簡易檢索 / 詳目顯示

研究生: 黃群耀
Huang, Chun-Yao
論文名稱: 鋁含量對鎢-鋁鍍層的氧化機構及機械性質之影響
Effects of aluminum content on oxidation mechanism and mechanical properties of W-Al coatings
指導教授: 蘇演良
Su, Yen-Liang
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 103
中文關鍵詞: PVD氧化機構
外文關鍵詞: PVD, Tungsten, Aluminum, oxidation
相關次數: 點閱:90下載:2
分享至:
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報
  • 本研究採用非平衡磁控濺鍍法,在高速鋼和矽晶片底材鍍上一層鎢鋁薄膜,探討鍍層於氧化處理前後的結構變化,並分析其氧化機構。實驗依製備方式不同分為兩階段,第一階段為控制鋁靶電流,製備一系列不同鋁含量比例之鎢鋁鍍層,探討鋁含量的增加對鍍層的影響;第二階段則是將鎢靶電流降低,探討在相近的鋁含量下,降低鎢靶電流對鍍層的影響。實驗結果得知,第一階段鍍層氧化處理前硬度隨著鋁含量的提升而下降。經氧化後,氧化鋁和氧化鎢會隨鋁含量變化而改變,鋁含量大於45 at.%以上之鍍層的氧化層幾乎完全是氧化鋁,氧化鋁阻止了氧原子侵入鍍層,使鍍層得到保護。鋁含量0~30 at.%鍍層在氧化處理後因氧化鎢的含量較多,使得未經氧化塗層的硬度比經氧化後鍍層為高。鋁含量大於45 at.%的鎢鋁鍍層,因氧化鋁的含量較多,使得經氧化鍍層的硬度比未經氧化鍍層為高;第二階段鍍層經熱處理後奈米硬度皆大幅提升,且Ⅱ-W-55Al在600℃熱處理後硬度甚至可達15GPa,並維持良好的附著性。

    Kinds of aluminum added different elements are used in aerospace, military and semiconductor industries, because of its well conductivity, thermal stability and easy forming. In this study, W-Al multilayer coatings (1~1.5um) are deposited on HSS and Si wafer with different component of Aluminum (0,15,30,45,65 at %) by Unbalanced Magnetron Sputtering system. During the coating process Cr (0.1um) and Cr-Al (0.2um) were deposited as the interlayer. Multilayer coatings were been oxidation treatment and investigated the structural changes and the oxidation mechanism. Experimental results show that, the hardness of as-deposited coatings increase with the decreasing of aluminum content. After oxidation treatment , 0~30 at % component of Al coatings have more content of tungsten oxide and the hardness declined. However, Al content more than 45% of the oxide coating layer is almost entirely alumina, which prevents the invasion of oxygen and been as the coating protection.

    摘要 I Abstract II 誌謝 IX 總目錄 X 表目錄 XII 圖目錄 XIII 第一章 緒論 1 1-1 前言 1 第二章 理論探討與文獻回顧 2 2-1 磁控濺鍍原理 2 2-2 奈米多層膜 5 2-3 切削刀具鍍膜 6 2-4 鎢與氧化鎢的性質 7 2-5 鋁與氧化鋁的性質 8 第三章 實驗方法與步驟 9 3-1 實驗目的 9 3-2 實驗流程 9 3-3 實驗方法與規劃 12 3-3-1 鍍層參數與鍍膜安排 12 3-3-2 底材材料 15 3-3-3 結構分析 15 3-3-4 成份分析 16 3-3-5 硬度實驗 17 3-3-6 附著性實驗 18 3-3-7 氧化實驗 18 3-4 實驗設備清單 19 第四章 實驗結果與討論 21 4-1 增加鋁靶電流對W-Al系列鍍層之影響(第一階段鍍層) 21 4-1-1 成分分析 21 4-1-2 結構分析 25 4-1-3 鍍膜表面及斷面SEM觀察 26 4-1-4 鍍膜斷面TEM觀察 28 4-1-5 奈米硬度及彈性模數 32 4-1-6 附著性 32 4-2 熱處理對第一階段鍍層之影響 34 4-2-1 結構分析 34 4-2-1-1 500℃熱處理 34 4-2-1-2 600℃熱處理 36 4-2-2 熱處理後鍍膜表面及斷面SEM觀察 38 4-2-2-1 500℃熱處理 38 4-2-2-2 600℃熱處理 40 4-2-3 熱處理後成份分析 42 4-2-4 氧化層厚度分析 49 4-2-5 奈米硬度及彈性模數 50 4-2-6 附著性 51 4-2-7 小結 54 4-3 降低鎢靶電流對鍍層之影響(第二階段鍍層) 55 4-3-1 成分分析 55 4-3-2 結構分析 57 4-3-3 鍍膜表面及斷面SEM觀察 57 4-3-4 鍍膜斷面TEM觀察 58 4-3-5 奈米硬度及彈性模數 59 4-3-6 附著性 60 4-4 熱處理對第二階段鍍層之影響 61 4-4-1 結構分析 61 4-4-1-1 500℃熱處理 61 4-4-1-2 600℃熱處理 61 4-4-2 熱處理後鍍膜表面及斷面SEM觀察 64 4-4-2-1 500℃熱處理 64 4-4-2-2 600℃熱處理 65 4-4-3 熱處理後成份分析 66 4-4-4 氧化層厚度分析 68 4-4-5 奈米硬度及彈性模數 68 4-4-6 附著性 70 4-4-7 小結 71 第五章 結論 72 第六章 參考文獻 74 附錄一、W-45Al經500℃熱處理後之氧化層 77 附錄二、GDS成份分析原圖 78 附錄三、奈米硬度 Load-Displacement圖 90 附錄四、聯絡人 102

    1. K-D. Bouzakis, J. Anastopoulos, A. Asimakopoulos, N. Michailidis, G. Erkens, Surface and Coatings Technology, Vol. 201 (2006) 4395-4400.
    2. S. PalDey, SC. Deevi, Materials Science and Engineering, Vol. 342 (2003) 58-79.
    3. P. Panjan, M. Cˇekada, B. Navinsˇek, Surface and Coatings Technology, Vol. 174-175 (2003) 55-62.
    4. L.A. Dobrzanski, A. Sliwa, L.W. Zukowska, J. Mikula, K. Golombek, Journal of Achievements in Materials and Manufacturing Engineering, Vol. 42 (2010) 33.
    5. R.D. Arnell, P.J. Kelly, Surface and Coatings Technology, Vol. 112 (1999) 170-176.
    6. B. Window, Surface and Coatings Technology, Vol. 71(2)(1995)93-97.
    7. T. Fu, Z.F. Zhou, K.Y. Li, Y.G. Shen, Surface and Coatings Technology, Vol. 200 (7) (2005) 2525-2530.
    8. D.J. Cheng, W.P. Sun, M.H. Hon, Thin Solid Films, Vol. 146 (1) (1987) 45-53.
    9. B.E. Jacobson, C.V. Deshandey, H.J. Doerr, A.A. Karim, R.F. Bunshah, Thin Solid Films, Vol. 118 (3) (1986) 285-292.
    10. S. J. Bull, A. M. Jones, Surface and Coatings Technology, Vol. 78 (1996) 173-184.
    11. H. Holleck, V. Schier, Surface and Coatings Technology, Vol. 76-77 (1995) 328-336.
    12. H. Holleck, H. Schulz, Thin Solid Film, Vol. 153 (1987) 11-17.
    13. O. Knotek, F. Löffler, G. Krämer, Surface and Coatings Technology, Vol. 54-55 (1992) 241-248.
    14. M. Setoyama, A. Nakayama, M. Tanaka, N. Kitagawa, T. Nomura, Surface and Coatings Technology, Vol. 86-87 (1996) 225-230.
    15. M. Setoyma, M. Irie, H. Ohara, M. Tsujioka, Y. Takeda, T. Nomura, N. Kitagawa, Thin Solid Films, Vol. 341 (1999) 126-131.
    16. W. M. C. Yang, T. Tsakalakos, Journal of Applied Physics, Vol. 48 (1977) 876-879.
    17. W. E. Pickett, Journal of Physics, Vol. 12 (1982) 2195-2204.
    18. G. E. Henein, J. E. Hilliard, Journal of Applied Physics, Vol. 54 (1983) 728-733.
    19. T. Tsakalakos, J. E. Hilliard, Journal of Applied Physics, Vol. 54 (1983) 734-737.
    20. J. S. Koehler, Physical Review, B2 (1970) 547-551.
    21. S. L. Lehoczky, Journal of Applied Physics, Vol. 49 (1978) 5479-5485.
    22. U. Helmersson, S. Todorova, S. A. Barnett, J. E. Sundgen, Journal of Applied Physics, Vol. 62 (1987) 481-484.
    23. X. Chu, M. S. Wong, W. D. Sproul, S. L. Rohde, S. A. Barnett, Journal of Vacuum Science and Technology, A10 (1992) 1604-1609.
    24. K. M. Hubbard, T. R. Jervis, P. B. Mirkarimi, S. A. Barnett, Journal of Applied Physics, Vol. 72 (1992) 4466-4468.
    25. P. B. Mirkarimi, L. Huliman, S. A. Barnett, Applied Physics Letters, Vol. 57 (1990) 2654-2656.
    26. K. K. Shih, D. B. Dove, Applied Physics Letters, Vol. 61 (1992) 654-656.
    27. G. Skordaris, K.-D. Bouzakis, P. Charalampous, E. Bouzakis, R. Paraskevopouloua, O. Lemmer, S. Bolzc, CIRP Annals - Manufacturing Technology, Vol. 63 (2014) 93-96.
    28. K.-D. Bouzakis, S. Gerardis, G. Katirtzoglou, S. Makrimallakis, N. Michailidis, E. Lili, CIRP Annals - Manufacturing Technology, Vol. 57 (2008) 105-108.
    29. J.L. Endrino , G.S. Fox-Rabinovich , C. Gey, Surface and Coatings Technology, Vol. 200 (2006) 6840-6845.
    30. G.S. Fox-Rabinovich, J.L. Endrino, B.D. Beake, M.H. Aguirre, S.C. Veldhuis, D.T. Quinto , C.E. Bauer, A.I. Kovalev , A. Gray, Surface and Coatings Technology , Vol. 202 (2008) 2985-2992.
    31. N.M.G. Parreira, N.J.M. Carvalho, F. Vaz, A. Cavaleiro, Surface and Coatings Technology, Vol. 200 (2006) 6511-6516.
    32. R.E. Smallwood, "ASTM Committee B-10 on Reactive and Refractory Metals and Alloys", Philadephia, PA, (1982) 82-104.
    33. A.G. Souza Filho, J. M. Filho, V.N. Freire, A.P. Ayala, J.M. Sasaki, P.T.C. Freire, F.E.A. Melo, J.F. Juliao, U.U. Gomes, Journal of Raman Spectroscopy, Vol. 32 (2001) 695.
    34. E. Cazzanelli, C. Vinegoni, G. Mariotto, A. Kuzmin, J. Purans, Journal of Solid State Chemistry, Vol. 143 (1999) 24-32.
    35. D. Greenwooda, S.C. Moulzolfa, P.J. Blaub, R.J. Lada, Wear, Vol. 232 (1999) 84-90.
    36. N.M.G. Parreira, N.J.M. Carvalho, A. Cavaleiro, Thin Solid Films, Vol. 510 (2006) 191-196.
    37. P. Harlin, P. Carlsson, U. Bexell, M. Olsson, Surface and Coatings Technology, Vol. 201 (2006) 4253-4259.
    38. V. Edlmayr , M. Moser, C. Walter, C. Mitterer, Surface and Coatings Technology, Vol. 204 (2010) 1576-1581.
    39. C.J. Zhu, X.F. Ma, W. Zhao, H.G. Tang, J.M. Yan, Journal of Alloys and Compounds, Vol. 393 (2005) 248-251.
    40. W. Lauwerens , A. De Boeckb, M. Thijsc, S. Claessensb, M. Van Stappena, P. Steenackersc, Surface and Coatings Technology , Vol. 146-147 (2001) 27-32.
    41. S.G. Cai, L. Liu, R.Z. Xu, G. Song, Surface and Coatings Technology, Vol. 205 (2010) 332-337.
    42. M. Stubicar, A. Tonejc, N. RadicH, Vacuum , Vol. 61 (2001) 309-316.
    43. T. Kohara, H. Tamagaki, Y. Ikari, H. Fujii, Surface and Coatings Technology, Vol. 185 (2004) 166- 171.
    44. Z.J. Yin, S.Y. Tao, X.M. Zhou, C.X. Ding, Wear, Vol. 263 (2007) 1430-1437.
    45. T.C. Chou, T.G. Nieh, S.D. McAdams, G.M. Pharr, Scripta Metallurgicaet Materialia, Vol. 25 (1991) 2203-208.
    46. 宋健瑋,”鎢-鋁鍍膜之耐氧化性及磨潤性能研究”,國立成功大學機械工程學系碩士論文,民國102年.
    47. 張沅翰,”以碳化鎢底材披覆多層膜類鑽碳鍍層之磨潤性能研究”,國立成功大學機械工程學系碩士論文,民國101年.
    48. http://www.sanpany.com.tw/pro_detail.php?kind_id=4&c_logo=5&sub_id=62&sub_id2=127&id=489
    49. T. Arai, H. Fujita, M. Watanable , Thin Solid Films, Vol. 154 (1987) 387-401.

    下載圖示 校內:2019-07-22公開
    校外:2019-07-22公開
    QR CODE