本研究主要在奈米維度金屬氧化的即時反應情況，由於過去研究中對於金屬整體的氧化的即時動態行為並沒有一個實際的觀測實驗去了解真正的氧化過程中金屬與氧的交互行為，其中還關係到在真空下當金屬表層氧化後接下來金屬將透過何種方式進行再度的氧化，這是值得討論的議題。
實驗在磁控射頻系統高真空(3×10^(-6) torr)下進行，控制系統上氬氫氣流量比例、外加偏壓、基板溫度、成長時間等…，在Si(111)基板上成長出結構完整但表面分布與大小不同的鋅奈米顆粒樣品進行比較後續相關的氧化實驗。在氧化實驗中，除了比較不同表面顆粒大小的鋅奈米顆粒外，也比較不同溫度氧化以及在除了純氧外加入另一種臭氧氣體比較反應狀況，整體氧化的行為透過雷射光照射在10^10顆的鋅奈米顆粒下進行反射式二次諧波系統真空中的即時量測，氧化前鋅奈米顆粒到氧化後帶有氧化鋅球殼的奈米顆粒的整個過程，由於表面3m對稱結構的貢獻，所以在二次諧波所形成的極化強度上有著明顯的差異，這提供了一個氧化過程新的量測方式，並從二次諧波強度隨時間變化中還發現Zn因為表面需要再度氧化而擴散出來的現象，之後也藉由同步輻射XRD分析，得知量子點氧化後之晶體取向，FE-SEM觀察其表面形貌，XPS縱深分析其鋅和氧的成分比例，XANES 吸收光譜分析，去做一些佐證。研究結果可以提供金屬元件在氧化過程的新解釋方法。

In this work, we try to measure the process of metal oxidized in-situ on nano scale. In the past, there were not any researches could observe the reaction between metal and oxygen. Including how the metal would continuously oxide on the oxidative surface. It must have a mechanism. So in this experiment, we used rf-sputtering to grow different size and non-uniform Zn dot in high vacuum pressure (3×10^(-6) torr)on Si(111) surface. In order to grow different sample, we controlled Ar /H2 ratio, bios voltage, substrate temperature etc…In oxidative process, we experiment in different temperature and different gas(O2 and O3) that can compare oxidative rate and extent. Whole oxidation process, it used reflective second harmonic generation system to measure in-situ in high vacuum. The laser light on about 〖10〗^10 Zn nanoparticles. Due to the interface of Zn dot have 3mm symmetrical crystal structure, when laser light that can induce dipole intensity transition. So Zn dot change from Zn dot to ZnO shell/Zn dot that have dipole transition in the surface. Let us have a method to know the metal to oxide shell in-situ. We also observe when ZnO shell produce on Zn dot surface, inward Zn ion may diffuse to outward and oxidation again. This all process have dipole transition which will measure by RSHG. In other experiment method, we use Synchrotron radiation x-ray diffraction to know different crystal orientations after oxidation in different temperature, use FE-SEM take the surface of sample picture, use XPS know the depth and element ratio of Zn and O, and use XANES know Absorption spectrum. All the method may help us to prove the oxidative mechanism on metal.

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