本論文中將介紹以低成本且簡單快速的方式製作奈米的結構。利用黃光微影方式製程定義出光阻圖案，並藉由熱應力效應，在基板加熱降溫過程中，使光阻產生局部性的龜裂現象，此龜裂產生的裂縫可達奈米尺度。
利用奈米裂縫微影製程，我們成功做出奈米線、奈米虛線以及奈米溝槽等奈米結構。實驗中發現到氧電漿處理參數是主要影響奈米結構尺度的重要關鍵，而以本製程的奈米金屬線平均線寬可達100nm，目前最小可達50nm，長度約為15μm。在實驗結果發現，對於光阻的幾何圖形與厚度以及熱應力的變化均會影響製程上的良率。此外，以20nm厚度的奈米銀線經過600°C熱退火處理30分鐘後，可使奈米線結構形成奈米虛線的結構，其顆粒徑長約100~150nm，顆粒間間隔達100~200nm。另外我們利用濕蝕刻方式在SiO2/Si基板上蝕刻出了約700nm寬的奈米溝槽結構，而寬度主要受氧電漿蝕刻與濕蝕刻所引起的側蝕所影響。
我們成功的以奈米裂縫微影的方式製作出奈米線、奈米虛線、奈米溝槽等結構，而對於奈米的結構與元件的結合將來可應用在奈米光學與生醫光電上並做進一步的研究。

In this dissertation, nanofabrication using Nano-Crack Lithography was systematically investigated. Fast and cost-effective fabrication of sub-micron nanowire can be achieved by Nano-Crack Lithography, which only requires conventional photolithography processes. Lithographic-patterned photo-resist was subsequently immersed into liquid nitrogen and the patterns crack under the enormous stress due to the temperature difference. These cracks are very narrow, usually nanometers in width, but the length can extend to several microns depending on the photo-resist pattern. Subsequent oxygen plasma treatment, metal deposition and lift-off, 15 m-long metallic nanowires with width smaller than 100 nm were successfully fabricated. Several experimental parameters such as the geometry sizes and the thickness of the photo-resist patterns, the temperature difference were also systematically studied to understand their effects on the nanowire fabrication yields.
In addition, fabrication of nano-dot-lines and nano-trenches are also developed using Nano-Crack Lithography. Ag nano-dot-lines were fabricated by annealing the Ag nanowires to 600°C for 30 mins. Ag nanoparticles with diameters of ~100 nm were linearly aligned with inter-particle distance of ~100 nm. Silicon oxide nano-trenches were fabricated by performing the oxide etches immediately after the cracking of the photo-resist. Nano-trenches with width of 700 nm was obtain by wet silicon oxide etches.
In conclusion, fabrication of one-dimensional nanostructures, such as nanowires, nano-dot-lines, and nano-trenches were demonstrated using Nano-Crack Lithography. By combining these nanofabrication processes, new nanostructures with novel applications can be achieved. Future development of this Nano-Crack Lithography should find important applications in fields of Nanophotonics and Biophotonics.

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