Ta3N5具有能吸收可見光波段到600nm以及其他的優良特性，這些使得此材料適合當作光催化劑。然而，以反應濺鍍製備的方式少有研究使用，而且常需要腐蝕性的NH3輔助。
TaxNy屬於多化學劑量比的氮化物，隨著不同的參數調控製成，已反應濺鍍方式製備含N量高的Ta3N5又是一大挑戰。在此研究中，我們試著不使用具侵蝕性的NH3的方式直接濺鍍成長奈米柱於FTO基板上，並且不需要輔以旋轉基板或小角度濺鍍方式，因此可以在製程中避免更多不必要產生的問題。這樣的策略可以提供一個取代方式有效的成長氮化物。
Ta3N5奈米柱藉由調整Ar/N2的比例及工作壓力成長，並且以XRD, SEM, AES, XPS, TEM, 和UV-Vis來分析其性質
綜合SEM, XRD, AES, 和 XPS的結果，我們成功合成具有奈米柱狀結構的Ta3N5，所使用的參數為Ar : N2 = 7 : 15, 工作壓力30 mTorr, DC 450W, 600 ℃。
利用光降解甲基藍來測定其光催化性質，在pH = 10的環境下藉由可見光照射，50%的甲基藍(5ppm, 10ml)可以在150分鐘內被分解，光催化反應速率常數為0.0059 min-1，約P25的2.7倍。另外，藉由循環測試，可以知道其穩定性。

Ta3N5 (band gap approximate 2.1 eV) can effectively absorb the visible light up to 600 nm and other various superior properties, which make it promising for photocatalysis. However, reactive sputtering was not heavily used to make Ta3N5, and a caustic NH3 treatment is often required.
TaxNy indicates a broad space of phases, depending upon the fabrication conditions. Making N-rich Ta3N5 using reactive sputtering is full of challenges. In this research, reactive sputtering was used to directly grow Ta3N5 nanocolumn arrays on an FTO/glass substrate, without using caustic NH3 gases. In addition, no other treatments were adopted, such as a seeding layer, substrate rotation, or a glancing angle strategy, thus preventing unnecessary complexity from being incorporated into an existing sputtering system. This strategy provides an alternative approach to effectively fabricate nitrides.
Ta3N5 nanocolumn arrays were obtained by tuning the parameters of the Ar/N2 ratio, and the working pressures. Various characterization tools such as XRD, SEM, AES, XPS, TEM, and UV-Vis were used to study the related properties.
Combining the results of SEM, XRD, AES, and XPS analyses, we successfully made the columnar structures of single Ta3N5 phase, which was made under the conditions of the flow rates of Ar : N2 = 7 : 15, working pressure of 30 mTorr, DC 450W, and 600 ℃).
The photodegradation performance was measured in an environment with a pH of approximately 10, in which approximately 50 % of methylene blue (5 ppm, 10ml) was photodegraded in 150 min under 300 W visible light after dark absorption. The photodegradation rate constant k was 0.0059 min-1, which was approximately 2.7 times higher than that of P25. Its stability was also evaluated by a three cycle test.

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