本論文利用奈米壓印微影技術聚熱壓亞醯胺(polyimide, Nissan, PI RN-1349)製作週期性奈米結構。製作出線寬400、600、800和1200 nm之週期性奈米溝槽，在此週期性奈米結構上成長鎳酞菁磁性薄膜，探討鎳酞菁磁性薄膜的矯頑力與磁異向性。

由超導量子干涉磁量儀(SQUID VSM)量測在不同線寬奈米溝槽上成長之磁性有機半導體薄膜的磁滯曲線可知，當外加磁場平行奈米溝槽時獲得的矯頑力均大於外加磁場垂直奈米溝槽的情形，在溫度10 K與溝槽線寬為1200 nm的條件下可獲致最大的矯頑力異向比約1.43；最小的矯頑力異向比1.08則發生於溝槽線寬為600 nm的條件下。此外，在溫度10 K下外加磁場平行線寬800 nm奈米溝槽時可獲得最大矯頑力363.9 Oe，是無經壓印過程之樣品的1.5倍。

由原子力顯微鏡(AFM)觀察，在不同線寬奈米溝槽上鎳酞菁成長的情形，在奈米溝槽頂部的鎳酞菁成長具有方向性，晶粒均勻且連續，而在奈米溝槽底部的鎳酞菁成長則無序，晶粒形成塊狀結構以及顆粒狀，比較特別的是在線寬800 nm的溝槽條件下，鎳酞菁晶粒形狀為橢圓狀，其他線寬均為塊狀結構。而顯微拉曼激發光譜(micro-Raman spectroscopy)分析，可看出鎳酞菁分子會因受熱膨脹，造成峰值1500 cm-1處的C-N-C鍵結的原子振動頻率往低頻移動，且溫度也影響鎳酞菁分子的結晶，導致半高寬變大。但是在X光繞射光譜(XRD)的結果分析中，顯示出鎳酞菁分子並不會因成長在週期性奈米結構上而導致晶格上的變化，其繞射峰值的中心點與半高寬一致。

The properties of magnetic organic semiconductor films deposited on nanoimprinted polyimide (PI) gratings are studied. This periodic nanogratings is constructed by hot embossing nanoimprint lithography to result in the line widths of 400, 600, 800, and 1200 nm. Nickel phthalocyanine (NiPc) magnetic films are deposited onto these PI nanogratings to investigate the coercivity and magnetic anisotropy.

When the applied magnetic field is parallel to the nanogratings, the coercivity of NiPc is greater than the perpendicular case for every sample deposited on various line-width gratings. As the NiPc films were measured at temperature of 10 K, the maximum (about 1.43) and minimum (about 1.08) coercivity anisotropy ratios were obtained for the grating widths of 1200 and 600 nm, respectively. A maximum coercivity of 363.9 Oe was obtained for the NiPc film grown on 800 nm wide gratings, which is 1.5 times of that formed on plane PI surface.

Atomic force microscopy images show that the grains of NiPc deposited on the ridge of PI gratings are uniform and continuous, whereas the grains at the bottoms of the grating trenches are disordered. Only oval NiPc grains are formed on 800 nm wide PI gratings; however, the grains have a block structure for other NiPc films. The NiPc film quality was analyzed by micro-Raman spectroscopy and x-ray diffraction (XRD) after annealing process. A red shift for the peak at 1500 cm-1 corresponding C-N-C bond stretch was observed, indicating that the temperature affect the crystallization of NiPc molecules. However, no obvious changes appear in XRD, implying that the lattice of NiPc is stable on various nanogratings.

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