本研究包含三個研究主題，一是利用奈米壓印結合乾式蝕刻技術製作線金屬光柵偏振片，並對其進行效率量測；二是利用奈米壓印製作表面聲波元件，應用於生醫檢測；三是利用自製曝光顯影機構做背向式曝光，並探討曝光顯影劑量對光阻形貌的影響。
本研究成功以乾式蝕刻技術製作出高深寬比之線金屬光柵偏振片，有效克服奈米壓印在製作金屬結構時受限於舉離製程與模具結構深度的瓶頸。首先，於鍍有鋁與二氧化矽的玻璃基板上，透過奈米壓印在二氧化矽表面製作出厚度40 nm、線寬線距均為100 nm之鉻遮罩圖形，並以該圖案化之鉻層為遮罩，蝕刻位於鋁層上方之二氧化矽層。接續利用鉻與二氧化矽雙層遮罩進行乾蝕刻，最終成功製作出結構寬度115 nm、週期200 nm、高度340 nm、深寬比達2.95 的鋁金屬光柵。後續針對可見光與近紅外波段做光學量測，在偏振光通過方向，於波段1700 nm時穿透率高達82.1%；而在遮蔽方向，大多數波段之穿透率皆低於4%，展現良好的偏振選擇性與光學性能。
本研究利用熱奈米壓印具備高解析度、低成本與製程簡便等優勢，結合金屬舉離製程，成功製作出具有大面積週期性結構與電極圖樣之表面聲波元件。實驗結果顯示，在週期性光柵結構區域，皆能穩定重現設計圖形，並順利完成金屬舉離製程。然而，由於表面聲波元件的電極設計中包含有大面積的金屬導電電極區域，在此一區域中觀察到壓印殘留層不均勻現象，進而影響舉離品質。進一步分析指出，壓印形貌的均勻性與模具幾何設計是否有利於排膠，以及壓印膠之流動特性密切相關。本研究結果可作為未來微奈米圖形轉印製程設計與參數優化之重要參考。
本研究利用自行架設之曝光顯影機構，結合背向式曝光具備可自行對位之特性，成功製作光阻圖形。所建構之系統整合XY位移平台與Z軸控制馬達，透過程式控制可實現在單一兩吋試片上進行多組曝光與顯影參數組合之實驗，與傳統半自動顯影方式相比，大幅提升實驗效率與再現性。藉由該裝置，本研究成功獲得光阻圖形最佳製程參數，並系統性探討曝光劑量與顯影時間對光阻形貌之影響。

This study comprises three research topics. First, wire-grid metal polarizers were fabricated using nanoimprint lithography (NIL) combined with dry etching, and their optical performance was evaluated. Second, surface acoustic wave (SAW) devices were fabricated via NIL for biomedical sensing applications. Third, a custom-built backside exposure and development system was utilized to investigate the effects of exposure and development doses on photoresist morphology.
High-aspect-ratio aluminum gratings were successfully fabricated using a dry etching process, effectively overcoming the limitations of lift-off and mold depth in NIL-based metal patterning. A chromium mask pattern with a thickness of 40 nm and line width/spacing of 100 nm was imprinted onto a SiO2 layer coated on an Al/SiO2/glass substrate. This Cr/SiO2 bilayer served as the etching mask to produce gratings with a linewidth of 115 nm, a period of 200 nm, a height of 340 nm, and an aspect ratio of 2.95. Optical measurements showed a transmittance of 82.1% at 1700 nm in the polarization pass direction, and below 4% in the block direction, demonstrating excellent polarization selectivity.
Thermal NIL was also applied to fabricate SAW devices with large-area periodic electrodes. The desired patterns were successfully transferred and followed by metal lift-off. However, residual layer non-uniformity in wide metal regions affected lift-off quality. Further analysis revealed that imprint uniformity strongly depends on mold geometry and resist flow behavior, providing valuable guidance for future process optimization.
Finally, a self-developed system integrating an XY translation stage and Z-axis motor enabled programmable backside exposure and segmented development on a single 2-inch substrate. Compared to semi-automatic development, this system significantly improved efficiency and reproducibility. Optimal photoresist parameters were identified, and the relationships between exposure dose, development time, and resulting morphology were systematically studied.

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