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研究生: 黃耑翔
Huang, Tuan-Hsiang
論文名稱: 利⽤多重尺度電漿⼦結構提升光熱效應
Enhancement of photothermal effect by using multi-scale plasmonic structure
指導教授: 張晉愷
Chang, Chin-Kai
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2023
畢業學年度: 111
語文別: 中文
論文頁數: 139
中文關鍵詞: 多重尺度微奈米結構氮化鈦局部表面電漿共振光熱效應半導體相關製程
外文關鍵詞: multi-scale micro-nano structures, titanium nitride, local surface plasmon resonance, photo-thermal conversion, semiconductor-related processes
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  • 透過局部表面電漿共振所激發的光熱效應在光熱領域近年來因為其巨大的發展潛力受到許多關注與研究。未來若是可以利用更有效率的光熱轉換應用於太陽能轉換上的相關應用上,在能源短缺的未來絕對是有相當的前瞻性。但目前對於較寬頻的光源光熱轉換上的效率和大面積製造電漿子結構仍然是一個巨大的挑戰需要克服。在本研究中將提出一個具有多重尺度的電漿子奈米結構作為光熱基板,在此基板中利用許多半導體相關的微奈米製程技術,像是黃光微影、乾蝕刻、金屬輔助化學蝕刻等,將微米等級與奈米等級的結構進行結合。最後將氮化鈦濺鍍在這個多尺度結構上作為光輻射和熱能產生之間的介質。以上描述得多尺度的金屬奈米結構將在產生光熱效應中發揮關鍵作用。這種光熱效應特性可以通過局部表面電漿共振來增強使更多輻射能量轉變成熱能。改變不同的微米與奈米結構形貌來研究其光熱效應。在微米結構上設計了兩種側壁類型,分別是錐形(taper)與垂直(vertical)側壁,而在奈米結構上則是透過不同的金屬輔助化學蝕刻深度製作出多孔材質(porous texture)與凹槽(trench)型態。本研究所製作出的光熱基板最後也透過光譜儀與熱像儀量測其光學的反射率與熱量的溫度表現。從實驗量測結果可以得知具有多重尺度的電漿子結構具有較低的光學反射率和明顯的升溫表現。由此可知本研究的光熱基板確實有因為多重尺度的結構使光熱效應增加。特別是錐形側壁類型的微米結構搭配凹槽型態的奈米結構下的光熱基板從反射率與熱像儀看出有最佳的光熱效應。和氮化鈦薄膜相比,多重尺度電漿子結構的升溫表現是氮化鈦薄膜的3.6倍。因此未來可以透過改變微米與奈米結構以此找出最佳的設計,使光熱基板在寬頻光譜下具有高效率的光熱轉換。

    Photothermal effect of material has attracted plenty of attention because of its versatile application. For example, solar energy can be well converted to the generation of heat for seawater desalination by excellent photothermal effect. However, the conversion efficiency is still a challenge for the broadband light source. In this study, the multi-scale plasmonic structures were proposed as a photothermal substrate, which integrated the microstructure with the nanostructure. The microstructure and nanostructure were obtained by Litho-etching and metal-assisted chemical etching technologies, respectively. The titanium nitride was deposited on this multi-scale structure as the mediator between the irradiation and generation of heat. The metallic nanostructure on the multi-scale structure will play a crucial role in generating thermoplasmonic effect. This thermoplasmonic property can be enhanced by the local surface plasmon resonance. Moreover, the type (vertical or taper shapes) of microstructure and morphology (porous texture or trench) of nanostructure also were altered to investigate the photothermal effect. The multi-scale plasmonic structures experimentally demonstrated that lower optical reflection can be converted to high photothermal efficiency as comparing the titanium nitride film. These engineering multi-scale structures appear a remarkable potential for use as a non-classical photothermal device.

    摘要 I Abstract II 致謝 XIII 目錄 XIV 圖目錄 XVI 表目錄 XX 第一章 緒論 1 1.1 研究背景 1 1.2 研究動機 4 第二章 文獻回顧 8 2.1 表面電漿共振原理介紹 8 2.1.1 表面電漿波 8 2.1.2 局部表面電漿共振 10 2.2 電漿子的熱傳 11 2.2.1 奈米光熱材料的選擇 11 2.2.2 消光、散射、吸收截面與溫度分布之關係 14 2.3 金屬奈米結構之不同材料與型態 17 2.3.1 奈米粒子流體 17 2.3.2 奈米棒 20 2.3.3 奈米籠 22 2.4 氮化鈦奈米結構之光熱效應與應用 25 2.4.1 奈米圓盤 25 2.4.2 奈米管與奈米溝槽 28 第三章 微奈米結構備製 32 3.1 設計理念與架構 32 3.2 實驗與測量儀器設備介紹 35 3.2.1 旋轉塗佈儀 35 3.2.2 SUSS雙面光罩對準機(曝光機) 36 3.2.3 電子束蒸鍍機 38 3.2.4 管型高溫真空爐40 3.2.5 感應耦合離子電漿蝕刻系統 41 3.2.6 高真空多功能磁控濺鍍系統 43 3.2.7 表面粗度儀 45 3.2.8 雙束型聚焦離子束 47 3.3 製程技術回顧 50 3.3.1 感應耦合離子電漿蝕刻 50 3.3.2 退火控制球型金屬奈米粒子形貌 56 3.3.3 金屬輔助化學蝕刻 59 3.4 矽基板前置清潔作業 65 3.5 微米結構製程 66 3.5.1 黃光微影 67 3.5.2 剝離成形 76 3.5.3 乾蝕刻 79 3.6 奈米結構製程 92 3.6.1 奈米粒子備製 92 3.6.2 濕蝕刻 95 3.7 金屬奈米結構製程 104 3.7.1 濺鍍氮化鈦薄膜 104 第四章 光熱量測 107 4.1 量測設備簡介與設置 107 4.1.1 倒置顯微鏡 107 4.1.2 光譜儀 108 4.1.3 熱像儀 111 4.2 結果與討論 112 4.2.1 光譜儀反射率 112 4.2.2 熱像儀溫度 124 第五章 結論與未來展望 134 第六章 參考文獻 136

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