| 研究生: |
林嘉文 Lin, Chia-Wen |
|---|---|
| 論文名稱: |
準分子雷射運用於多晶鑽石膜平坦化之理論建立及實驗驗證 Theoretical Analysis and Experiments for the Planarization of Polycrystalline Diamond Film by Eximer Laser |
| 指導教授: |
林仁輝
Lin, Jen-Fin |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2004 |
| 畢業學年度: | 92 |
| 語文別: | 中文 |
| 論文頁數: | 176 |
| 中文關鍵詞: | 準分子雷射 、鑽石膜 、平坦化 |
| 外文關鍵詞: | diamond film, eximer laser, planarization |
| 相關次數: | 點閱:80 下載:3 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本論文主要是利用KrF準分子雷射對CVD鑽石膜作平坦化加工。有鑑於大部分文獻中,都偏向於實驗結果,因此在本文中建構了雷射燒蝕鑽石膜的加工機制,分為石墨化過程(graphitization process)及燒蝕過程(ablation process)兩個部分,建立其理論模型並以實驗加以驗證。
理論部分中,首先,推導出鑽石膜受到雷射照射後的溫度分佈模型,並由表面最高溫度判斷要達到加工現象的雷射臨界能量密度約為1.9 ,而經實驗後得到此值約為1.7 。接著,將臨界能量密度帶入移除率模型,預測出不同能量密度下的移除率。再來,提出適當模型來描述孵化效應的現象,利用實驗求出此實驗的鑽石膜其孵化係數約為0.0242,並得到雷射能量密度與達到燒蝕現象所需要的雷射發數之間的關係。最後,將鑽石膜受到雷射照射後的縱深溫度分佈帶入石墨化模型中,並求得殘留石墨化厚度,其值約在39~62 nm。
實驗部分則包括雷射平坦化實驗及奈米刮痕磨耗試驗兩項,其中在雷射平坦化實驗中還可分為定點照射及掃描照射兩項,由其實驗結果可得到移除率,其值與理論值相當吻合。另外,還可得到其表面粗糙度變化,在雷射能量密度較大時,雷射會破壞其表面的平整性,而在能量密度較小時,其粗糙度改善效果較好,且掃描照射的結果比起定點照射較適合做為表面粗糙度改善的方法。而在奈米刮痕磨耗試驗中,利用探針刮除加工後鑽石膜表面上的石墨結構,尤其表面形貌的變化來得到殘留石墨層厚度的實驗值,其值與理論值相當接近,藉此印證理論模型的正確性。
The polishing by KrF eximer laser for CVD diamond film is researched in the study. Most studies about this topic are the experimental results, so the mechanism of polishing which includes the two parts of graphitization and ablation process is established and confirmed by the experimental results in this study.
For the mechanism, the temperature distribution of the diamond film after beamed by laser is derived first, and the critical laser fluence of laser is predicted as 1.9J/cm2 theoretically (and the experimental result is 1.7 J/cm2) according to the highest temperature on the surface. Then, the removing rates under different laser fluence can be predicted after substituting the above critical value. Furthermore, substituting the incubation parameter of the diamond film (about 0.0242 obtained by experiments) into the incubation effect model, we can get the relation between the laser fluence and the number of laser pulses required to ablation. Finally, after substituting the temperature filed by laser beamed into the model of graphitization, the thickness of graphitization can be determined in the range of 39~62nm.
For the experiments, there are two parts of polishing and nanoscratch test. The polishing test includes the point and scanning beamed and the removing rates measured experimentally and predicted theoretically are quite close. The change in the surface roughness is observed. The greater laser fluence will damage the surface so the better roughness can be obtained in the case of small laser fluence; and the scanning beamed is more suitable for improvement of roughness. The scratch test is used to obtain the thickness of the residual graphite layer. The values of residual graphite layer thickness is close to those predicted theoretically and the good agreement in the residual graphite layer thickness confirmed the validity of the present model.
1.宋健民, 鑽石合成, 全華科技圖書股份有限公司, 民國89年.
2.H.O. Pierson, Handbook of Carbon, Graphite, Diamond and Fullerenes: properties, processing and application, Noyes Publications, New Jersey, 1993.
3.張瑞發,化工資訊, Vol. 4, pp.68 (1993).
4.J. Wilks, E. Wilks, Properties and Applications of Diamond,Butterworth- Heinemann , Boston, 1991.
5.A.P. Malshe, B.S. Park, W.D. Brown, H.A. Naseem, “A review of techniques for polishing and planarization chemically vapor-deposited (CVD)diamond films and substrates”, Diamond Relat. Mater., Vol.8 pp.1198-1213 (1998).
6.B. Bhushan, V. V. Subramanian, B. K. Gupta, “Polishing of Diamond Films”, Diamond Films And Technol., Vol.4, No.2, pp.71-96 (1994).
7.E. Bruton, Diamond Technology, NAG, London, 1953.
8.P. Grodzinski, Diamond Technology, NAG, London, 1953.
9.M. Yoshikawa, “Development and performance of a diamond-film polishing apparatus with hot metals”, Diamond Optics III, SPIE 1325, pp.210-221 (1990).
10.G. S. Raju, Chemical assisted mechanical polishing and planarization of CVD diamond substrates for MCM application, M.S.E.E. Thesis, University of Arkansas Library Fayetterille, AR, 1994.
11.C. Vivensang, L. Ferlazzo-Manin, M.F. Raret, G, Turban, F. Rousseaux,
A. Gicqnel, “Surface smoothing of diamond membranes by reactive ion etching process”, Diamond Relat. Mater., Vol.5, pp.840-844 (1996).
12.H. Funamoto, O. Koseki, “Planning of synthetic diamond film by the Penning discharge microsputtering method”, Surface Coat. Technol., Vol.47, pp.474-480 (1991).
13.G. S. Sandu, W. K. Chu, “Reactive ion etching of diamond”, Appl. Phys. Lett., Vol.55, No.5, pp.437-438 (1989).
14.M. Harish, D. M. Bothel, “Polishing of CVD diamond films with abrasive liquidjets : an exploratoryinvestigation”, Diamond Optics V, SPIE 1759, pp.97-105 (1992).
15.Z. Feng, Y. Tzeng, J. E. Field, “Solid particle impact of CVD diamond films”, Thin Solid Films, Vol.212, pp.35-42 (1992).
16.M. Rothschild, C. Arnone, D. J. Ehrlich, “Eximer-laser etching of diamond and hard carbon films by direct writing and optical projection”, J. Vac. Sci. Technol., Vol.B4, No.1, pp.310-314 (1986).
17.V. P. Ageev, L. L. Bouilov, V. I. Konov, A. V. Kuzmichov, S. M. Pimenov, A. M. Prokhorov, V. G. Ralchenko, B. V. Spitsyn, N. I. Chapliev, Soviet Physics-Doklady, Vol.33, pp.840 (1988).
18.A. Blatter, U. Bogli, L. L. Builov, N. I. Chapliev, V. I. Konov, S. M. Pimenov, B. V. Spitsyn, Proc. Electrochem. Soc., Vol.91, No.8, pp.357 (1991).
19.U. Bogli, A. Blatter, S. M. Pimenov, A. A. Smolin, V. I. Konov, “Smothening of diamond films with an ArF laser”, Diamond Relat. Mater., Vol.1, pp.782-788 (1992).
20.S. M. Pimenov, A. A. Smolin, V. G. Ralchenko, V. I. Konov, S. V. Likhanski, I. A. Veselovski, G. A. Sokolina, S. V. Bantsekov, B. V. Spitsyn, “UV laser processing of diamond films:effect of irradiation condition on the properties of laser-treated diamond film surfaces”, Diamond Relat. Mater., Vol.2, No.2, pp.291-297 (1993).
21.V. P. Ageev, V. Y. Armeyev, N. I. Chapliev, A. V. Kuzmichor, S. M. Pimenov, V. G. Ralchenko, Mater. Manufactur. Process., Vol.8, No.1, pp.1 (1993).
22.K. V. Ravi, V. G. Zarifis, Laser polishing of diamond, Proceeding 3rd International Symposium on Diamond Materials, Honolulu, Hawaii, The Electrochemical Society, Pennington, NJ, 1993.
23.V. N. Tokarev, J. I. B. Wilson, M. G. Jubber, P. John, D. K. Milne, “Modelling of self-limiting laser ablation of rough surfaces : application to the polishing of diamond films”, Diamond Relat. Mater., Vol.4, pp.169-176 (1995).
24.V. G. Ralchenko, K. G. Korotushenko, A. A. Smolin, E. N. Loubnin, “Fine patterning of diamond films by laser-assisted chemical etching in oxygen”, Diamond Relat. Mater., Vol.4, pp.893-896 (1995).
25.R. Singh, D.G. Lee, “Excimer Laser-Assisted Planarization of Thick Diamond Films”, J. Electron. Mater., Vol.25, pp.137-142 (1996).
26.A. M. Ozkan, A. P. Malshe, W. D. Brown, “Sequential multiple-laser- assisted polishing of free standing CVD diamond substrates”, Diamond Relat. Mater., Vol.6, pp.1789-1798 (1997).
27.S. Gloor, S. M. Pimenov, E. D. Obraztsova, W. Luthy, H. P. Weber, “Laser ablation of diamond films in various atmospheres”, Diamond Relat. Mater., Vol.7, pp.607-611 (1998).
28.S. Gloor, W. Luthy, H. P. Weber, S. M. Pimenov, V. G. Ralchenko, V. I. Konov, A. V. Khomich, “UV laser polishing of thick diamond films for IR windows”, Applied Surface Science, Vol.138-139, pp.135-139 (1999).
29.V. I. Konov, S. M. Pimenov, V.V. Kononenko, V. G. Ralchenko, S. Gloor, W. Luthy, H. P. Weber, A. V. Khomich, “Laser polishing of diamond plates”, Appl. Phys. A, Vol.69, pp.81-88 (1999).
30.Victor G. Ralchenko, Sergei M. Pimenov, “Laser Processing of Diamond Films”, Diamond Films And Technol., Vol.7, No.1, pp.15-40 (1997).
31.J. K. Park, V. M. Ayres, J. Asmussen, K. Mukherjee, “Precision micromachining of CVD diamond films”, Diamond Relat. Mater., Vol.9, pp.1154 (2000).
32.E. Cappelli, G. Mattie, S. Orlando, F. Pinzari, P. Ascarelli, “Pulsed laser surface modification of diamond thin films”, Diamond Relat. Mater., Vol.8, pp.257-261 (1999).
33.Simon S. M. Chan, Michael D. Whitfield, Richard B. Jackman, Graham Arthur, Francis Goodall, Ronald A. Lawes, “The effect of eximer laser etching on thin film diamond”, Semicond. Sci. Technol., Vol.18 pp.S47-S58 (2003).
34.T. V. Kononenko, V. G. Ralchenko, I. I. Vlasov, S. V. Garnov, V. I. Konov, “Ablation of CVD diamond with nanosecond laser pulses of UV-IR range”, Diamond Relat. Mater., Vol.7, pp.1623-1627 (1998).
35.G. A. Shafeev, E. D. Obraztsova, S. M. Pimenov, “Laser-assisted etching of diamonds in air and in liquod media”, Appl. Phys. A, Vol.65, pp.29-32 (1997).
36.P. Ascarelli, E. Cappelli, S. Orlando, F. Pinzari, “Laser treatment of diamond films”, Applied Surface Science, Vol.127-129, pp.837-842 (1998).
37.C. Johnston, P. R. Chalker, I. M. Buckley-Golder, P. J. Marsden, S. W. Williams, “Diamond device delineation via eximer laser patterning”, Diamond Relat. Mater., Vol.2, pp.829-834 (1993).
38.R. Windholz, P.A. Molian, “Nanosecond pulsed eximer laser machining of chemical vapour deposited diamond and highly oriented pyrolytic graphite”, Journal of Materials Science, Vol.32, pp.4295-4301 (1997).
39.R. Windholz, P.A. Molian, “Nanosecond pulsed eximer laser machining of chemically vapour-deposited diamond and graphite”, Journal of Materials Science, Vol.33, pp.523-528 (1998).
40.A. Beiser, Concepts of Modern Physics, 5th ed., McGraw-Hill, 1995.
41.林螢光, 光電子學-原理,元件與應用, 全華科技圖書股份有限公司, 民國89年.
42.K. J. Gasvik, Optical Metrology, 2nd ed., John Wiley& Sons, 1995.
43.B. Hitz, J. J. Ewing, J. Hecht, Introduction to Laser Technology, 3rd ed., IEEE Press, 1994.
44.J. Brannon, Excimer Laser Ablation and Etching, the American Vacuum Society, 1993.
45.D. Bauerle, Laser Processing and Chemistry, 3rd ed., Springer-Verlag Berlin Heidelberg, 2000.
46.李俊昌, 激光的衍射及熱作用計算, 科學出版社, 北京, 2002.
47.G. Davies ed., Properties and Growth of Diamond, the Institution of Electrical Engineers, 1994.
48.B. E. A. Saleh, M. C. Teich, Fundamental of Photonics, John Wiley & Sons, New York, 1991.
49.W.D. Callister, Materials Science and Engineering an Introduction, 4th ed., John Wiley & Sons, 1997.
50.鄭茂川, 使用準分子雷射於鑽石膜的平坦化研究, 國立成功大學機研所, 碩士論文, (2003).
51.B. C. Stuart, M. D. Feit, S. Herman, A. M. Rubenchik, B. W. Shore, M. D. Perry, “Laser-Induced Damage in Dielectrics with Nanosecond to Subpicosecond Pulses”, Phys. Rev. Lett., Vol.74, No.12, pp.2248-2252 (1995).
52.B. C. Stuart, M. D. Feit, S. Herman, A. M. Rubenchik, B. W. Shore, M. D. Perry, “Nanosecond-to-femtosecond laser-induced breakdown in dielectrics”, Phys. Rev. B, Vol.53, No.4, pp.1749-1761 (1996).
53.A. Rosenfeld, M. Lorenz, R. Stoian, D. Ashkenasi, “Ultrashort-laser- pulse damage threshold of transparent materials and the role of incubation”, Appl. Phys. A, Vol.69, pp.S373-S376 (1999).
54.D. Ashkenasi, M. Lorenz, R. Stoian, A. Rosenfeld, “Surface damage threshold and structuring of dielectrics using femtosecond laser pulses : the role of incubation”, Appl. Surf. Sci., Vol.150, pp.101-106 (1999).
55.D. Ashkenasi, R. Stoian, A. Rosenfeld, “Single and multiple ultrashort laser pulse ablation threshold of Al2O3 (corundum) at different etch phases”, Appl. Surf. Sci., Vol.154-155, pp.40-46 (2000).
56.J. Bonse, P. Rudolph, J. Kruger, S. Baudach, W. Kautek, “Femtosecond pulse laser processing of TiN on silicon”, Appl. Surf. Sci., Vol.154-155, pp.659-663 (2000).
57.L. Junchang, C. Langlade, A.B. Vannes, “Evaluation of the field developed during pulsed laser treatment : semi analytical calculation”, Surf. Coat. Technol., Vol.115, pp.87-93 (1999).
58.H. S. Craslaw, J.C. Jaeger, Conduction of Heat in Solids, 2nd ed., 1959.
59.Z. B. Hou, R. Komanduri, “General solution for stationary/moving plane heat source problems in manufacturing and tribology”, Int. J. Heat Mass Transfer, Vol.43, pp.1679-1698 (2000).
60.F. P. Incropera, D.P. Dewitt, Fundamentals of Heat and Mess Transfer, 4th ed., John Wiley & Sons, New York, 1996.
61.V. R. Howes, Proc. “The Graphitization of Diamond”, Phys. Soc., Vol.80, pp.648-662 (1962).
62.G. Davies, T. Evans, “Graphitization of diamond at zero pressure and at a high pressure”, Proc. R. Soc. Lond. A., Vol.328, pp.413-427 (1972).
63.V. N. Strekalov, V. I. Konov, V. V. Kononenko, S. M. Pimenov, “Early stages of laser graphitization of diamond”, Appl. Phys. A, Vol.76, pp.603-607 (2003).
64.Amnon Yariv, Optical Electronics in Modern Communications, 5th ed., Oxford, 1997.
65.許樹恩, 吳泰伯, X光繞射原理與材料結構分析, 行政院國家科學委員會精密儀器發展中心, 民圖82年.
66.Alix Gicquel, Khaled Hassouni, Francois Silva, Jocelyn Achsrd, “CVD diamond films:from growth to applications”, Current Applied Physics, Vol. 1, pp. 479-496 (2001).
67.楊雲凱, 低溫離子束沉積含氮類鑽碳之附著功理論建立及微-奈米磨潤性能之研究, 國立成功大學機研所, 碩士論文, (2002).