本研究討論氧化鋅/砷化鎵薄膜系統奈米壓痕行為，以及退火前後機械性質、表面形貌和微觀結構之變化。本實驗利用共濺鍍機於砷化鎵基板上沈積100nm及200nm之氧化鋅薄膜，分別對薄膜厚度100nm試片進行70nm和150nm深度之試驗，以及薄膜厚度200nm試片進行70nm和250nm深度之試驗，以了解壓痕深度與膜厚之影響。此外也對另一組試片進行500℃持溫30分鐘之加熱，同樣進行上述之量測，以比較退火前後之差異。
實驗結果顯示，退火前之負載-深度曲線有pop-in之現象，經退火後硬度及楊氏模數皆下降，因此無因薄膜脫落基板而發生pop-in之現象。當壓痕深度皆為70nm時，膜厚較薄之試片因受基板影響較明顯而具有較大之硬度值。觀察試片表面形貌及剖面微觀結構可發現，壓痕深度越大表面之變形量與差排密度也越大，當壓痕深度皆為70nm時，膜厚較薄之試片因受基板影響較明顯而有較大之表面變形與差排密度。退火後表面變形與差排密度皆較小。

The mechanical properties of ZnO/GaAs thin films with and without annealing indented in room temperatures to different depth were measured by using a nanoindentation technique. The specimens were annealed at the temperature 500℃ for 30 minutes. The result show that without annealing the pop-in effect appeared at the load-depth curve as the specimen indented at room temperature, due to the delamination of the thin film from the substrate. After annealing, the load-depth curve become smooth and the hardness and Young’s modulus is found to decrease. Furthermore, dislocations were also found to decrease significantly. The changes in microstructure and mechanical properties caused by different variables such as annealing, indentation depth and thickness of the thin film were also discussed.

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