虛擬量測(Virtual Metrology, VM)為利用生產機台的製程參數並採用預測模型來預測產品品質，即在無實際量測之情況下進行製程品質監控。本論文以雙階段VM架構為基礎，此架構具有製程與量測資料前處理、雙階段推估演算流程、信心指標評估和相似度指標模組，雙階段VM架構可套用於所有VM之應用。其一最重要的應用為先進製程控制方法中的逐片控制方法(Workpiece-to-Workpiece, W2W)，應用VM即時預測的能力獲取每一片之量測值。因此，為了能使VM架構更容易實作與發展，故本論文提出一通用型虛擬量測架構(Generic Virtual Metrology Framework, GVM Framework)，該架構以可抽換式模組之設計精神，降低模組與架構之間相依性，使GVM系統擁有高度之適應性，很容易地將所實作出不同VM的功能模組應用於GVM架構上，且易於與W2W APC架構整合。

Virtual metrology (VM) is a technology to predict metrology variables using information about the process state for every workpiece. An advanced dual-phase VM scheme possessing the properties of data preprocessing, dual-phase conjecturing, reliance-level evaluating, and similarity-level appraising was proposed by our research group. This dual-phase VM scheme is applicable for all the typical VM applications. Among those applications, workpiece-to-workpiece (W2W) advanced process control (APC) is the most critical. For easy implementation and deployment, a generic-virtual-metrology (GVM) framework shall be designed. The purpose of this thesis is to develop the GVM framework. The Pluggable Designs of GVM Framework could reduce the dependencies between module and framework, and make the GVM Framework to have higher adaptability. By applying this GVM framework, different VM functional modules can be easily implemented and applied for various kinds of VM applications, especially for W2W APC.

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