奈米科技(nano technology)，是一九九零年才逐漸為人所知的科技領域。奈米科技是研究尺寸在0.1-100nm 間。而陽極氧化鋁(anodic aluminum oxide ; AAO)的結構因為可以產生大面積規則性的孔洞所以最近幾年來被大量研究，它經由電化學之陽極處理後，可產生具有高密度之多孔性金屬氧化物－氧化鋁，它具有奈米尺寸(nano scale)，並在奈米領域上有廣泛的應用，而且可以經由成本便宜的電化學處理方法產生大範圍並且一致的孔洞結構。陽極氧化鋁的處理技術是將高純度鋁箔(aluminum foil)與適當的電解液和幾乎不發生化學反應的陰極金屬搭配形成電化學電池，在特定的條件下其電化學反應會在鋁箔表面生成氧化鋁(alumina)，此類的氧化鋁處理技術及其性質在過去數十年就已被研究探討並應用於工業上，其特色為孔洞大小尺寸單一、孔洞均一分佈，且孔洞分佈密度和大小可以經由調整製備參數而加以控制。但對於孔洞陣列之排列確有卻不同方法加以控制，而本實驗主要是結合非等向性蝕刻製作尖錐陣列壓印在鋁箔上並實施陽極處理；以探討控制奈米孔洞之可行性。

　　Nanotechnology represents one of the most novel frontiers in today’s science and engineering research. With increasing interest in the fabrication of nanometer-sized structures applied in optical, electronic, magnetic, and optoelectronic devices. Anodic porous alumina, which has been studied in detail in recent years . Thus AAO has been commonly used to fabricate nanometer-sized structures via the template mediated process because of its relatively low cost and ease of fabrication compared with conventional lithography processed materials. In fundamental studies of anodic alumina oxide, we use high pure aluminum and then put this treated aluminum sample into a particular electrolyte to grow desired oxide under suitable conditions. After that , we can get patterns with uniform pore size . By adjusting process parameter , we can control our AAO patterns such as the pore size and the density of pores . But we have different methods to control pore Arrays. This experiment is mainly combine silicon mold by anisotropic etching of silicon and imprint onto aluminum foil .we will discuss the anodic process after imprinting that whether could control array of nano-pore.

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