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研究生: 林嘉峻
Lin, Chia-Chun
論文名稱: 以CuInSe2奈米柱製備核殼結構二極體特性之研究
Study of Core-Shell Diode Characteristic with CuInSe2 Nanowire
指導教授: 洪茂峰
Houng, Mau-Phon
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2016
畢業學年度: 104
語文別: 中文
論文頁數: 91
中文關鍵詞: 銅銦硒奈米柱氧化銦錫核殼結構
外文關鍵詞: CuInSe2, PEDOT, core-shell
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  • 本研究致力於製備一維單晶二硒化銅銦奈米柱陣列並搭配有機導電漿料PEDOT形成核殼結構,應用於太陽能電池元件的吸收層,和以往平面結構的吸收層相比,奈米柱擁有更加突出的光電特性,期望可以有效提升元件整體的光電轉換效率。
    本研究的成果如下,首先是銅銦硒奈米柱透過後續模板移除得到完整奈米柱,並疊上有機導電漿料。最後由電性量測得到,疊上導電漿料與未疊上漿料的結構相比,呈現更好的二極體特性,得到Io=36.9 nA。再來是將奈米柱結構做退火處理來改善結晶品質,由XRD量測得到CIS(112)之FWHM為0.425,晶粒大小為19.3nm,得到24.25:24.45: 51.30劑量比,而電性量測得到Io=49.1nA。吾人以氧化銦錫取代有機漿料,與BYK混合後,氧化銦錫與奈米柱之間的接觸角由原本的79.22度降低至10.11度,消除原本疏水性太過強烈的問題,亦有蕭特基二極體之特性。

    CuInSe2 nanowire photovoltaic has been the subject of research with a view to enhancing the photo absorption efficiency and reducing the material consumption compared with bulk and thin-film PV. However, its surface recombination is a problem. Therefore, we use the core-shell structure to solve the problem. In this study, we employ the annealing process and tune the temperature to improve the crystallization of CIS nanowire. In I-V measurement, we obtained leakage current Io near 49.1nA. Then, we fabricated core-shell structure with PEDOT/CIS material to reduce the defects near the surface of nanowire. In I-V measurement, we obtained leakage current Io near 36.9nA.

    摘要 i Abstract ii 致謝 vii 目錄 ix 表目錄 xii 圖目錄 xiii 第一章 緒論 1 1-1 前言 1 1-2 太陽能電池介紹 2 1-2-1 二硒化銅銦太陽能電池發展背景 5 1-2-2 二硒化銅銦太陽能電池介紹 6 1-3 陣列式奈米柱 8 1-3-1 奈米結構介紹 8 1-3-2 氧化鋁模板介紹 9 1-3-3 氧化鋁模板製備過程簡介 10 1-3-4 化合物材料填孔成柱系統介紹 11 1-3-5 CuInSe2奈米柱太陽能電池 12 1-4 研究動機 15 第二章 理論基礎 16 2-1 陽極氧化鋁介紹 16 2-1-1 陽極氧化鋁模板簡介 16 2-1-2 陽極氧化鋁結構介紹 17 2-1-3 陽極氧化反應介紹 20 2-1-4 模板孔洞形成介紹 21 2-1-5 模板二次陽極氧化法介紹 23 2-2 二硒化銅銦材料 24 2-2-1 二硒化銅銦材料特性介紹 24 2-2-2 二硒化銅銦材料組成 26 2-2-3 二硒化銅銦材料製備方式介紹 28 2-3 電化學沉積介紹 30 2-3-1 電化學沉積反應及系統介紹 30 2-3-2 沉積晶體之結晶成長過程介紹 33 2-3-3 影響電鍍主要因素介紹 34 2-4 接面介紹 35 2-4-1 PN接面介紹 35 2-4-2 PN接面-熱平衡狀態(thermal equivalent situation) 37 2-4-3 PN接面I-V特性 38 2-4-4 PN接面-光生伏打效應 39 2-4-5 金屬-半導體接觸介紹 39 2-4-6 蕭特基能障形成 40 2-4-7 歐姆接觸介紹 41 2-4-8 金屬和半導體接面的電流傳導機制 42 第三章 實驗方法與量測儀器介紹 46 3-1 實驗流程 46 3-1-1 實驗流程圖 46 3-1-2 實驗步驟介紹 48 3-2 實驗藥品及參數介紹 51 3-2-1 實驗藥品及供應商介紹 51 3-2-2 實驗參數介紹 53 3-3 量測儀器介紹 55 3-3-1 X光繞射儀(X-Ray Diffractometer; XRD) 55 3-3-2 場發射掃描式電子顯微鏡(Field Emission-Scanning Electron Microscope, FE-SEM) 56 3-3-3 能量分析光譜儀(Energy Dispersive Spectrometer ; EDX) 57 第四章 結果與討論 59 4-1 As-deposited CuInSe2 Nanowire 59 4-1-1 Duty cycle調變探討 59 4-1-2 電化學沉積溫度調變 62 4-1-3 蝕刻環境溫度調變 65 4-1-4 電性量測 67 4-1-5 晶相探討 68 4-2 Annealed CuInSe2 Nanowire 69 4-2-1 退火壓力調變 69 4-2-2 第二階段退火溫度調變 70 4-2-3 電性量測 73 4-2-4 晶相探討 76 4-3 核殼結構(core-shell structure) 78 4-3-1 漿料調變 78 4-3-2 電性量測 81 4-3-3 接觸界面量測 82 第五章 結論 84 第六章 未來工作 86 參考文獻 87

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