本篇論文是以程序控溫反應/脫附(Temperature-programmed reaction/desorption，TPR/D)、歐傑電子能譜學(Auger Electron Spectroscopy，AES)和反射式吸收紅外光譜學(reflection absorption infrared spectroscopy，RAIRS)等技術，於超高真空系統中研究2-aminoethanol分子在Cu(100)表面上的熱分解與存在於表面上的中間體。TPR/D結果顯示2-aminoethanol在Cu(100)表面大部份為可逆分子吸附，只有少量分子在表面分解，在257和407K產生H2脫附。曝露量0.25L時，252K即有2-aminoethanol分子的脫附峰。隨著曝露量增加(≧0.5L)，252K脫附峰的訊號強度不再增加。曝露量是0.5L時，203K出現另外一個脫附峰，曝露量繼續增加，脫附峰的強度也增強，並且脫附峰的溫度有往高溫偏移的現象。然而，在O/Cu(100)表面上，2-aminoethanol會與吸附的氧原子反應，經N−H和O−H鍵斷裂在表面上形成−OH和−NHCH2CH2OH、−OHCH2CH2NH2或−NHCH2CH2O−可能的表面中間物。−OH在200−350K之間會結合成H2O，而表面中間物約330K開始分解而生成H2、HCN、N2和H2CO。RAIRS與密度泛函數理論(density functional theory，DFT)結果顯示–NHCH2CH2OH為O/Cu(100)表面上主要的中間物，並且發現−NHCH2CH2OH在較高溫時可能會斷O−H鍵，產生−NHCH2CH2O−環狀中間產物。

　　Temperature-programmed reaction/desorption (TPR/D), Auger electron spectroscopy(AES) and reflection-absorption infrared spectroscopy (RAIRS) have been employed to investigate the thermal decomposition of 1,3-Diiodobenzene on Cu(100) and the surface intermediates involved. TPR/D results show that 2-aminoethanol was mainly reversibly adsorption on clean Cu(100) surface, only a small amount of molecular dissociated on the surface. When exposure is 0.25L, 2-aminoethanol desorbs at 252K. As the exposure is increased(≧0.5L) this peak doesn’t grow in intensity, and a new desorption peak is found at 203K. As the exposure is increased the new peak grows in intensity and shifts slightly higher temperature. However, on O/Cu(100), the reaction of 2-aminoethanol with adsorbed oxygen starts with the formation of adsorbed −OH and adsorbed −NHCH2CH2OH, −OHCH2CH2NH2 and/or −NHCH2CH2O− via N−H and/or O−H bonds breaking. These species undergo further reaction to yield water from 200 to 350K, and H2, HCN, N2 and H2CO. RAIRS and theory DFT calculation results show that –NHCH2CH2OH is the mainly surface intermediate and could be formed to −NHCH2CH2O− via O−H bond breaking at higher temperatures.

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