本篇論文是在超高真空系統(UHV)中，利用程序控溫反應/脫附(Temperature-programmed reaction/desorption，TPR/D)、反射-吸收紅外光譜 (Reflection-absorption infrared spectroscopy，RAIRS)表面技術，探討Formic hydrazide (甲醯肼)於Cu(100)與O/Cu(100)表面的吸附情形與熱反應，提出可能的反應路徑。
於120 K，Formic hydrazide可以多種吸附形式存在於銅(100)表面，包括HC(O)-NH-NH2和HC(OH)=N=N⋯HO (或-HC(OH)-N≡N⋯HO)，第一種結構仍保有C=O，呈現了1642 cm-1的紅外光吸收，第二種結構是第一種結構經H轉移及斷裂或拉長N-H鍵所產生有2094 cm-1的吸收波數。它們在表面有氫鍵的作用力。吸附分子於溫度上升過程中分解並生成N2 (239 K)、H2O (239 K)、H2 (245 K)脫附。當溫度介於250 K-300 K間，表面可能存在著HC(OH)N2的反應中間物，溫度升至365 K，此中間物以HCON2H形式脫附，含C、N、O原子的表面殘留物種再於較高溫生成CO2 (540 K)、CO (540 K)、NO (864 K)。
Formic hydrazide/O/Cu(100)的研究中，其熱反應的主要脫附產物有H2O、CON2H2、CO、CO2、NO。產物的種類與脫附溫度類似Cu(100)表面上熱反應的結果，紅外光譜隨溫度變化與無氧吸附的發現也沒有大幅改變，然而產物脫附量相對卻比較少，可能有以下原因： (一) Formic hydrazide分子於吸附過程中，因表面氧原子的立體排斥(steric repulsion)或靜電斥力(electrostatic repulsion)，不利於吸附於此分子的吸附。(二) 在O/Cu(100)表面上，可能因為氧原子立體效應(steric effect)或電子效應(electronic effect)而降低了此分子的反應性。

Adsorption and reactions of formic hydrazide on Cu(100) and O/Cu(100) are explored, using temperature-programmed reaction/desorption (TPR/D) and reflection-absorption infrared spectroscopy (RAIRS) under ultra-high vacuum.
In the case of Cu(100) at 120 K, formic hydrazide exists in multiple adsorption forms, including (1) HC(O)-NH-NH2 and (2) HC(OH)=N=N⋯HO (or -HC(OH)-N≡N⋯HO). The first form possesses a carbonyl group with a measured infrared peak at 1642 cm-1. The second adsorption structure is generated from the transformation of the first one, involving H-migration and N-H bond elongation (or breakage), and has infrared adsorption of 2094 cm-1. Hydrogen bonding exists between the adsorbed molecules. Thermal decomposition of formic hydrazide on Cu(100) generates the products of H2, N2, H2O, CON2H2, CO2, CO and NO. N2 (239 K), H2O (239 K) and H2 (245 K) evolve below 300 K. Between 250 K and 300 K, an intermediate of HC(OH)N2 is present on the surface. Upon heating to 365 K, this intermediate is desorbed into vacuum likely in the form of H-C(O)-N=NH. Eventually, other unidentified surface species containing C, O and N atoms further react to generate CO2, CO and NO at higher temperatures.
In the formic hydrazide/O/Cu(100) study, the observed infrared absorption frequencies are similar to those of Cu(100). Moreover, the thermal reaction of the adsorbed formic hydrazide produces the same products as those on Cu(100). However, the amounts of the products are relatively small, which may be due to the following reasons: (1) In the adsorption process of formic hydrazide, the molecules approaching the O/Cu(100) surface may be blocked by the preadsorbed oxygen atoms and decrease in the possibility of adsorption due to steric and/or electrostatic repulsion. (2) The preadsorbed oxygen atoms possibly occupy the active sites and therefore suppress the reaction of adsorbed formic hydrazide.

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