本研究之目的在於開發出新型節能玻璃，它在可見光具備高穿透率，但在紅外光具備高反射率，方法是改變在玻璃上之金屬微結構的尺寸大小，以達到波長選擇性的效果。玻璃上結構的形貌與嘗試用的金屬各挑選三種進行3 × 3的搭配，結構形貌分別為矩形金屬塊、金屬薄膜內有矩形空洞及金屬薄膜內有矩形玻璃塊，而金屬則是金、銀和鋁，這些結構均以直角方式排列於玻璃上。金屬二維結構的週期、填充比及厚度是藉由微基因演算法結合嚴格耦合波理論作最佳化，成功找出在波長範圍為0.3 – 2.5 μm正向及斜向入射下，皆具備節能玻璃效果的結構。
　　設計完成後，本研究嘗試以微奈米製程技術製作樣本，首先利用電子束微影技術及感應耦合電漿做出矽模仁，之後以奈米壓印將矽模仁上的鉻圖案轉印在塗佈光阻及蒸鍍好銀之玻璃上做遮罩，最後進行氧電漿蝕刻光阻和泡入銀蝕刻液，形成二維週期陣列的銀矩形金屬塊。結果顯示，矽模仁轉印至玻璃基板的成功率可達到59.4 %，且皆符合設計尺寸，而氧電漿蝕刻完光阻後，結構的線寬與設計尺寸的相對誤差為9.06 %。

The purpose of this work is to develop a new energy-saving glass with high transmittance in the visible light, but with high light reflectance in the infrared. In order to achieve wavelength selection, the method is to change the size of the metal micro/nanostructure on the glass. In this work, different structures situations and metals were attempted. Structures included an array of rectangular pillars, a metallic fishnet, and a metallic fishnet filled with glass. Gold, silver, and aluminum were selected for testing. The micro-genetic algorithm was employed to optimize the period, filling ratio, and thickness of two-dimensional metal structures. The objective function is defined based on radiative properties at the normal incidence of wavelength range from 0.3 up to 2.5 μm. The obtained energy-saving glass performed well not only at normal incidence but also at oblique incidence.
Next, the micro-nanometer process technology was tried to use in order to fabricate structures which match optimal results. At first, the silicon molds were fabricated by the electron beam lithography and inductively coupled plasma etching system. Afterwards, contact-transferred and mask-embedded lithography utilized to transfer designed structures from the mold to the top of glass. The detailed transfer process was in the following. First, a chromium layer was evaporated as the metal transfer layer on silicon molds by electron beam evaporator. And then the chromium layer was transfer on the glass substrate which has been deposited the silver layer and coated photoresist. Afterwards, the photoresist was etched by oxygen plasma and dip the sample into the silver etchant. Hence, a two-dimensional periodic array of silver rectangles metal block is formed.
The experimental result showed the rate of the transferred chromium layer from the silicon mold to the glass substrate can be 59.4 %. The period and linewidth of structure both meet design dimensions. After oxygen plasma etching is completed, the period is the same with the design. The absolute error of the linewidth compared with design is about 58 nm , but the relative error of what is only 9.06 %.

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