本研究以分子梳結合微接觸壓印技術，進行實驗參數的探討，找出影響DNA奈米束陣列長短、方向性和整齊度的因素。由實驗結果得知，施加於PDMS印章上的壓力需控制於一適當範圍，才可使足夠的DNA溶液進入微米孔洞中且不會造成PDMS印章上微米孔洞的過度變形，形成DNA奈米束陣列。另外，增加DNA溶液的濃度、縮小微米孔洞中心間距以及增加掀起PDMS印章的速率，都有助於形成連續的長DNA奈米束陣列。本研究也提出以改良式滾輪法來拉伸DNA，藉以改善以手動進行導致方向性不易控制的問題。利用此整齊排列的DNA奈米束陣列，以無電鍍法(electroless plating)在DNA奈米束上還原金屬粒子(鈀、鈷)，並以3-氨基丙基三甲氧基甲矽烷改質玻璃基板，減少金屬粒子還原在玻璃基板上的數量，可以快速製備大面積整齊排列的金屬奈米線。除此之外，此規則排列的奈米束陣列可以作為模版，以雙層複合印章(h-PDMS和184-PDMS)的方法製作奈米級的通道，相較於目前文獻上的技術，有成本較低、製備時間較短的優勢

In this study, an aligned and ordered DNA nanostrands array was fabricated via molecular combing/soft lithography technique. Different processing parameters such as center-to-center distance, applied pressure, peeling rate for PDMS mold and concentrations of DNA solutions were discussed. The DNA nanostrands array was subsequently used as the template for metallization and fabrication of nanochannels. The results showed that proper applied pressure is required to generate the ordered DNA nanostrands. Moreover, shorter center-to-center distance, higher concentration of DNA solution and fast peeling rates for PDMS mold will facilitate fabricating long DNA nanostrands. A roller technique was proposed to provide better control over generating DNA nanostrands. As to metallization of DNA nanostrands, palladium nanowires and hybrid metallic nanowires (palladium and cobalt) on the modified glass substrate were obtained through electroless plating process. Proper activation time (less than 5 min) and reduction time (~30 seconds) in conjunction with suface modification of substrate is necessary to minimize the number of metallic particles growing on the substrate. For fabrication of nanochannels, a two-stamp technique was adopted and nanochannels with deep arounds 3 nm were obtained. This provides a powerful alternative to fabricate long and aligned nanochannels for nanofluidic studies and applications.

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