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研究生: 林嘉文
Lin, Chia-Wen
論文名稱: 準分子雷射運用於多晶鑽石膜平坦化之理論建立及實驗驗證
Theoretical Analysis and Experiments for the Planarization of Polycrystalline Diamond Film by Eximer Laser
指導教授: 林仁輝
Lin, Jen-Fin
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2004
畢業學年度: 92
語文別: 中文
論文頁數: 176
中文關鍵詞: 準分子雷射鑽石膜平坦化
外文關鍵詞: diamond film, eximer laser, planarization
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  •   本論文主要是利用KrF準分子雷射對CVD鑽石膜作平坦化加工。有鑑於大部分文獻中,都偏向於實驗結果,因此在本文中建構了雷射燒蝕鑽石膜的加工機制,分為石墨化過程(graphitization process)及燒蝕過程(ablation process)兩個部分,建立其理論模型並以實驗加以驗證。
      理論部分中,首先,推導出鑽石膜受到雷射照射後的溫度分佈模型,並由表面最高溫度判斷要達到加工現象的雷射臨界能量密度約為1.9 ,而經實驗後得到此值約為1.7 。接著,將臨界能量密度帶入移除率模型,預測出不同能量密度下的移除率。再來,提出適當模型來描述孵化效應的現象,利用實驗求出此實驗的鑽石膜其孵化係數約為0.0242,並得到雷射能量密度與達到燒蝕現象所需要的雷射發數之間的關係。最後,將鑽石膜受到雷射照射後的縱深溫度分佈帶入石墨化模型中,並求得殘留石墨化厚度,其值約在39~62 nm。
      實驗部分則包括雷射平坦化實驗及奈米刮痕磨耗試驗兩項,其中在雷射平坦化實驗中還可分為定點照射及掃描照射兩項,由其實驗結果可得到移除率,其值與理論值相當吻合。另外,還可得到其表面粗糙度變化,在雷射能量密度較大時,雷射會破壞其表面的平整性,而在能量密度較小時,其粗糙度改善效果較好,且掃描照射的結果比起定點照射較適合做為表面粗糙度改善的方法。而在奈米刮痕磨耗試驗中,利用探針刮除加工後鑽石膜表面上的石墨結構,尤其表面形貌的變化來得到殘留石墨層厚度的實驗值,其值與理論值相當接近,藉此印證理論模型的正確性。

      The polishing by KrF eximer laser for CVD diamond film is researched in the study. Most studies about this topic are the experimental results, so the mechanism of polishing which includes the two parts of graphitization and ablation process is established and confirmed by the experimental results in this study.
      For the mechanism, the temperature distribution of the diamond film after beamed by laser is derived first, and the critical laser fluence of laser is predicted as 1.9J/cm2 theoretically (and the experimental result is 1.7 J/cm2) according to the highest temperature on the surface. Then, the removing rates under different laser fluence can be predicted after substituting the above critical value. Furthermore, substituting the incubation parameter of the diamond film (about 0.0242 obtained by experiments) into the incubation effect model, we can get the relation between the laser fluence and the number of laser pulses required to ablation. Finally, after substituting the temperature filed by laser beamed into the model of graphitization, the thickness of graphitization can be determined in the range of 39~62nm.
      For the experiments, there are two parts of polishing and nanoscratch test. The polishing test includes the point and scanning beamed and the removing rates measured experimentally and predicted theoretically are quite close. The change in the surface roughness is observed. The greater laser fluence will damage the surface so the better roughness can be obtained in the case of small laser fluence; and the scanning beamed is more suitable for improvement of roughness. The scratch test is used to obtain the thickness of the residual graphite layer. The values of residual graphite layer thickness is close to those predicted theoretically and the good agreement in the residual graphite layer thickness confirmed the validity of the present model.

    摘 要 I 英文摘要 III 誌 謝 V 目 錄 VI 表 目 錄 X 圖 目 錄 XI 符 號 表 XVII 第一章 緒論 1 1-1 前言 1 1-2 文獻回顧 3 1-3 研究目的 9 第二章 基本理論 18 2-1 鑽石膜的構造與鍍製 18 2-1-1 鑽石膜結構 18 2-1-2 鑽石膜鍍製原理 20 2-2 KrF準分子雷射簡介 22 2-2-1 雷射的發生機制 22 2-2-2 準分子雷射的特性及原理 24 2-3 材料吸收雷射光能量理論 28 2-3-1 準分子雷射與鑽石膜的交互作用 28 2-3-2 孵化效應理論及模型 36 2-4 雷射照射下材料表面溫升模型建立 39 2-4-1 移動體熱源導致材料表面溫度上升的理論建立 42 2-4-2 靜止體熱源導致材料表面溫度上升的理論建立 51 2-4-3 熱對流及熱輻射所造成的影響 52 2-5 KrF準分子雷射移除鑽石膜模型建立 54 2-5-1 鑽石膜平坦化機制 54 2-5-2 鑽石膜石墨化理論模型建立 55 2-5-3 雷射燒蝕鑽石膜移除率模型建立 61 第三章 實驗規劃 80 3-1 鑽石膜前處理檢測 80 3-1-1 X光繞射分析(X-ray diffraction , XRD) 81 3-1-2 拉曼光譜分析(Raman spectroscopy) 82 3-1-3 掃描式電子顯微鏡(SEM) 82 3-1-4 三維表面形貌量測儀(3D stylus profilometry) 83 3-2 KrF準分子雷射平坦化鑽石膜實驗 84 3-2-1 實驗目的 84 3-2-2 實驗設備介紹 84 3-2-3 實驗規劃及參數 85 3-3 奈米刮痕磨耗實驗 87 3-3-1 實驗目的 87 3-3-2 實驗設備介紹 87 3-3-3 實驗規劃及參數 88 第四章 結果與討論 99 4-1 前處理檢測分析結果 99 4-1-1 XRD分析結果 99 4-1-2 Raman Spectroscopy分析結果 99 4-1-3 SEM分析 100 4-1-4 3D Stylus Profilometry量測 101 4-2 準分子雷射照射鑽石膜造成的溫升模型計算結果 102 4-2-1 脈衝雷射定點燒蝕溫度計算結果 103 4-2-2 脈衝雷射掃描燒蝕溫度計算結果 105 4-2-3 鑽石膜表面內部縱向溫度分佈 106 4-3 雷射燒蝕鑽石膜移除率模型計算及實驗驗證 107 4-4 鑽石膜經準分子雷射平坦化後的粗糙度變化 109 4-4-1 鑽石膜經準分子雷射定點照射後的粗糙度變化 110 4-4-2 鑽石膜經準分子雷射掃描照射後的粗糙度變化 112 4-5 孵化效應模型計算及實驗驗證 112 4-6 雷射照射下鑽石膜石墨化厚度理論計算 114 4-7 鑽石膜殘留石墨層厚度預測及實驗驗證 116 第五章 結論與未來研究方向 167 5-1 結論 167 5-2 未來研究方向 169 參考文獻 170 自 述 176

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