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研究生：	高瑋嶸 Kao, Wei-jung
論文名稱：	以磁控濺鍍法製備ZrO2:Sm3+之結構與發光性質探討 Investigation on structure and photoluminescence of ZrO2:Sm3+ produced by RF sputtering deposition
指導教授：	黃肇瑞 Huang, Jow-lay
學位類別：	碩士 Master
系所名稱：	工學院 - 材料科學及工程學系 Department of Materials Science and Engineering
論文出版年：	2009
畢業學年度：	97
語文別：	中文
論文頁數：	96
中文關鍵詞：	磁控濺鍍、釤、單斜相
外文關鍵詞：	Monoclinic, Sm, RF sputtering
相關次數：	點閱：94 下載：2
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由於全球能源短缺，因此發展出省電以及環保的產品迫在眉睫，LED
即為一重要產品，白光LED 為多種色光混合而成，發光效率要有最好的
前提條件為主體之聲子能量要低，而氧化鋯為一良好的選擇，本實驗的
釤離子為稀土離子，放射光波長為黃光到紅光的範圍，為了追求良好的
發光效率，因此朝製程上來研究，有別於一般的製程鮮少利用磁控濺鍍
法，因此即採用此法為製程。
實驗中的的最佳氧氣氛濃度為2%，使用的濃度對照為0.33at%、
0.46at%、1.48at%、2.19at%，最佳發光強度之濃度為0.33at%摻雜濃度，
2.19at%為淬滅濃度。
兩種結構對574nm、575nm、622nm 在不同摻雜濃度有不同的影響，
其他發光波長則來自於單斜相。
關鍵字：磁控濺鍍、釤、單斜相

There is a global energy shortage problem, so we must try to invent a
energy-saving and environment friendly lighting product. LED is a ideal one.
White light LED is composed of different color light. The presupposition of
high luminescence efficiency is a host with low phonon energy, just like ZrO2.
Sm is a rare-earth element and its emission wavelength range is from yellow
to red light. We’re looking for a great procedure for high efficiency.
According to previous research, we use RF-sputtering because of less process
of RF sputtering.
The best oxygen concentration for experiment was 2%. We used 0.33at%
0.46% 1.48% 2.19% of Sm3+ as model. The highest luminescence efficiency
concentration was 0.33at%.
When the dopant concentration was changed, Monoclinic and Tetragonal
had different effect on 574nm、575nm、622nm. The rest of emission peak
were contributed to Monoclinic.
Key word：RF sputtering、Sm、Monoclinic

摘要...................................................................................................................I
Abstract.............................................................................................................II
致謝.................................................................................................................III
總目錄..............................................................................................................V
圖目錄..........................................................................................................VIII
表目錄.............................................................................................................XI

第一章  緒論...................................................................................................1
    1.1  前言..................................................................................................1
    1.2  研究動機與目的..............................................................................2
第二章  理論基礎...........................................................................................3
    2.1  何謂發光..........................................................................................3
    2.2  發光種類與激發源..........................................................................3
    2.3  螢光材料介紹..................................................................................5
    2.4  發光機制介紹..................................................................................7
    2.5  固態材料中的光致發光..................................................................8
       2.5.1  本質型發光.............................................................................8
       2.5.2  外質型發光...........................................................................10
            2.5.2.1  非侷限型發光..........................................................10
            2.5.2.2  侷限型發光..............................................................10
    2.6  發光變因........................................................................................11
       2.6.1  史托克位移...........................................................................11
       2.6.2  能量轉移...............................................................................12
    2.7  螢光體的組成與選擇....................................................................12
    2.8  影響發光的因素............................................................................17
    2.9  稀土金屬離子的發光特性............................................................19
    2.10  ZrO2基本性質..............................................................................19
    2.11  電漿理論基礎..............................................................................21
    2.12  物理氣相沉積法..........................................................................26
        2.12.1  薄膜成核成長理論...........................................................27
        2.12.2  濺鍍理論...........................................................................28
        2.12.3  射頻磁控濺鍍原理...........................................................31
    2.13  CIE座標.......................................................................................34
第三章  實驗步驟與分析儀器.....................................................................35
    3.1  實驗流程圖....................................................................................35
    3.2  實驗材料........................................................................................36
    3.3  實驗設備........................................................................................36
       3.3.1  氧化層薄膜濺鍍系統...........................................................36
       3.3.2  氣氛退火系統.......................................................................37
    3.4  實驗流程........................................................................................37
       3.4.1  基材前處理...........................................................................37
       3.4.2  濺鍍步驟與條件...................................................................37
       3.4.3  氣氛退火實驗.......................................................................38
    3.5  樣品分析與測試............................................................................38
       3.5.1  濺鍍速率之量測...................................................................38
       3.5.2  XRD繞射分析......................................................................38
       3.5.3  掃描式電子顯微鏡 (SEM) .................................................39
       3.5.4  電子微探儀 (EPMA) ..........................................................39
       3.5.5  微光激發光光譜儀 (Micro-PL) ..........................................40
       3.5.6  成份與化學鍵結分析 (ESCA) ...........................................41
第四章  結果與討論.....................................................................................42
    4.1  氧氣流量對薄膜的影響................................................................42
       4.1.1  反應濺鍍速率.......................................................................42
       4.1.2  成份及鍵結分析...................................................................44
    4.2  製備不同摻雜濃度樣品................................................................51
       4.2.1  成分分析...............................................................................51
       4.2.2  XRD繞射分析......................................................................51
    4-3  光致發光與結構性質探討............................................................56
       4-3-1 濃度對光致發光的影響........................................................61
4-3-2 結晶相對光致發光的影響……………………….………………….…….65
4-3-2-1 晶相對發光強度的影響……………………...……65
4-3-2-2 晶相對放射峰值的影響……………………...……80
4-3-3 不同激發光波長對光致發光的影響……………….......….82
4-3-4 晶粒大小對光致發光的影響……………………...……….87
第五章  結論.................................................................................................89
第六章  參考文獻.........................................................................................91
                                    

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