Kuha, L. Feinberg, J.C. Wyant, “Instantaneous Phase-Shifted Speckle Interferometer for Measurement of Large Optical Structrues”, Proc. of SPIE Vol.5494, 15-162, 2004
27. J. Millerd, N. Brock, J. Hayes, B. Kimbrough, M. Novak, M. North-Morris, J.C. Wyant, “Modern Approaches in Phase Measuring Metrology”, Proc. of SPIE Vol. 5856, 14-22,2005