簡易檢索 / 詳目顯示

研究生: 吳梓菘
Wu, Zih-Song
論文名稱: 溶液法製備氧化鎂薄膜應用於電阻式記憶體之研究
A Study of Solution-based Synthesis and Characterization of a MgO Film For RRAM Application
指導教授: 彭洞清
Perng, Dung-Ching
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2020
畢業學年度: 109
語文別: 中文
論文頁數: 65
中文關鍵詞: 氧化鎂電阻式記憶體溶液法
外文關鍵詞: magnasium oxide, resistive random access memory, Solution-based
相關次數: 點閱:177下載:0
分享至:
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報
  • 本實驗研究以溶液合成方法製備氧化鎂薄膜應用於非揮發性電阻式記憶體之研究。
    將硝酸鎂六水與乙醇合成之溶液旋轉塗佈在銦錫氧化物(ITO)基板接著爐管退火和沉積白金薄膜,白金與ITO薄膜被用作上、下電極,透過X光繞射光譜儀(XRD) 、原子力顯微鏡(AFM)和場發射掃描式電子顯微鏡(SEM)分析氧化鎂薄膜的晶體結構、表面形貌和粗糙度等等,元件的轉換特性藉由半導體元件參數分析儀分析。
    分析結果顯示Pt/MgO/ITO電阻式記憶體是具有Forming-free特性的元件,此記憶體具有良好的高低阻值比(104)和低寫入與抹除電壓(-0.5 V、0.5 V),在室溫下經過104次切換和5000 秒的資料持久度量測沒有明顯的退化,我們也發現使用單掃方式進行量測,元件的操作電壓(set/reset)分佈(或電壓變化量)和高低阻態的電阻變化量要比雙掃方式小很多。在分析元件的電流傳導機制,低阻態的的漏電流符合歐姆傳導機制,高阻態在小偏壓時是歐姆傳導,而隨著偏壓增大傳導機制轉為空間電荷限制電流主導。
    總而言之,本研究之氧化鎂薄膜具有製造簡單、低成本和穩定優越的元件切換特性,在電阻式記憶體應用上具有巨大的潛力

    This thesis studied a magnesium oxide(MgO)film prepared by solution-based synthesis method for non-volatile resistive-switching random access memory(RRAM)application.
    A Magnesium nitrate hexahydrate and ethanol synthesized solution was spin-coated on a Indium-Tin oxide(ITO)coated glass substrate followed by furnace annealing and Platinum(Pt) film deposition. The Pt and ITO films were used as upper and lower electrodes. X-ray diffraction spectrometer(XRD), atomic force microscope(AFM), and field emission scanning electron microscope(SEM)were used to analyze the MgO film’s crystal structure, surface roughness and morphology etc. The device’s switching characteristics was analyzed by a semiconductor element parameter analyzer.
    The test results show that this Pt/MgO/ITO RRAM is a forming-free device. It has a great high to low resistance ratio of more than 104, low writing and erasing voltages (-0.5 V, 0.5 V). No degradation was noticed after performing 104 room temperature switching and 5000 s data retention tests. We also found out that using single sweep method to perform testing, the device’s operating voltage (set/reset) distribution (or voltage variation) and its high/low state resistance variations are much smaller than that using double sweep method. When analyze the device’s current conduction mechanism, the leakage currents of its low resistance state obeys ohmic conduction, and its high resistance state at small bias is also ohmic conducting mode, as the bias increases, its mechanism changes to space charge limited current dominate.
    In short, the studied MgO film has a great potential for RRAM application for the advantages of its simple and low cost manufacturing, stable and superior switching performance.

    中文摘要 I 英文摘要 II 致謝 IV 目錄 V 圖目錄 VIII 表目錄 XI 1 第一章 緒論 1 1-1 記憶體簡介 1 1-1-1 磁阻式記憶體 3 1-1-2 相變化記憶體 4 1-1-3 鐵電記憶體 5 1-1-4 電阻式記憶體 6 1-2 研究動機 7 1-3 材料特性及介紹 8 1-3-1 氧化鎂(Magnasim Oxide)特性 8 1-3-2 鉑金屬(Pt)特性 8 1-3-3 銦錫氧化物(ITO)特性 9 2 第二章 基礎理論 10 2-1 元件基礎理論 10 2-2 傳導機制 11 2-2-1 電極限制傳導 12 2-2-2 本體限制傳導 17 3 第三章 實驗方法 24 3-1 實驗流程圖 24 3-2 製程設備系統 25 3-2-1 紫外光臭氧清洗機 25 3-2-2 旋轉塗佈機 26 3-2-3 方形高溫爐 27 3-2-4 直流濺鍍系統 28 3-3 薄膜分析及量測儀器 29 3-3-1 X光繞射光譜儀(XRD) 29 3-3-2 場發射掃描式電子顯微鏡(FE-SEM) 31 3-3-3 半導體元件參數分析儀 33 3-3-4 化學分析電子光譜儀(XPS) 34 3-3-5 原子力顯微鏡(AFM) 35 3-4 元件製作流程 36 3-4-1 溶液法 37 3-4-1-1實驗材料 37 3-4-2 ITO基板清洗 38 3-4-3 旋轉塗佈法(Spin coating)沉積氧化鎂薄膜 39 3-4-4 濺鍍(sputter)上電極 39 4 第四章 結果與討論 41 4-1 薄膜分析之結果與討論 41 4-1-1 XRD 薄膜晶相分析 41 4-1-2 SEM&AFM 薄膜剖面與表面分析 42 4-1-3 XPS 薄膜表面化學成分分析 44 4-2氧化鎂RRAM電性分析 46 4-2-1 氧化鎂RRAM之 I-V特性 46 4-2-2 氧化鎂RRAM之耐操度(Endurance) 49 4-2-3 氧化鎂RRAM之記憶保存力(Retention) 51 4-2-4氧化鎂RRAM之電壓累積概率分布圖 53 4-2-5氧化鎂RRAM之電流機制探討 54 4-3 氧化鎂RRAM之元件比較 58 5 第五章 結論 59 參考文獻 60

    [1] Jeong, Doo Seok, et al. "Emerging memories: resistive switching mechanisms and current status." Reports on progress in physics 75.7 (2012): 076502.
    [2] Hamamoto, Takeshi, Soichi Sugiura, and Shizuo Sawada. "On the retention time distribution of dynamic random access memory (DRAM)." IEEE Transactions on Electron devices 45.6 (1998): 1300-1309.
    [3] Geier, Michael L., et al. "Solution-processed carbon nanotube thin-film complementary static random access memory." Nature nanotechnology 10.11 (2015): 944.
    [4] Huai, Yiming. "Spin-transfer torque MRAM (STT-MRAM): Challenges and prospects." AAPPS bulletin 18.6 (2008): 33-40.
    [5] Lee, S. H., et al. "Highly productive PCRAM technology platform and full chip operation: Based on 4F 2 (84 nm pitch) cell scheme for 1 Gb and beyond." 2011 International Electron Devices Meeting. IEEE, 2011.
    [6] Mikolajick, Thomas, et al. "FeRAM technology for high density applications." Microelectronics Reliability 41.7 (2001): 947-950.
    [7] Waser, Rainer, et al. "Redox‐based resistive switching memories–nanoionic mechanisms, prospects, and challenges." Advanced materials 21.25-26 (2009): 2632-2663.
    [8] Nuns, Thierry, et al. "Evaluation of recent technologies of non-volatile RAM." 2007 9th European Conference on Radiation and Its Effects on Components and Systems. IEEE, 2007.
    [9] Hourdakis, E., & Nassiopoulou, A. G., “ High-density MIM capacitors with porous anodic alumina dielectric” IEEE Transactions on Electron Devices, 57(10), 2010, pp.2679-2683.
    [10] Prakash, A., Jana, D. & Maikap, S. TaO x -based resistive switching memories: prospective and challenges. Nanoscale Res Lett 8, 418 (2013).
    [11] Zhong, Chia-Wen, et al. "Effect of ITO electrode with different oxygen contents on the electrical characteristics of HfOx RRAM devices." Surface and Coatings Technology 231 (2013): 563-566.
    [12] Niu, Gang, et al. "Material insights of HfO 2-based integrated 1-transistor-1-resistor resistive random access memory devices processed by batch atomic layer deposition." Scientific reports 6 (2016): 28155.
    [13] Niu, Gang, et al. "Geometric conductive filament confinement by nanotips for resistive switching of HfO 2-RRAM devices with high performance." Scientific reports 6.1 (2016): 1-9.
    [14] Ku, Boncheol, et al. "Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors." Journal of Alloys and Compounds 735 (2018): 1181-1188.
    [15] Simanjuntak, Firman Mangasa, et al. "Status and prospects of ZnO-based resistive switching memory devices." Nanoscale research letters 11.1 (2016): 368.
    [16] Zhang, Lei, et al. "Resistive switching mechanism in the one diode-one resistor memory based on p+-Si/n-ZnO heterostructure revealed by in-situ TEM." Scientific reports 7 (2017): 45143.
    [17] Prakash, A., Jana, D. & Maikap, S. TaO x -based resistive switching memories: prospective and challenges. Nanoscale Res Lett 8, 418 (2013)
    [18] Lee, Myoung-Jae, et al. "A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta 2 O 5− x/TaO 2− x bilayer structures." Nature materials 10.8 (2011): 625-630.
    [19] Huang, C., Chou, T., Huang, J. et al. Self-Selecting Resistive Switching Scheme Using TiO2 Nanorod Arrays. Sci Rep 7, 2066 (2017).
    [20] Huang, Chi-Hsin, et al. "Self-Selecting Resistive Switching Scheme Using TiO 2 Nanorod Arrays." Scientific reports 7.1 (2017): 1-9.
    [21] Ma, G., Tang, X., Zhang, H. et al. Ultra-high ON/OFF ratio and multi-storage on NiO resistive switching device. J Mater Sci 52, 238–246 (2017).
    [22] Russo, Ugo, et al. "Filament conduction and reset mechanism in NiO-based resistive-switching memory (RRAM) devices." IEEE Transactions on Electron Devices 56.2 (2009): 186-192.
    [23] Silva, J., Faita, F., Kamakshi, K. et al. Enhanced resistive switching characteristics in Pt/BaTiO3/ITO structures through insertion of HfO2:Al2O3 (HAO) dielectric thin layer. Sci Rep 7, 46350 (2017).
    [24] Lee, W., Yoo, S., Yoon, K. et al. Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phases. Sci Rep 6, 20550 (2016).
    [25] Bhavsar, Komal H., and Utpal S. Joshi. "Influence of 120 MeV Au+ 9 ions irradiation on resistive switching properties of Cr: SrZrO3/SRO junctions." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 379 (2016): 95-101.
    [26] Kumbhare, P., and U. Ganguly. "Ionic Transport Barrier Tuning by Composition in Pr 1–x Ca x MnO 3-Based Selector-Less RRAM and Its Effect on Memory Performance." IEEE Transactions on Electron Devices 65.6 (2018): 2479-2484.
    [27] Cai, Yimao, et al. "A flexible organic resistance memory device for wearable biomedical applications." Nanotechnology 27.27 (2016): 275206.
    [28] Mao, Jing-Yu, et al. "A bio-inspired electronic synapse using solution processable organic small molecule." Journal of Materials Chemistry C 7.6 (2019): 1491-1501.
    [29] Miranda, Enrique, et al. "Effects of the electrical stress on the conduction characteristics of metal gate/MgO/InP stacks." Microelectronics Reliability 49.9-11 (2009): 1052-1055.
    [30] Brennan, B., S. McDonnell, and G. Hughes. "Photoemission studies of the interface formation of ultrathin MgO dielectric layers on the oxidised Si (111) surface." Journal of Physics: Conference Series. Vol. 100. No. 4. IOP Publishing, 2008.
    [31] Lin, Chih-Yang, et al. "Effects of varied negative stop voltages on current self-compliance in indium tin oxide resistance random access memory." IEEE Electron Device Letters 36.6 (2015): 564-566.
    [32] Hosoi, Y., et al. "High speed unipolar switching resistance RAM (RRAM) technology." 2006 International Electron Devices Meeting. IEEE, 2006.
    [33] Loy, Desmond Jia Jun, et al. "Conduction mechanisms on high retention annealed MgO-based resistive switching memory devices." Scientific reports 8.1 (2018): 1-9.
    [34] Wong, H-S. Philip, et al. "Metal–oxide RRAM." Proceedings of the IEEE 100.6 (2012): 1951-1970.
    [35] Luo, Qing, et al. "Demonstration of 3D vertical RRAM with ultra low-leakage, high-selectivity and self-compliance memory cells." 2015 IEEE International Electron Devices Meeting (IEDM). IEEE, 2015.
    [36] Huang, Hsin-Hung, Wen-Chieh Shih, and Chih-Huang Lai. "Nonpolar resistive switching in the Pt/MgO/Pt nonvolatile memory device." Applied Physics Letters 96.19 (2010): 193505.
    [37] Cheng, C. H., Chin, A., & Yeh, F. S., “Novel ultra-low power RRAM with good endurance and retention” In 2010 Symposium on VLSI Technology IEEE, 2010, pp. 85-86.
    [38] Wang, S. Y., Lee, D. Y., Huang, T. Y., Wu, J. W., & Tseng, T. Y., “Controllable oxygen vacancies to enhance resistive switching performance in a ZrO2-based RRAM with embedded Mo layer” Nanotechnology, 21(49), 2010.
    [39] Park, J., Jo, M., Lee, J., Jung, S., Kim, S., Lee, W., “ Improved switching uniformity and speed in filament-type RRAM using lightning rod effect” IEEE Electron Device Letters, 32(1), 2010, pp.63-65.
    [40] Sawa, Akihito. "Resistive switching in transition metal oxides." Materials today 11.6 (2008): 28-36.
    [41] Chiu, Fu-Chien. "A review on conduction mechanisms in dielectric films." Advances in Materials Science and Engineering 2014 (2014).
    [42] Kim, Soo Young, et al. "Effect of ultraviolet–ozone treatment of indium–tin–oxide on electrical properties of organic light emitting diodes." Journal of Applied physics 95.5 (2004): 2560-2563.
    [43] Stan, Camelia V., et al. "X-ray diffraction under extreme conditions at the Advanced Light Source." Quantum Beam Science 2.1 (2018): 4.
    [44]羅聖全.研發奈米科技的基本工具之一-電子顯微鏡介紹-SEM.材料世界網. (2008)
    [45] Peng, X. D., and M. A. Barteau. "Characterization of oxide layers on Mg (0001) and comparison of H2O adsorption on surface and bulk oxides." Surface Science 233.3 (1990): 283-292.
    [46] Zhang, Ting, et al. "Conduction mechanism of resistance switching in fully transparent MgO-based memory devices." Journal of Applied Physics 114.13 (2013): 134301.
    [47] Wu, Shiwei, et al. "Dissolvable and biodegradable resistive switching memory based on magnesium oxide." IEEE Electron Device Letters 37.8 (2016): 990-993.
    [48] Chiu, Fu-Chien, Wen-Chieh Shih, and Jun-Jea Feng. "Conduction mechanism of resistive switching films in MgO memory devices." Journal of Applied Physics 111.9 (2012): 094104.
    [49] Song, Fang, et al. "Solution-processed physically transient resistive memory based on magnesium oxide." IEEE Electron Device Letters 40.2 (2018): 193-195.

    無法下載圖示 校內:2025-10-01公開
    校外:不公開
    電子論文尚未授權公開,紙本請查館藏目錄
    QR CODE