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研究生： 裴梧軒
PEI, Wu-Hsuan
論文名稱： 利用濕蝕刻技術製備聚二甲基矽氧烷微柱陣列以形成超疏水表面與微針結構
Fabrication of Superhydrophobic Surface and Microneedles by Wet Etching of Polydimethylsiloxane Micropillars Array
指導教授： 莊怡哲
Juang, Yi-Je
學位類別： 碩士
Master
系所名稱： 工學院 - 化學工程學系
Department of Chemical Engineering
論文出版年： 2025
畢業學年度： 113
語文別： 中文
論文頁數： 145
中文關鍵詞： PDMS 、微柱陣列 、超疏水表面 、卡西狀態 、微針結構
外文關鍵詞： Polydimethylsiloxane（PDMS）, micropillar arrays, superhydrophobic surface, Cassie State, Microneedles
相關次數： 點閱：17  下載：0 
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    • 近年來，超疏水表面的研究備受關注。透過在材料表面製備微柱陣列，分析其靜態接觸角或傾斜角的變化，並調整特定參數，就可改變表面的親疏水特性，也了解水珠在不同情況的受力情形與最終狀態。本研究利用微影技術製作出不同尺寸的模具，並透過PDMS翻模與蝕刻製備出十到百微米尺度超疏水表面。藉由改變微柱的間隙、高度和半徑等參數，觀察蝕刻時間的不同對靜態接觸角的影響。我們發現隨著蝕刻時間的增加，圓柱陣列的間距隨之提升，接觸角也跟著提升。當間距與直徑比值大於1.5時，表面更達到超疏水的性質。此外，將實驗值與不同濕潤模型的理論值進行比較後，發現趨勢與卡西狀態之理論值接近，且實驗結果皆符合文獻上所提出之理論。除此之外，間距與直徑之比值對於滑動角的結果也有關聯，隨著間距的提升，滑動角有逐步下降的趨勢存在。我們亦研究使用不同有機溶劑擔任PDMS蝕刻液的溶劑，比較不同溶劑對於蝕刻速率還有對於表面粗糙度的影響。此外，我們利用 CNC 微鑽技術製作出百微米等級的陣列模具，在PDMS 翻模後分別使用丙酮與 NMP 作為 PDMS 蝕刻液的溶劑，在無攪拌條件下探討是否會形成微針結構；在有攪拌條件下探討是否會維持圓柱結構，並進一步比較蝕刻速率對表面粗糙度與結構之影響。

    Superhydrophobic surfaces have attracted significant attention due to their potential applications in self-cleaning, anti-fouling, and water-repellent coatings. This study employed photolithography techniques to fabricate molds of various dimensions, followed by PDMS casting and etching processes to create superhydrophobic surfaces at the scale of tens to hundreds of micrometers. By adjusting parameters such as the spacing, height, and radius of micropillars, the influence of different etching durations on static contact angles was investigated. As the etching time increased, the spacing between the pillars expanded, leading to an enhancement in contact angles. When the ratio of spacing to diameter exceeded 1.5, the surfaces exhibited superhydrophobic properties. Furthermore, by comparing the experimental results with theoretical predictions from various wetting models, we observed a close alignment with the theoretical values of the Cassie state. In addition, the ratio of spacing to diameter was also found to correlate with sliding angle measurements; specifically, the sliding angle progressively decreased with increasing spacing. We also examined the use of different organic solvents as the etching medium for PDMS, comparing their effects on etching rates and surface roughness. Additionally, an array mold with microscale features (hundreds of micrometers) was fabricated using CNC micro-drilling. Acetone and NMP were respectively used as solvents in the PDMS etching solution to investigate whether microneedle structures would form under non-stirring conditions and to compare how surface roughness and etching rate influence the formation of microneedle structures.

    中文摘要 i Extended Abstract ii 致謝 xx 目錄 xxi 圖目錄 xxiv 表目錄 xxx 第1章 緒論 1 1.1 前言 1 1.2 研究動機 2 第2章 文獻回顧 3 2.1 超疏水表面 3 2.2 濕潤模型 5 2.2.1 楊式（Young）方程式 5 2.2.2 溫佐（Wenzel）方程式 6 2.2.3 卡西（Cassie）方程式 7 2.2.4 其他 8 2.3 卡西溫佐狀態轉換 9 2.4 超疏水表面的製備 10 2.4.1 模板法（Template） 10 2.4.2 電紡織法（Electrospinning） 12 2.4.3 溶膠-凝膠法（Sol-gel reaction） 15 2.4.4 層層堆積法（Layer-by-layer） 17 2.4.5 蝕刻法（Etching）18 2.5 規則狀超疏水表面 20 2.5.1 圓柱形、圓錐形超疏水表面 20 2.5.1.1 圓柱形超疏水表面 20 2.5.1.2 圓錐形超疏水表面 22 2.5.2 T字型超疏水表面 23 2.6 製備Polydimethylsiloxane （PDMS）超疏水表面 27 2.7 超疏水表面的應用 32 第3章 實驗材料與方法 35 3.1 實驗藥品與材料 35 3.1.1 微柱陣列製作（微影技術） 35 3.1.2 微柱陣列製作（CNC雕刻技術） 37 3.1.3 PDMS蝕刻實驗 38 3.2 實驗儀器與設備 39 3.2.1 微柱陣列製作（微影技術） 39 3.2.2 微柱陣列製作（CNC雕刻技術） 42 3.2.3 PDMS蝕刻實驗 44 3.3 實驗方法 47 3.3.1 用微影技術製作微柱陣列 47 3.3.1.1 光罩繪製 47 3.3.1.2 矽基板前處理 48 3.3.1.3 黃光區微影製程 48 3.3.1.4 PDMS微柱陣列製作 52 3.3.2 用CNC技術製作微柱陣列 53 3.3.2.1 具備圓柱結構之模具製備 53 3.3.2.2 PDMS微柱陣列製作 53 3.3.3 PDMS蝕刻實驗 54 3.3.3.1 配置PDMS蝕刻液 54 3.3.3.2 PDMS蝕刻 54 3.3.3.3 檢測圓柱結構 54 3.3.3.4 接觸角與滑動角測量 54 第4章 結果與討論 55 4.1 利用微影製備具有圓柱結構超疏水表面 55 4.1.1 不同圓柱間距W表面的接觸角探討 55 4.1.2 不同圓柱直徑D表面的接觸角探討 60 4.1.3 PDMS圓柱表面接觸角與水珠狀態分析 67 4.1.4 PDMS表面滑動角分析 74 4.1.5 溶液攪拌對PDMS蝕刻的影響 75 4.1.5.1 起始D = 50 μm， H = 100 μm，不同W的圓柱陣列 75 4.1.5.2 起始D = 100 μm， H = 100 μm，不同W的圓柱陣列 78 4.1.6 PDMS蝕刻液使用不同溶劑對蝕刻的影響 81 4.2 利用CNC雕刻與PDMS蝕刻技術製備微針結構 87 4.2.1 使用NMP無攪拌時不同圓柱間距W表面的結構探討 87 4.2.2 使用NMP有攪拌時不同圓柱間距W表面的結構探討 91 4.2.3 使用丙酮無攪拌時不同圓柱間距W表面的結構探討 95 4.2.4 使用丙酮有攪拌時不同圓柱間距W表面的結構探討 101 第5章 結論 106 第6章 參考文獻 107

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